SCHEMBL4592694

SCHEMBL4592694

COc1c(F)ccc(CBr)c1F

nearest known ligand 0.51

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
MEP1B Q16820 2/20 0.51
ROCK2 O75116 2/20 0.34
ROCK1 Q13464 1/20 0.34
CYP19A1 P11511 1/20 0.33
HTR2A P28223 2/20 0.32
HTR2C P28335 2/20 0.32
HTR2B P41595 2/20 0.32
PDCD1LG2 Q9BQ51 1/20 0.31
CD274 Q9NZQ7 1/20 0.31
MAPT P10636 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4592472 0.84 MEP1B (0.41) MEP1BCYP19A1HTR2AHTR2CHTR2B
SCHEMBL30937092 0.82 ALOX5AP (0.43) MEP1BHTR2A
SCHEMBL14203437 0.82 MEP1B (0.53) MEP1BROCK2ROCK1CYP19A1HTR2A
SCHEMBL4651909 0.81 MEP1B (0.54) MEP1BHTR2AHTR2CHTR2BPDCD1LG2
SCHEMBL8134900 0.81 MEP1B (0.39) MEP1BPDCD1LG2CD274MAPT
SCHEMBL21503634 0.81 MEP1B (0.46) MEP1BROCK2ROCK1CYP19A1
SCHEMBL8471671 0.80 MEP1B (0.48) MEP1BROCK2ROCK1CYP19A1PDCD1LG2
SCHEMBL19251350 0.80 MEP1B (0.48) MEP1BROCK2ROCK1CYP19A1MAPT
SCHEMBL8274219 0.80 MEP1B (0.48) MEP1BROCK2ROCK1CYP19A1HTR2A
SCHEMBL8470910 0.80 MEP1B (0.51) MEP1BROCK2ROCK1CYP19A1CD274

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2733534-B1 COMPOSITION FOR FORMING FINE PATTERN AND METHOD FOR FORMING FINED PATTERN USING SAME MERCK PATENT GMBH (DE) 2016-09-14 EP disclosed
US-9298094-B2 Composition for forming fine pattern and method for forming fined pattern using same MERCK PATENT GMBH (DE) 2016-03-29 US disclosed
US-9298094-B2 Composition for forming fine pattern and method for forming fined pattern using same MERCK PATENT GMBH (DE) 2016-03-29 US disclosed
EP-2733534-A1 COMPOSITION FOR FORMING FINE PATTERN AND METHOD FOR FORMING FINED PATTERN USING SAME AZ Electronic Materials USA Corp. (US) 2014-05-21 EP disclosed
US-20140127478-A1 COMPOSITION FOR FORMING FINE PATTERN AND METHOD FOR FORMING FINED PATTERN USING SAME AZ ELECTRONIC MATERIALS USA CORP. 2014-05-08 US disclosed
US-20140127478-A1 COMPOSITION FOR FORMING FINE PATTERN AND METHOD FOR FORMING FINED PATTERN USING SAME AZ ELECTRONIC MATERIALS USA CORP. 2014-05-08 US disclosed
US-7511062-B2 Substituted 2-quinolyl-oxazoles useful as PDE4 inhibitors SCHERING CORPORATION (US) 2009-03-31 US disclosed
US-7511062-B2 Substituted 2-quinolyl-oxazoles useful as PDE4 inhibitors SCHERING CORPORATION (US) 2009-03-31 US disclosed
EP-1807398-B1 NEW INDOLE OR BENZIMIDAZOLE DERIVATIVES HOFFMANN LA ROCHE (CH) 2008-06-25 EP disclosed
WO-2005116009-A1 SUBSTITUTED 2-QUINOLYL-OXAZOLES USEFUL AS PDE4 INHIBITORS SCHERING CORPORATION (US) 2005-12-08 WO disclosed