SCHEMBL4594030

SCHEMBL4594030

CCCCCC[Sn](Cl)(Cl)Cl

nearest known ligand 0.50

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.50
THRB P10828 1/20 0.50
ALDH1A1 P00352 3/20 0.45
DNM1 Q05193 7/20 0.38
LMNA P02545 2/20 0.38
MEN1 O00255 2/20 0.38
KMT2A Q03164 2/20 0.38
HSD17B10 Q99714 1/20 0.38
SLC22A1 O15245 1/20 0.38
EPHX1 P07099 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2853403 1.00 TSHR (0.50) TSHRTHRBALDH1A1DNM1LMNA
SCHEMBL1487532 1.00 TSHR (0.50) TSHRTHRBALDH1A1DNM1LMNA
SCHEMBL6898512 1.00 TSHR (0.50) TSHRTHRBALDH1A1DNM1LMNA
SCHEMBL1539071 1.00 TSHR (0.50) TSHRTHRBALDH1A1DNM1LMNA
SCHEMBL11533806 1.00 TSHR (0.50) TSHRTHRBALDH1A1DNM1LMNA
SCHEMBL31589829 1.00 TSHR (0.50) TSHRTHRBALDH1A1DNM1LMNA
SCHEMBL4661794 1.00 TSHR (0.50) TSHRTHRBALDH1A1DNM1LMNA
Water SCHEMBL17698009 0.97 TSHR (0.47) TSHRTHRBALDH1A1DNM1LMNA
Hydrochloric Acid SCHEMBL3047334 0.97 TSHR (0.47) TSHRTHRBALDH1A1DNM1LMNA
SCHEMBL8849475 0.97 TSHR (0.47) TSHRTHRBALDH1A1DNM1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 61 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6939976-B2 Process for making allyl succinic anhydride RHODIA INC. (US) 2005-09-06 US claimed
US-20040220414-A1 Process for making allyl succinic anhydride RHODIA OPERATIONS (FR) 2004-11-04 US claimed
WO-2004092152-A1 PROCESS FOR MAKING ALLYL SUCCINIC ANHYDRIDE RHODIA INC. (US) 2004-10-28 WO claimed
US-11912732-B2 Method for cleaving alkyl tin halides BNT CHEMICALS GMBH (DE) 2024-02-27 US disclosed
US-20230400764-A1 ORGANOMETALLIC COMPOUND COMPRISING A METAL COMBINED WITH AT LEAST ONE LIGAND CONTAINING FOUR OR MORE FLUORINE ATOMS, RESIST COMPOSITION COMPRISING THE SAME, AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2023-12-14 US disclosed
CN-116947914-A Rare earth doped organotin metal cyclic oxygen sulfur cluster compound, crystalline and preparation method and application thereof 中国科学院福建物质结构研究所 2023-10-27 CN disclosed
CN-102770418-B Improved vinyl modifier composition and process utilizing same BRIDGESTONE CO.,LTD. (JP) 2015-09-23 CN disclosed
CN-102781969-B Aminosilane initiators and functionalized polymers prepared therefrom BRIDGESTONE CORP 2015-06-24 CN disclosed
CN-102838630-B Process for preparing monoalkyltin trihalides and dialkyltin dihalides ARKEMA VLISSINGEN B V 2015-06-24 CN disclosed
CN-104364275-A Polydienes and diene copolymers having organophosphine functionality BRIDGESTONE CORP 2015-02-18 CN disclosed
CN-104271618-A Preparation of functional polymers using phosphide initiators BRIDGESTONE CORP 2015-01-07 CN disclosed
US-6172160-B1 A RUBBER CONTAINING A DIENE POLYMER COMPOSED OF A BRANCHED DIENE POLYMER COMPONENT HAVING ATLEAST THREE BRANCHED DIENE POLYMER CHAINS THROUGH A POLYFUNCTIONAL COUPLING AGENT AND A LINEAR DIENE POLYMER HAVING QUATERNARY AMMONIUM GROUP NIPPON ZEON CO., LTD. (JP) 2001-01-09 US disclosed
US-6147178-A RUBBER COMPRISING DIENE-VINYL AROMATIC COPOLYMER BEARING QUATERNARY AMMONIUM GROUPS; TENSILE STRENGTH, WEAR RESISTANCE, HEAT RESISTANCE, IMPROVED AFFINITY FOR SILICA REINFORCEMENT NIPPON ZEON CO., LTD. (JP) 2000-11-14 US disclosed
US-6075092-A DIENE RUBBER AND A SPECIFIED ETHYLENE OXIDE-PROPYLENE OXIDE-UNSATURATED OXIDE TERPOLYMER HAVING GIVEN MOONEY VISCOSITY; EXCELLENT HEAT BUILD-UP RESISTANCE, TENSILE STRENGTH AND PROCESSABILITY NIPPON ZEON CO., LTD. (JP) 2000-06-13 US disclosed
EP-0894825-A1 DIENE POLYMER COMPOSITION, PROCESS FOR THE PREPARATION OF THE SAME, AND RUBBER COMPOSITION CONTAINING THE SAME NIPPON ZEON CO., LTD. (JP) 1999-02-03 EP disclosed
EP-0894824-A1 RUBBER COMPOSITION NIPPON ZEON CO., LTD. (JP) 1999-02-03 EP disclosed
EP-0882738-A1 DIENE RUBBER, PROCESS FOR PRODUCING THE RUBBER AND RUBBER COMPOSITION CONTAINING THE SAME NIPPON ZEON CO., LTD. (JP) 1998-12-09 EP disclosed
US-4370028-A Method of producing liquid crystal display devices with alignment layer formed from organic tin compound of the type Rn SnX4-n SIEMENS AKTIENGESELLSCHAFT (DE) 1983-01-25 US disclosed
US-4148814-A Process for preparing monohydrocarbyltin trihalides PENNWALT CORPORATION (US) 1979-04-10 US disclosed
US-4093636-A IN PRESENCE OF ORGANIC HYDROPEROXIDES AND A TIN CATALYST RHONE - POULENC INDUSTRIES (FR) 1978-06-06 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230400764-A1 ORGANOMETALLIC COMPOUND COMPRISING A METAL COMBINED WITH AT LEAST ONE LIGAND CONTAINING FOUR OR MORE FLUORINE ATOMS, RESIST COMPOSITION COMPRISING THE SAME, AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME NR2C2, NR2F2, NR2E1 TSHR 2063/4885THRB 2006/4885ALDH1A1 3244/4885
US-20040220414-A1 Process for making allyl succinic anhydride STS, SUCLA2, CPS1 TSHR 3506/4885THRB 4004/4885ALDH1A1 330/4885
US-11912732-B2 Method for cleaving alkyl tin halides TERT, RNF213, ABL1 TSHR 380/4885THRB 1634/4885ALDH1A1 2522/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.