SCHEMBL4594745

SCHEMBL4594745

O=C1C=CC(=O)C(c2cccc3ccccc23)=C1c1cccc2ccccc12

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.52
MEN1 O00255 2/20 0.52
HPGD P15428 2/20 0.52
KMT2A Q03164 2/20 0.52
PTPN1 P18031 1/20 0.52
USP2 O75604 1/20 0.52
LMNA P02545 1/20 0.52
TP53 P04637 1/20 0.52
CYP1A2 P05177 1/20 0.52
CYP2D6 P10635 1/20 0.52
CYP2C9 P11712 1/20 0.52
ALOX12 P18054 1/20 0.52
MAPK1 P28482 1/20 0.52
CYP2C19 P33261 1/20 0.52
HIF1A Q16665 1/20 0.52
IDO1 P14902 1/20 0.48
MAOA P21397 1/20 0.48
MAOB P27338 1/20 0.48
CDC25B P30305 1/20 0.48
AKT1 P31749 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6851988 0.92 ALDH1A1 (0.62) ALDH1A1MEN1HPGDKMT2APTPN1
SCHEMBL15551758 0.87 PTPN1 (0.45) ALDH1A1MEN1HPGDKMT2APTPN1
SCHEMBL15551465 0.87 PTPN1 (0.45) ALDH1A1MEN1HPGDKMT2APTPN1
SCHEMBL28707190 0.82 ALDH1A1 (0.57) ALDH1A1MEN1HPGDKMT2APTPN1
SCHEMBL29273139 0.82 CES1 (0.43) ALDH1A1MEN1HPGDKMT2APTPN1
SCHEMBL27936012 0.80 PTPN1 (0.40) ALDH1A1MEN1HPGDKMT2APTPN1
Phenanthrene SCHEMBL27811748 0.77 IDO1 (0.67) ALDH1A1MEN1HPGDKMT2APTPN1
SCHEMBL197980 0.76 PTPN1 (0.59) ALDH1A1MEN1HPGDKMT2APTPN1
SCHEMBL25302086 0.75 ALDH1A1 (0.59) ALDH1A1HPGDPTPN1TP53CYP1A2
SCHEMBL29350007 0.75 ALDH1A1 (0.59) ALDH1A1HPGDPTPN1TP53CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230259046-A1 ELECTROPHOTOGRAPHIC PHOTORECEPTOR, CARTRIDGE USING SAME, AND IMAGE FORMING DEVICE MITSUBISHI CHEMICAL CORPORATION (JP) 2023-08-17 US claimed
US-20230056801-A1 Electrophotographic Photoreceptor, Electrophotographic Photoreceptor Cartridge, and Image Forming Device MITSUBISHI CHEMICAL CORPORATION (JP) 2023-02-23 US claimed
US-20060003242-A1 Method of making coating composition for producing single layered photosensitive layer by using homogenizer SAMSUNG ELECTRONICS CO., LTD. (KR) 2006-01-05 US claimed
WO-2024143485-A1 COMPOUND, COMPOSITION, AND ELECTROPHOTOGRAPHIC PHOTORECEPTOR 三菱ケミカル株式会社 2024-07-04 WO disclosed
WO-2024143484-A1 COMPOUND, COMPOSITION, AND ELECTROPHOTOGRAPHIC PHOTORECEPTOR 三菱ケミカル株式会社 2024-07-04 WO disclosed
US-20240134296-A1 Electrophotographic Photoreceptor, Electrophotographic Photoreceptor Cartridge, and Image Forming Apparatus MITSUBISHI CHEMICAL CORPORATION (JP) 2024-04-25 US disclosed
WO-2023190690-A1 ELECTROPHOTOGRAPHIC PHOTORECEPTOR, ELECTROPHOTOGRAPHIC PHOTORECEPTOR CARTRIDGE, IMAGE FORMATION DEVICE, AND COMPOUND 三菱ケミカル株式会社 2023-10-05 WO disclosed
WO-2023190691-A1 ELECTROPHOTOGRAPHIC PHOTORECEPTOR, ELECTROPHOTOGRAPHIC PHOTORECEPTOR CARTRIDGE, AND IMAGE FORMATION DEVICE 三菱ケミカル株式会社 2023-10-05 WO disclosed
US-20230296995-A1 ELECTROPHOTOGRAPHIC PHOTORECEPTOR, ELECTROPHOTOGRAPHIC PHOTORECEPTOR CARTRIDGE, AND IMAGE FORMING DEVICE MITSUBISHI CHEMICAL CORPORATION (JP) 2023-09-21 US disclosed
US-20230259046-A1 ELECTROPHOTOGRAPHIC PHOTORECEPTOR, CARTRIDGE USING SAME, AND IMAGE FORMING DEVICE MITSUBISHI CHEMICAL CORPORATION (JP) 2023-08-17 US disclosed
WO-2023127784-A1 ELECTROPHOTOGRAPHIC PHOTORECEPTOR, COATING LIQUID FOR ELECTROPHOTOGRAPHIC PHOTORECEPTOR LAYER FORMATION, COMPOUND, ELECTROPHOTOGRAPHIC PHOTORECEPTOR CARTRIDGE, AND IMAGE FORMATION DEVICE 三菱ケミカル株式会社 2023-07-06 WO disclosed
US-6593047-B2 Binder resin contains a polycarbonate resin; solid content of the hole transferring material and the electron transferring material is not less than 30% by weight and not more than 50% by weight based on the entire solid content. KYOCERA MITA CORPORATION (JP) 2003-07-15 US disclosed
US-6573017-B2 Electroconductive substrate overcoated with photosensitive layer; sensitivity, wear resistance and ozone resistance KYOCERA MITA CORPORATION (JP) 2003-06-03 US disclosed
US-20020159804-A1 Image forming apparatus KYOCERA MITA CORPORATION (JP) 2002-10-31 US disclosed
US-6461779-B1 PHOTOSENSITIVE LAYER CONTAINS POLYOXYALKYLENE GLYCOL; FOR USE IN ELECTROSTATIC COPYING MACHINE, FACSIMILE AND LASER BEAM PRINTER; WEAR RESISTANCE; SHELF-LIFE KYOCERA MITA CORPORATION (JP) 2002-10-08 US disclosed
EP-1243974-A1 Single-layer type electrophotosensitive material KYOCERA MITA CORPORATION (JP) 2002-09-25 EP disclosed
US-20020119385-A1 Single-layer type electrophotosensitive material KYOCERA MITA CORPORATION (JP) 2002-08-29 US disclosed
US-20020098428-A1 Single-layer type electrophotosensitive material KYOCERA MITA CORPORATION (JP) 2002-07-25 US disclosed
US-20020045119-A1 Single-layer type electrophotosensitive material KYOCERA MITA CORPORATION (JP) 2002-04-18 US disclosed
EP-1184728-A2 Single-layer type electrophotosensitive material Kyocera Mita Corporation (JP) 2002-03-06 EP disclosed