SCHEMBL4594790

SCHEMBL4594790

[CH2]c1nc(C)c(C)c(C)c1C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL77010 0.75 IDO1 (0.35)
SCHEMBL9945369 0.69
SCHEMBL862543 0.67 IDO1 (0.31)
SCHEMBL4681937 0.67 SMN1; SMN2 (0.32)
SCHEMBL13024699 0.65 LMNA (0.32)
SCHEMBL862319 0.65 IDO1 (0.30)
SCHEMBL2323940 0.62 LMNA (0.36)
SCHEMBL4639401 0.62 LMNA (0.48)
SCHEMBL5053819 0.62
SCHEMBL13652074 0.62

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1872942-B1 Lithographic printing plate precursor and lithographic printing method FUJIFILM CORP (JP) 2014-06-18 EP disclosed
EP-1764650-B1 Photosensitive composition, and lithographic printing plate precursor and image-recording method using the same FUJIFILM CORP (JP) 2013-02-27 EP disclosed
EP-1872942-A2 Lithographic printing plate precursor and lithographic printing method FUJIFILM Corporation (JP) 2008-01-02 EP disclosed
US-20070072113-A1 Photosensitive composition, and lithographic printing plate precursor and image-recording method using the same FUJI PHOTO FILM CO., LTD. 2007-03-29 US disclosed
EP-1764650-A1 Photosensitive composition, and lithographic printing plate precursor and image-recording method using the same FUJIFILM Corporation (JP) 2007-03-21 EP disclosed