SCHEMBL4595081

SCHEMBL4595081

C(C=Cc1ccc(C=CC=C(c2ccccc2)c2ccccc2)cc1)=Cc1ccccc1

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAOB P27338 5/20 0.58
LMNA P02545 4/20 0.45
ALDH1A1 P00352 3/20 0.45
TRPA1 O75762 1/20 0.45
ALOX5 P09917 1/20 0.45
MAPK1 P28482 1/20 0.45
HDAC1 Q13547 2/20 0.44
HDAC3 O15379 1/20 0.44
HDAC4 P56524 1/20 0.44
HDAC7 Q8WUI4 1/20 0.44
HDAC2 Q92769 1/20 0.44
HDAC10 Q969S8 1/20 0.44
HDAC11 Q96DB2 1/20 0.44
HDAC8 Q9BY41 1/20 0.44
HDAC6 Q9UBN7 1/20 0.44
HDAC9 Q9UKV0 1/20 0.44
HDAC5 Q9UQL6 1/20 0.44
PLIN1 O60240 1/20 0.44
BCHE P06276 1/20 0.44
MAPT P10636 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11415300 0.96 MAOB (0.56) MAOBLMNAALDH1A1TRPA1ALOX5
SCHEMBL2044828 0.96 MAOB (0.50) MAOBLMNAALDH1A1TRPA1ALOX5
SCHEMBL2044831 0.96 MAOB (0.50) MAOBLMNAALDH1A1TRPA1ALOX5
SCHEMBL393155 0.96 MAOB (0.56) MAOBLMNAALDH1A1TRPA1ALOX5
SCHEMBL28592721 0.92 MAOB (0.58) MAOBLMNAALDH1A1TRPA1ALOX5
SCHEMBL19422627 0.86 NFE2L2 (0.55) MAOBTNFRSF1APLA2G7NPC1RAB9A
SCHEMBL27959116 0.86 CYP19A1 (0.55) MAOBLMNAMAPTCYP1B1MCL1
SCHEMBL2166590 0.85 LMNA (0.40) MAOBLMNAALDH1A1MAPK1MAPT
SCHEMBL2210691 0.85 LMNA (0.40) MAOBLMNAALDH1A1MAPK1MAPT
SCHEMBL15907934 0.85 CYP1B1 (0.45) MAOBLMNAALDH1A1TRPA1HDAC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1878067-A1 POROUS SEMICONDUCTOR LAYER FORMATION MATERIAL SEIKO EPSON CORPORATION (JP) 2008-01-16 EP disclosed
WO-2006112514-A1 POROUS SEMICONDUCTOR LAYER FORMATION MATERIAL SEIKO EPSON CORPORATION (JP) 2006-10-26 WO disclosed
EP-1676327-A1 PURIFICATION OF HOLE TRANSPORTING MATERIAL BY MEANS OF ULTRAFILTRATION AND ION EXCHANGE CHROMATOGRAPHY SEIKO EPSON CORPORATION (JP) 2006-07-05 EP disclosed
WO-2006022439-A1 COMPOSITION FOR CONDUCTIVE MATERIALS COMPRISING TETRA ACRYLATE FUNCTIONALISED ARYLAMINES, CONDUCTIVE MATERIAL AND LAYER, ELECTRONIC DEVICE EQUIPMENT SEIKO EPSON CORPORATION (JP) 2006-03-02 WO disclosed
WO-2005041321-A1 PURIFICATION OF HOLE TRANSPORTING MATERIAL BY MEANS OF ULTRAFILTRATION AND ION EXCHANGE CHROMATOGRAPHY SEIKO EPSON CORPORATION (JP) 2005-05-06 WO disclosed