SCHEMBL4595847

SCHEMBL4595847

C=CC(=O)Oc1ccc(CC)cc1

nearest known ligand 0.74

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
THRB P10828 3/20 0.74
POLB P06746 1/20 0.51
RAB9A P51151 2/20 0.50
ALDH1A1 P00352 3/20 0.46
RXRA P19793 1/20 0.45
RXRB P28702 1/20 0.45
SMN1; SMN2 Q16637 3/20 0.44
CYP2C19 P33261 1/20 0.44
MAPT P10636 2/20 0.43
LMNA P02545 2/20 0.42
HPGD P15428 2/20 0.42
THRA P10827 1/20 0.42
MAOB P27338 1/20 0.42
ELANE P08246 1/20 0.42
KMT2A Q03164 2/20 0.41
PPARG P37231 1/20 0.41
PPARA Q07869 1/20 0.41
NPC1 O15118 1/20 0.41
TSHR P16473 1/20 0.41
MEN1 O00255 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15397339 0.92 THRB (0.64) THRBPOLBRAB9AALDH1A1RXRA
SCHEMBL22604958 0.92 THRB (0.64) THRBPOLBRAB9AALDH1A1RXRA
SCHEMBL22149021 0.87 THRB (0.59) THRBPOLBRAB9AALDH1A1RXRA
SCHEMBL12086464 0.87 THRB (0.59) THRBPOLBRAB9AALDH1A1SMN1; SMN2
SCHEMBL4596017 0.85 THRB (1.00) THRBRAB9AALDH1A1SMN1; SMN2MAPT
SCHEMBL13777846 0.85 THRB (0.56) THRBPOLBRAB9AALDH1A1RXRA
SCHEMBL14610166 0.84 POLB (0.62) THRBPOLBRAB9AALDH1A1RXRA
SCHEMBL9177889 0.84 POLB (0.62) THRBPOLBRAB9AALDH1A1RXRA
SCHEMBL99981 0.84 THRB (0.68) THRBPOLBTHRAELANEKMT2A
SCHEMBL2580708 0.84 THRB (0.68) THRBPOLBTHRAELANEKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119775993-A Quantum dot, composition containing quantum dot and display panel 纳晶科技股份有限公司 2025-04-08 CN claimed
CN-118336128-A High-safety semi-solid lithium ion battery and preparation method thereof 华鼎国联动力电池有限公司 2024-07-12 CN claimed
WO-1991018861-A1 2-(HYDROXYMETHYL) ACRYLATE DERIVATIVES AND PROCESS FOR THEIR PREPARATION COMMONWEALTH SCIENTIFIC AND INDUSTRIAL RESEARCH ORGANISATION (AU) 1991-12-12 WO claimed
EP-4267708-B1 THERMALLY RESPONSIVE BRUSH POLYMERS HAVING A COPOLYMER BACKBONE AND COPOLYMER ARMS INFINEUM INT LTD (GB) 2025-07-02 EP disclosed
US-20250154377-A1 HIGH-RELIABILITY FAST-CURING UV GLUE FOR OUTER LAYER PROTECTION OF POWER BATTERY, AND PREPARATION METHOD AND APPLICATION THEREOF Weldtone Technology Co., Ltd. (CN) 2025-05-15 US disclosed
WO-2025081967-A1 HIGH-RELIABILITY FAST-CURING UV ADHESIVE FOR OUTER LAYER PROTECTION OF POWER BATTERY, PREPARATION METHOD THEREFOR AND USE THEREOF 韦尔通科技股份有限公司 2025-04-24 WO disclosed
US-12281203-B2 Thermally responsive brush polymers having a copolymer backbone and copolymer arms INFINEUM INTERNATIONAL LIMITED (GB) 2025-04-22 US disclosed
CN-119775993-A Quantum dot, composition containing quantum dot and display panel 纳晶科技股份有限公司 2025-04-08 CN disclosed
CN-119447492-A Method for improving poor final sealing of semi-solid battery 华鼎国联动力电池有限公司 2025-02-14 CN disclosed
US-20240309155-A1 Thermally Responsive Brush Polymers Having a Copolymer Backbone and Copolymer Arms INFINEUM INTERNATIONAL LIMITED (GB) 2024-09-19 US disclosed
CN-118336128-A High-safety semi-solid lithium ion battery and preparation method thereof 华鼎国联动力电池有限公司 2024-07-12 CN disclosed
US-20020086233-A1 Useful in a lithographic printing plates FUJIFILM CORPORATION (JP) 2002-07-04 US disclosed
US-20020051929-A1 Using a fluorine-containing polymer in the photosensitive resin composition to give high contrast of printing plate image while maintaining press life FUJIFILM CORPORATION (JP) 2002-05-02 US disclosed
US-6310237-B1 REACTIONS OF ALPHA-UNSATURATED CARBOXY ACIDS, ESTERS, AMIDES OR THIOESTERS WITH OF 1.) A LEWIS ACID OR BASE OR 2.) HYDROGEN AND TRANSITION METALS OR THEIR OXIDES, OR 3.) ALKYL ALUMINUMS, ALKYL HYDRIDES, SOLUBLE NICKEL OR PALLADIUM SALTS UNIROYAL CHEMICAL COMPANY, INC. 2001-10-30 US disclosed
US-6147251-A PREPARATION OF DERIVATIVES OF HALO-BUT-2-ENOIC ACIDS AND ESTERS HIGH IN 2-ENE CONTENT; CATALYST PROMOTERS IN ETHYLENE POLYMERIZATION AND COPOLYMERIZATION UNIROYAL CHEMICAL COMPANY, INC. (US) 2000-11-14 US disclosed
US-6132931-A A FLUORINE-CONTAINING POLYURETHANE COPOLYMER; FORMING A HIGH CONTRAST IMAGE, INHIBITING HALATION, A SAFE LIGHT TOLERANCE AND A WIDE DEVELOPMENT LATITUDE, WITHOUT LOWERING THE SENSITIVITY FUJI PHOTO FILM CO., LTD. (JP) 2000-10-17 US disclosed
US-6110640-A Photosensitive composition FUJI PHOTO FILM CO., LTD. (JP) 2000-08-29 US disclosed
EP-0949539-A2 Photosensitive resin composition FUJI PHOTO FILM CO., LTD. (JP) 1999-10-13 EP disclosed
EP-0843218-A1 Photosensitive composition FUJI PHOTO FILM CO., LTD. (JP) 1998-05-20 EP disclosed
WO-1991018861-A1 2-(HYDROXYMETHYL) ACRYLATE DERIVATIVES AND PROCESS FOR THEIR PREPARATION COMMONWEALTH SCIENTIFIC AND INDUSTRIAL RESEARCH ORGANISATION (AU) 1991-12-12 WO disclosed