SCHEMBL4596017

SCHEMBL4596017

C=CC(=O)Oc1ccc(CCC)cc1

nearest known ligand 1.00 ✓ in ChEMBL — recovers established targets

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
THRB P10828 11/20 1.00
KMT2A Q03164 3/20 0.51
PLA2G1B P04054 1/20 0.51
ATG4B Q9Y4P1 1/20 0.51
NPC1 O15118 2/20 0.48
MAPT P10636 2/20 0.48
RAB9A P51151 2/20 0.48
CASP3 P42574 1/20 0.48
SMN1; SMN2 Q16637 1/20 0.48
SENP8 Q96LD8 1/20 0.48
SENP7 Q9BQF6 1/20 0.48
SENP6 Q9GZR1 1/20 0.48
THRA P10827 8/20 0.47
ALDH1A1 P00352 2/20 0.46
MEN1 O00255 1/20 0.45
PLK1 P53350 1/20 0.43
HPGD P15428 1/20 0.43
TSHR P16473 1/20 0.43
LMNA P02545 1/20 0.42
L3MBTL1 Q9Y468 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7787037 0.98 THRB (0.97) THRBKMT2APLA2G1BATG4BNPC1
SCHEMBL7212815 0.95 THRB (0.90) THRBKMT2APLA2G1BATG4BNPC1
SCHEMBL815739 0.95 THRB (0.90) THRBKMT2APLA2G1BATG4BNPC1
SCHEMBL7218288 0.92 THRB (0.85) THRBKMT2APLA2G1BATG4BNPC1
SCHEMBL22605051 0.92 THRB (0.85) THRBKMT2APLA2G1BATG4BNPC1
SCHEMBL14004245 0.92 THRB (0.85) THRBKMT2APLA2G1BATG4BNPC1
SCHEMBL74647 0.91 THRB (0.82) THRBKMT2APLA2G1BATG4BTHRA
SCHEMBL3613955 0.91 THRB (0.82) THRBKMT2APLA2G1BATG4BNPC1
SCHEMBL1401854 0.90 THRB (0.91) THRBKMT2ATHRAALDH1A1MEN1
SCHEMBL7214472 0.89 THRB (0.80) THRBKMT2APLA2G1BATG4BNPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 113 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111542348-B Material for intraocular lens 株式会社目立康 2022-07-05 CN claimed
CN-1280337-C Poly (phenylene ether)-polyvinyl thermosetting resin GEN ELECTRIC (US) 2006-10-18 CN claimed
EP-0012948-B1 SCRATCH-RESISTANT, DYEABLE COATING COMPOSITIONS FOR SYNTHETIC RESIN ARTICLES MITSUBISHI RAYON CO., LTD. (JP) 1983-02-02 EP claimed
CN-113164328-B Difunctional and multifunctional coinitiators in dental compositions 登士柏德特里有限公司 2024-02-27 CN disclosed
CN-113099718-B Imidazole/thiol polymerization initiation system 登士柏希罗纳有限公司 2024-02-13 CN disclosed
CN-112135598-B Macromer-based photocurable dental impression material 登士柏希罗纳有限公司 2023-12-22 CN disclosed
CN-112839981-B dental composition 登士柏德特里有限公司 2023-11-17 CN disclosed
CN-117042728-A Implant 斯卡勒植入物公司 2023-11-10 CN disclosed
CN-114072122-B Redox curable dental compositions 登士柏德特里有限公司 2023-11-03 CN disclosed
CN-113692269-B Dental composition 登士柏希罗纳有限公司 2023-10-27 CN disclosed
CN-112638348-B Method and composition for stabilizing nanogels and dental compositions produced from nanogels 登士柏希罗纳有限公司 2023-10-24 CN disclosed
US-20020051929-A1 Using a fluorine-containing polymer in the photosensitive resin composition to give high contrast of printing plate image while maintaining press life FUJIFILM CORPORATION (JP) 2002-05-02 US disclosed
CN-1346829-A Acrylate compounds and use MITSUI CHEMICALS INC (JP) 2002-05-01 CN disclosed
CN-1283614-A Sulfur-bearing unsaturated carboxylic ester compound and use thereof MITSUI CHEMICAL IND CO LTD (JP) 2001-02-14 CN disclosed
US-6132931-A A FLUORINE-CONTAINING POLYURETHANE COPOLYMER; FORMING A HIGH CONTRAST IMAGE, INHIBITING HALATION, A SAFE LIGHT TOLERANCE AND A WIDE DEVELOPMENT LATITUDE, WITHOUT LOWERING THE SENSITIVITY FUJI PHOTO FILM CO., LTD. (JP) 2000-10-17 US disclosed
US-6110640-A Photosensitive composition FUJI PHOTO FILM CO., LTD. (JP) 2000-08-29 US disclosed
EP-0949539-A2 Photosensitive resin composition FUJI PHOTO FILM CO., LTD. (JP) 1999-10-13 EP disclosed
CN-1203255-A Curable resin composition adhesive composition, cured product and composite DENKI KAGAKU KOGYO KK (JP) 1998-12-30 CN disclosed
US-5792822-A COMPRISING A METAL COMPLEXES AS ULTRAVIOLET LIGHT ADSORBER AND BLOCKING AGENT; RADIATION RESISTANCE, LIGHTWEIGHT, STABILITY; EYEGLASS LENS, CONTACT LENS, DISPLAY FILTER SEIKO EPSON CORPORATION (JP) 1998-08-11 US disclosed
EP-0843218-A1 Photosensitive composition FUJI PHOTO FILM CO., LTD. (JP) 1998-05-20 EP disclosed