SCHEMBL4596309

SCHEMBL4596309

C=C(C)C(=O)OCc1ccccc1C(C)C

nearest known ligand 0.43

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.43
LPAR1 Q92633 2/20 0.40
SLC6A2 P23975 2/20 0.38
SLC6A4 P31645 2/20 0.38
SLC6A3 Q01959 2/20 0.38
CASP1 P29466 1/20 0.38
NLRP3 Q96P20 2/20 0.36
ELANE P08246 1/20 0.36
GABRA1 P14867 1/20 0.35
GABRB2 P47870 1/20 0.35
ALDH1A1 P00352 1/20 0.35
POLB P06746 1/20 0.35
APEX1 P27695 1/20 0.35
HTT P42858 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
THRB P10828 1/20 0.34
GLRA1 P23415 1/20 0.34
ADAM17 P78536 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5580229 0.85 TSHR (0.39) TSHRSLC6A4CASP1ELANEALDH1A1
SCHEMBL29577269 0.85 TSHR (0.44) TSHRELANEALDH1A1POLBAPEX1
SCHEMBL4202389 0.85 TSHR (0.44) TSHRELANEALDH1A1POLBAPEX1
SCHEMBL10583241 0.83 ALDH1A1 (0.52) LPAR1SLC6A2SLC6A4SLC6A3NLRP3
SCHEMBL24503486 0.82 NPC1 (0.42) TSHRLPAR1SLC6A2SLC6A4SLC6A3
SCHEMBL4596083 0.81 TSHR (0.47) TSHRSLC6A2CASP1ELANEGABRA1
SCHEMBL31707533 0.80 ALDH1A1 (0.52) TSHRELANEALDH1A1POLBAPEX1
SCHEMBL1372181 0.80 THRB (0.42) TSHRELANEGABRA1GABRB2ALDH1A1
SCHEMBL28754584 0.79 SLC6A2 (0.36) TSHRLPAR1SLC6A2SLC6A4SLC6A3
SCHEMBL995952 0.79 CYP4F2 (0.45) TSHRELANEALDH1A1POLBAPEX1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0843218-B1 Photosensitive composition FUJIFILM CORP (JP) 2008-01-16 EP disclosed
US-6746812-B2 USING A FLUORINE-CONTAINING POLYMER IN THE PHOTOSENSITIVE RESIN COMPOSITION TO GIVE HIGH CONTRAST OF PRINTING PLATE IMAGE WHILE MAINTAINING PRESS LIFE FUJI PHOTO FILM CO., LTD. (JP) 2004-06-08 US disclosed
EP-1314552-A2 Photosensitive resin composition FUJI PHOTO FILM CO., LTD. (JP) 2003-05-28 EP disclosed
EP-0949539-B1 Photosensitive resin composition FUJI PHOTO FILM CO LTD (JP) 2003-03-19 EP disclosed
EP-1225478-A2 Photosensitive resin composition FUJI PHOTO FILM CO., LTD. (JP) 2002-07-24 EP disclosed
US-6423467-B1 USEFUL IN A LITHOGRAPHIC PRINTING PLATES FUJI PHOTO FILM CO., LTD. (JP) 2002-07-23 US disclosed
US-20020086233-A1 Useful in a lithographic printing plates FUJIFILM CORPORATION (JP) 2002-07-04 US disclosed
US-20020051929-A1 Using a fluorine-containing polymer in the photosensitive resin composition to give high contrast of printing plate image while maintaining press life FUJIFILM CORPORATION (JP) 2002-05-02 US disclosed
US-6132931-A A FLUORINE-CONTAINING POLYURETHANE COPOLYMER; FORMING A HIGH CONTRAST IMAGE, INHIBITING HALATION, A SAFE LIGHT TOLERANCE AND A WIDE DEVELOPMENT LATITUDE, WITHOUT LOWERING THE SENSITIVITY FUJI PHOTO FILM CO., LTD. (JP) 2000-10-17 US disclosed
US-6110640-A Photosensitive composition FUJI PHOTO FILM CO., LTD. (JP) 2000-08-29 US disclosed
EP-0949539-A2 Photosensitive resin composition FUJI PHOTO FILM CO., LTD. (JP) 1999-10-13 EP disclosed
EP-0843218-A1 Photosensitive composition FUJI PHOTO FILM CO., LTD. (JP) 1998-05-20 EP disclosed