SCHEMBL4596083

SCHEMBL4596083

C=C(C)C(=O)OCc1ccccc1CC(C)C

nearest known ligand 0.47

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.47
GABRA1 P14867 1/20 0.41
GABRB2 P47870 1/20 0.41
ALDH1A1 P00352 4/20 0.37
ELANE P08246 1/20 0.36
POLB P06746 1/20 0.35
APEX1 P27695 1/20 0.35
HTT P42858 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
CASP1 P29466 1/20 0.35
NPC1 O15118 1/20 0.35
THRB P10828 1/20 0.34
PGR P06401 1/20 0.34
ADORA3 P0DMS8 1/20 0.34
PTGS1 P23219 1/20 0.34
SLC6A2 P23975 1/20 0.34
MAPT P10636 1/20 0.33
KDM4E B2RXH2 1/20 0.33
LMNA P02545 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4202389 0.88 TSHR (0.44) TSHRALDH1A1ELANEPOLBAPEX1
SCHEMBL29577269 0.88 TSHR (0.44) TSHRALDH1A1ELANEPOLBAPEX1
SCHEMBL31707533 0.83 ALDH1A1 (0.52) TSHRALDH1A1ELANEPOLBAPEX1
SCHEMBL1372181 0.83 THRB (0.42) TSHRGABRA1GABRB2ALDH1A1ELANE
SCHEMBL995952 0.82 CYP4F2 (0.45) TSHRALDH1A1ELANEPOLBAPEX1
SCHEMBL4596309 0.81 TSHR (0.43) TSHRGABRA1GABRB2ALDH1A1ELANE
SCHEMBL14279975 0.81 IDO1 (0.46) TSHRALDH1A1ELANEPOLBAPEX1
SCHEMBL4596132 0.79 THRB (0.42) TSHRALDH1A1ELANEPOLBAPEX1
SCHEMBL4596026 0.79 ELANE (0.43) TSHRGABRA1GABRB2ELANEPOLB
SCHEMBL962436 0.79 IDO1 (0.47) TSHRALDH1A1ELANEPOLBAPEX1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0843218-B1 Photosensitive composition FUJIFILM CORP (JP) 2008-01-16 EP disclosed
US-6746812-B2 USING A FLUORINE-CONTAINING POLYMER IN THE PHOTOSENSITIVE RESIN COMPOSITION TO GIVE HIGH CONTRAST OF PRINTING PLATE IMAGE WHILE MAINTAINING PRESS LIFE FUJI PHOTO FILM CO., LTD. (JP) 2004-06-08 US disclosed
EP-1314552-A2 Photosensitive resin composition FUJI PHOTO FILM CO., LTD. (JP) 2003-05-28 EP disclosed
EP-0949539-B1 Photosensitive resin composition FUJI PHOTO FILM CO LTD (JP) 2003-03-19 EP disclosed
EP-1225478-A2 Photosensitive resin composition FUJI PHOTO FILM CO., LTD. (JP) 2002-07-24 EP disclosed
US-6423467-B1 USEFUL IN A LITHOGRAPHIC PRINTING PLATES FUJI PHOTO FILM CO., LTD. (JP) 2002-07-23 US disclosed
US-20020086233-A1 Useful in a lithographic printing plates FUJIFILM CORPORATION (JP) 2002-07-04 US disclosed
US-20020051929-A1 Using a fluorine-containing polymer in the photosensitive resin composition to give high contrast of printing plate image while maintaining press life FUJIFILM CORPORATION (JP) 2002-05-02 US disclosed
US-6132931-A A FLUORINE-CONTAINING POLYURETHANE COPOLYMER; FORMING A HIGH CONTRAST IMAGE, INHIBITING HALATION, A SAFE LIGHT TOLERANCE AND A WIDE DEVELOPMENT LATITUDE, WITHOUT LOWERING THE SENSITIVITY FUJI PHOTO FILM CO., LTD. (JP) 2000-10-17 US disclosed
US-6110640-A Photosensitive composition FUJI PHOTO FILM CO., LTD. (JP) 2000-08-29 US disclosed
EP-0949539-A2 Photosensitive resin composition FUJI PHOTO FILM CO., LTD. (JP) 1999-10-13 EP disclosed
EP-0843218-A1 Photosensitive composition FUJI PHOTO FILM CO., LTD. (JP) 1998-05-20 EP disclosed