SCHEMBL4596471

SCHEMBL4596471

C=CC(=O)OC(C)(C)c1ccccc1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.48
ALOX15 P16050 1/20 0.48
MAPK1 P28482 1/20 0.47
CYP2C19 P33261 3/20 0.44
HIF1A Q16665 1/20 0.44
MAPT P10636 1/20 0.41
KMT2A Q03164 1/20 0.41
THRB P10828 1/20 0.41
TSHR P16473 1/20 0.41
KCNN4 O15554 1/20 0.40
AKT1 P31749 1/20 0.39
CYP3A4 P08684 1/20 0.39
CYP2C9 P11712 1/20 0.39
HDAC3 O15379 1/20 0.39
HDAC4 P56524 1/20 0.39
HDAC1 Q13547 1/20 0.39
HDAC7 Q8WUI4 1/20 0.39
HDAC2 Q92769 1/20 0.39
HDAC10 Q969S8 1/20 0.39
HDAC11 Q96DB2 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ethane SCHEMBL28624063 0.98 ALDH1A1 (0.47) ALDH1A1ALOX15MAPK1CYP2C19HIF1A
SCHEMBL20494345 0.90 THRB (0.37) ALDH1A1ALOX15MAPK1CYP2C19HIF1A
SCHEMBL22829480 0.87 ESR1 (0.35) ALDH1A1ALOX15MAPK1CYP2C19HIF1A
SCHEMBL3169549 0.87 CYP2C19 (0.46) ALDH1A1ALOX15MAPK1CYP2C19HIF1A
SCHEMBL30887689 0.85 CYP2C19 (0.44) ALDH1A1ALOX15MAPK1CYP2C19HIF1A
SCHEMBL27634486 0.84 CYP2C19 (0.43) ALDH1A1ALOX15MAPK1CYP2C19HIF1A
SCHEMBL31132053 0.83 THRB (0.39) ALDH1A1ALOX15CYP2C19HIF1ATHRB
SCHEMBL1153650 0.83 THRB (0.46) ALDH1A1MAPK1CYP2C19HIF1AMAPT
SCHEMBL13704977 0.82 THRB (0.44) ALDH1A1ALOX15MAPK1CYP2C19HIF1A
SCHEMBL7859075 0.82 HTT (0.46) ALDH1A1ALOX15CYP2C19HIF1AMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 59 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111542348-B Material for intraocular lens 株式会社目立康 2022-07-05 CN claimed
US-7094860-B2 Maleimide group-containing polymer particles and method of producing the same FUJI XEROX CO., LTD. (JP) 2006-08-22 US claimed
US-20050014924-A1 Maleimide group-containing polymer particles and method of producing the same FUJI XEROX CO., LTD. (JP) 2005-01-20 US claimed
EP-4267708-B1 THERMALLY RESPONSIVE BRUSH POLYMERS HAVING A COPOLYMER BACKBONE AND COPOLYMER ARMS INFINEUM INT LTD (GB) 2025-07-02 EP disclosed
US-12281203-B2 Thermally responsive brush polymers having a copolymer backbone and copolymer arms INFINEUM INTERNATIONAL LIMITED (GB) 2025-04-22 US disclosed
CN-119827496-A Method for testing acid strength and acid production efficiency by using photoetching machine and application 上海微悦芯材新材料有限责任公司 2025-04-15 CN disclosed
CN-119827495-A Method for testing alkali purity, alkali strength and alkali residue by using photoetching machine 上海微悦芯材新材料有限责任公司 2025-04-15 CN disclosed
US-20240309155-A1 Thermally Responsive Brush Polymers Having a Copolymer Backbone and Copolymer Arms INFINEUM INTERNATIONAL LIMITED (GB) 2024-09-19 US disclosed
CN-118284591-A Secondonohydrofluoroalkane selective adduct and process for producing the same 国立大学法人 奈良先端科学技术大学院大学 2024-07-02 CN disclosed
EP-4267708-A1 THERMALLY RESPONSIVE BRUSH POLYMERS HAVING A COPOLYMER BACKBONE AND COPOLYMER ARMS Infineum International Limited (GB) 2023-11-01 EP disclosed
CN-116981758-A Thermally responsive brush polymers having a copolymer backbone and copolymer arms 英菲诺姆国际有限公司 2023-10-31 CN disclosed
US-6132931-A A FLUORINE-CONTAINING POLYURETHANE COPOLYMER; FORMING A HIGH CONTRAST IMAGE, INHIBITING HALATION, A SAFE LIGHT TOLERANCE AND A WIDE DEVELOPMENT LATITUDE, WITHOUT LOWERING THE SENSITIVITY FUJI PHOTO FILM CO., LTD. (JP) 2000-10-17 US disclosed
US-6110640-A Photosensitive composition FUJI PHOTO FILM CO., LTD. (JP) 2000-08-29 US disclosed
EP-1004936-A1 RESIST RESIN, RESIST RESIN COMPOSITION, AND PROCESS FOR PATTERNING THEREWITH Showa Denko K K (JP) 2000-05-31 EP disclosed
EP-0949539-A2 Photosensitive resin composition FUJI PHOTO FILM CO., LTD. (JP) 1999-10-13 EP disclosed
EP-0843218-A1 Photosensitive composition FUJI PHOTO FILM CO., LTD. (JP) 1998-05-20 EP disclosed
US-5147867-A Bactericides, (carba)penicillins MERCK & CO., INC. (US) 1992-09-15 US disclosed
US-5145990-A Dehydropeptidase, carbapenicillin potentiation MERCK & CO., INC. (US) 1992-09-08 US disclosed
US-4962097-A IN COMBINATION WITH A CARBAPENEM OR PENEM ANTIBIOTIC MERCK & CO., INC. (US) 1990-10-09 US disclosed
EP-0366469-A2 Phosphorus containing enzyme inhibitors MERCK & CO. INC. (US) 1990-05-02 EP disclosed