SCHEMBL4596595

SCHEMBL4596595

Cc1ccc(-c2c(-c3ccc(N)cc3)ccc(N(c3ccc(C)cc3)c3ccc(C)cc3)c2-c2ccc(C)cc2)cc1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ACHE P22303 1/20 0.41
HEXA P06865 1/20 0.36
HEXB P07686 1/20 0.36
ALDH1A1 P00352 6/20 0.35
TDP1 Q9NUW8 4/20 0.35
L3MBTL1 Q9Y468 4/20 0.35
MAPT P10636 4/20 0.35
CYP3A4 P08684 3/20 0.35
KDM4E B2RXH2 2/20 0.35
CYP1A2 P05177 1/20 0.35
CYP2D6 P10635 1/20 0.35
CYP2C9 P11712 1/20 0.35
CYP2C19 P33261 1/20 0.35
PTGS2 P35354 2/20 0.35
PTGS1 P23219 1/20 0.35
TSHR P16473 3/20 0.34
MAPK1 P28482 2/20 0.34
TEAD4 Q15561 1/20 0.34
PSMD14 O00487 1/20 0.34
RECQL P46063 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9330660 0.92 CYP3A4 (0.41) ALDH1A1TDP1L3MBTL1MAPTCYP3A4
SCHEMBL10522612 0.86 ALDH1A1 (0.48) ACHEALDH1A1TDP1L3MBTL1MAPT
SCHEMBL28845467 0.84 ALDH1A1 (0.47) ACHEALDH1A1TDP1L3MBTL1MAPT
SCHEMBL29475171 0.84 ALDH1A1 (0.56) ACHEALDH1A1TDP1L3MBTL1MAPT
SCHEMBL258852 0.84 ACHE (0.41) ACHEHEXAHEXBALDH1A1TDP1
SCHEMBL31501053 0.84 NPC1 (0.34) ACHEALDH1A1TDP1L3MBTL1MAPT
SCHEMBL1556729 0.84 TDP1 (0.46) HEXAHEXBALDH1A1TDP1MAPT
SCHEMBL31260548 0.83 ALDH1A1 (0.44) ALDH1A1TDP1L3MBTL1MAPTCYP3A4
SCHEMBL297638 0.83 ALDH1A1 (0.48) ACHEALDH1A1TDP1L3MBTL1MAPT
SCHEMBL28856605 0.82 LOXL2 (0.44) ALDH1A1TDP1L3MBTL1MAPTCYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4758488-A Stabilized polysilylenes and imaging members therewith XEROX CORPORATION (US) 1988-07-19 US claimed
CN-105182705-B Electrophtography photosensor and the image forming apparatus for having it 夏普株式会社 2019-09-27 CN disclosed
EP-1878067-A1 POROUS SEMICONDUCTOR LAYER FORMATION MATERIAL SEIKO EPSON CORPORATION (JP) 2008-01-16 EP disclosed
WO-2007043675-A9 COMPOSITION FOR CONDUCTIVE MATERIALS, CONDUCTIVE MATERIAL, CONDUCTIVE LAYER, ELECTRONIC DEVICE, AND ELECTRONIC EQUIPMENT SEIKO EPSON CORP (JP) 2007-06-07 WO disclosed
WO-2007043603-A1 COMPOSITION FOR CONDUCTIVE MATERIALS SEIKO EPSON CORPORATION (JP) 2007-04-19 WO disclosed
WO-2007043675-A1 COMPOSITION FOR CONDUCTIVE MATERIALS, CONDUCTIVE MATERIAL, CONDUCTIVE LAYER, ELECTRONIC DEVICE, AND ELECTRONIC EQUIPMENT SEIKO EPSON CORPORATION (JP) 2007-04-19 WO disclosed
WO-2006112537-A1 METHOD OF MANUFACTURING SEMICONDUCTOR ELEMENT, SEMICONDUCTOR ELEMENT, ELECTRONIC DEVICE, AND ELECTRONIC EQUIPMENT SEIKO EPSON CORPORATION (JP) 2006-10-26 WO disclosed
WO-2006112514-A1 POROUS SEMICONDUCTOR LAYER FORMATION MATERIAL SEIKO EPSON CORPORATION (JP) 2006-10-26 WO disclosed
WO-2006064892-A1 CONDUCTIVE MATERIAL, COMPOSITION FOR THE CONDUCTIVE MATERIAL, CONDUCTIVE LAYER, ELECTRONIC DEVICE, AND ELECTRONIC EQUIPMENT SEIKO EPSON CORPORATION (JP) 2006-06-22 WO disclosed
WO-2006064896-A1 CONDUCTIVE MATERIAL, COMPOSITION FOR THE CONDUCTIVE MATERIAL, CONDUCTIVE LAYER, ELECTRONIC DEVICE, AND ELECTRONIC EQUIPMENT SEIKO EPSON CORPORATION (JP) 2006-06-22 WO disclosed
WO-2006025612-A1 MATERIAL COMPOSITION FOR CONDUCTIVE LAYERS IN ELECTRONIC DEVICES SEIKO EPSON CORPORATION (JP) 2006-03-09 WO disclosed
WO-2006022439-A1 COMPOSITION FOR CONDUCTIVE MATERIALS COMPRISING TETRA ACRYLATE FUNCTIONALISED ARYLAMINES, CONDUCTIVE MATERIAL AND LAYER, ELECTRONIC DEVICE EQUIPMENT SEIKO EPSON CORPORATION (JP) 2006-03-02 WO disclosed
WO-2006011651-A1 COMPOSITION FOR CONDUCTIVE MATERIALS COMPRISING CROSSLINKABLE ARYLAMINE COMPOUNDS AND USE THEREOF IN ELECTRONIC DEVICES AND ELECTRONIC EQUIPMENT SEIKO EPSON CORPORATION (JP) 2006-02-02 WO disclosed
EP-1529242-A2 PROTECTING LAYER WITH ADDITIVES FOR ELECTROPHORETIC DISPLAY, METHOD OF PROVIDING SUCH LAYER, AND ELECTROPHORETIC DISPLAY WITH SUCH A LAYER Sipix Imaging, Inc. (US) 2005-05-11 EP disclosed
WO-2004010206-A2 PROTECTING LAYER WITH ADDITIVES FOR ELECTROPHORETIC DISPLAY, METHOD OF PROVIDING SUCH LAYER, AND ELECTROPHORETIC DISPLAY WITH SUCH A LAYER SIPIX IMAGING, INC. (US) 2004-01-29 WO disclosed
WO-2003107426-A1 MEMORY DEVICE HAVING A SEMICONDUCTING POLYMER FILM HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) 2003-12-24 WO disclosed
US-5232800-A Using a polyether binder EASTMAN KODAK COMPANY (US) 1993-08-03 US disclosed
US-5184323-A Optical coupling of intersecting beams of electromagnetic radiation; potential gradients; molecular dipoles containing electron donor linked to electron acceptor through pi bonding system EASTMAN KODAK COMPANY (US) 1993-02-02 US disclosed
US-4999809-A Electrical biasing means for potential gradients, electromagnetic beams for images, multilayer elements EASTMAN KODAK COMPANY (US) 1991-03-12 US disclosed
US-4758488-A Stabilized polysilylenes and imaging members therewith XEROX CORPORATION (US) 1988-07-19 US disclosed