Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD17B1 | P14061 | 5/20 | 0.47 |
| ▸ | HSD17B2 | P37059 | 5/20 | 0.47 |
| ▸ | ESR2 | Q92731 | 5/20 | 0.46 |
| ▸ | TP53 | P04637 | 1/20 | 0.45 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.45 |
| ▸ | ESR1 | P03372 | 6/20 | 0.42 |
| ▸ | AR | P10275 | 3/20 | 0.42 |
| ▸ | PDE10A | Q9Y233 | 1/20 | 0.42 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.41 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.41 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.41 |
| ▸ | BCL2 | P10415 | 1/20 | 0.41 |
| ▸ | BCL2L1 | Q07817 | 1/20 | 0.41 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.41 |
| ▸ | BCL2L2 | Q92843 | 1/20 | 0.41 |
| ▸ | FGFR1 | P11362 | 1/20 | 0.40 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.39 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.39 |
| ▸ | CACNA1C | Q13936 | 1/20 | 0.39 |
| ▸ | TLR8 | Q9NR97 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30669856 | 1.00 | HSD17B1 (0.47) | HSD17B1HSD17B2ESR2TP53TDP1 | |
| SCHEMBL7054359 | 0.82 | LMNA (0.47) | HSD17B1HSD17B2ESR2TP53TDP1 | |
| SCHEMBL7056452 | 0.80 | LMNA (0.39) | HSD17B1HSD17B2ESR2TP53TDP1 | |
| SCHEMBL27657652 | 0.79 | HSD17B1 (0.51) | HSD17B1HSD17B2ESR2TP53TDP1 | |
| SCHEMBL6699314 | 0.79 | HSD17B1 (0.53) | HSD17B1HSD17B2ESR2TP53TDP1 | |
| SCHEMBL27551548 | 0.78 | GABRA1 (0.47) | HSD17B1HSD17B2ESR2TP53TDP1 | |
| SCHEMBL272034 | 0.78 | HSD17B1 (0.68) | HSD17B1HSD17B2ESR2TP53TDP1 | |
| SCHEMBL29429121 | 0.78 | HSD17B1 (0.68) | HSD17B1HSD17B2ESR2TP53TDP1 | |
| SCHEMBL29696046 | 0.78 | HSD17B1 (0.68) | HSD17B1HSD17B2ESR2TP53TDP1 | |
| SCHEMBL26979937 | 0.78 | HSD17B1 (0.68) | HSD17B1HSD17B2ESR2TP53TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-103907058-A | Nanocomposite positive photosensitive composition and use thereof | AZ ELECTRONIC MATERIALS USA | 2014-07-02 | — | — | CN | disclosed |
| CN-102520583-B | Photoresist compositions comprising acetals and ketals as solvents | AZ ELECTRONIC MATERIALS JAPAN | 2014-05-07 | — | — | CN | disclosed |
| CN-101809502-B | Thick film resists | AZ ELECTRONIC MATERIALS USA | 2014-01-08 | — | — | CN | disclosed |
| EP-1913444-B1 | PHOTORESIST COMPOSITION FOR IMAGING THICK FILMS | AZ ELECTRONIC MATERIALS USA (US) | 2013-01-16 | — | — | EP | disclosed |
| EP-1497697-B1 | PHOTORESIST COMPOSITIONS COMPRISING ACETALS AND KETALS AS SOLVENTS | AZ ELECTRONIC MATERIALS USA (US) | 2012-08-08 | — | — | EP | disclosed |
| EP-1913444-A2 | PHOTORESIST COMPOSITION FOR IMAGING THICK FILMS | AZ Electronic Materials USA Corp. (US) | 2008-04-23 | — | — | EP | disclosed |
| WO-2007007176-A2 | PHOTORESIST COMPOSITION FOR IMAGING THICK FILMS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2007-01-18 | — | — | WO | disclosed |
| EP-1609025-A2 | PHOTORESIST COMPOSITION FOR THE FORMATION OF THICK FILMS | AZ Electronic Materials USA Corp. (US) | 2005-12-28 | — | — | EP | disclosed |
| US-6911293-B2 | Photoresist compositions comprising acetals and ketals as solvents | CLARIANT FINANCE (BVI) LIMITED (VG) | 2005-06-28 | — | — | US | disclosed |
| US-6852465-B2 | Photoresist composition for imaging thick films | CLARIANT INTERNATIONAL LTD. (CH) | 2005-02-08 | — | — | US | disclosed |
| EP-1497697-A2 | PHOTORESIST COMPOSITIONS COMPRISING ACETALS AND KETALS AS SOLVENTS | Clariant International Ltd. (CH) | 2005-01-19 | — | — | EP | disclosed |
| WO-2004083962-A2 | PHOTORESIST COMPOSITION FOR THE FORMATION OF THICK FILMS | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2004-09-30 | — | — | WO | disclosed |
| US-20040185368-A1 | Photoresist composition for imaging thick films | MERCK PATENT GMBH (DE) | 2004-09-23 | — | — | US | disclosed |
| US-6733949-B2 | ACID AND ALKALI ETCHING RESISTANT PROTECTIVE LAYER; IMAGE FORMATION OF MICROELECTRONIC DEVICE | CLARIANT FINANCE (BVI) LIMITED (VG) | 2004-05-11 | — | — | US | disclosed |
| US-20030207195-A1 | NOVOLAK RESIN MIXTURES AND PHOTOSENSITIVE COMPOSITIONS COMPRISING THE SAME | AZ ELECTRONIC MATERIALS USA CORP. | 2003-11-06 | — | — | US | disclosed |
| US-20030194636-A1 | Novolak resin or polyhydroxystyrene; photoactive compound or photoacid generator | MERCK PATENT GMBH (DE) | 2003-10-16 | — | — | US | disclosed |
| WO-2003085455-A2 | PHOTORESIST COMPOSITIONS COMPRISING ACETALS AND KETALS AS SOLVENTS | CLARIANT INTERNATIONAL LTD (CH) | 2003-10-16 | — | — | WO | disclosed |
| US-5985507-A | PHOTORESISTS WITH THERMAL PROPERTIES | OLIN MICROELECTRONIC CHEMICALS, INC. (US) | 1999-11-16 | — | — | US | disclosed |
| US-5674657-A | PHENOLIC RESIN COPOLYMER COMPRISING META-CRESOL, PARA-CRESOL AND OTHER PHENOLIC MONOMER SELECTED FROM XYLENOLS, METHOXYPHENOLS; RADIATION SENSITIVITY | OLIN MICROELECTRONIC CHEMICALS, INC. (US) | 1997-10-07 | — | — | US | disclosed |