Nitrogen

Nitrogen

SCHEMBL4599425

N#N.c1ccc(CN(Cc2ccccc2)c2ccccc2)cc1

nearest known ligand 0.68

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.68
CYP2C19 P33261 1/20 0.65
CYP2D6 P10635 2/20 0.55
TAAR1 Q96RJ0 2/20 0.55
LMNA P02545 2/20 0.55
CYP1A2 P05177 1/20 0.55
HTR1A P08908 1/20 0.55
ADRA2A P08913 1/20 0.55
ADORA3 P0DMS8 1/20 0.55
PDE6A P16499 1/20 0.55
ADRA2C P18825 1/20 0.55
MC4R P32245 1/20 0.55
ADRA1A P35348 1/20 0.55
HRH1 P35367 1/20 0.55
OPRM1 P35372 1/20 0.55
DRD3 P35462 1/20 0.55
MC3R P41968 1/20 0.55
SLC6A3 Q01959 1/20 0.55
KMT2A Q03164 1/20 0.55
PDE4D Q08499 1/20 0.55

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL43183 0.95 TSHR (0.74) TSHRCYP2C19CYP2D6TAAR1LMNA
SCHEMBL355040 0.92 TSHR (0.71) TSHRCYP2C19CYP2D6TAAR1LMNA
Hydrochloric Acid SCHEMBL2139953 0.92 TSHR (0.71) TSHRCYP2C19CYP2D6TAAR1LMNA
SCHEMBL2960872 0.90 CYP2C19 (0.78) TSHRCYP2C19CYP2D6TAAR1LMNA
Butane SCHEMBL28032421 0.86 TSHR (0.76) TSHRCYP2C19CYP2D6TAAR1LMNA
SCHEMBL2011193 0.83 CYP2C19 (0.69) TSHRCYP2C19CYP2D6TAAR1LMNA
SCHEMBL10974928 0.83 CRHBP (0.68) TSHRCYP2C19CYP2D6TAAR1LMNA
SCHEMBL7154167 0.83 CYP2C19 (0.69) TSHRCYP2C19CYP2D6TAAR1LMNA
SCHEMBL15456984 0.82 CYP2C19 (0.88) TSHRCYP2C19CYP2D6TAAR1LMNA
Nitrogen SCHEMBL11780356 0.82 TSHR (0.81) TSHRCYP2C19TAAR1LMNAKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1510246-B1 Method and apparatus for emulsification FUJIFILM CORP (JP) 2008-04-16 EP disclosed
US-20050272604-A1 Heat-sensitive recording material FUJI PHOTO FILM CO., LTD. 2005-12-08 US disclosed
US-20050260518-A1 Heat sensitive recording material and microcapsule FUJI PHOTO FILM CO., LTD. 2005-11-24 US disclosed
EP-1598208-A2 Heat-sensitive recording material Fuji Photo Film Co., Ltd. (JP) 2005-11-23 EP disclosed
EP-1598206-A2 Heat sensitive recording material and microcapsule FUJI PHOTO FILM CO., LTD. (JP) 2005-11-23 EP disclosed
US-20050056170-A1 Method and apparatus for emulsification FUJI PHOTO FILM CO., LTD. 2005-03-17 US disclosed
EP-1510246-A2 Method and apparatus for emulsification Fuji Photo Film Co., Ltd. (JP) 2005-03-02 EP disclosed
US-6835692-B2 Heat-sensitive recording material containing oxonol dye FUJI PHOTO FILM CO., LTD. (JP) 2004-12-28 US disclosed
US-20040121909-A1 Heat-sensitive recording material containing oxonol dye FUJI PHOTO FILM CO., LTD. 2004-06-24 US disclosed
US-6667275-B2 Multilayer back coat in which the layer, which is most remote from the support, contains at least one of an inorganic lamellar compound, such as water swelling synthetic mica, and polyvinyl alcohol. FUJI PHOTO FILM CO., LTD. (JP) 2003-12-23 US disclosed
US-20020091065-A1 Heat-sensitive recording material FUJI PHOTO FILM CO., LTD. 2002-07-11 US disclosed
US-3769021-A LIGHT-SENSITIVE DIAZOTYPE COPYING MATERIAL RICOH KK 1973-10-30 US disclosed