SCHEMBL4600481

SCHEMBL4600481

CCCCCC(C)(C)Oc1ccccc1C(=O)O

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 4/20 0.55
KMT2A Q03164 3/20 0.55
MEN1 O00255 2/20 0.55
RECQL P46063 1/20 0.55
HTT P42858 2/20 0.46
ALDH1A1 P00352 5/20 0.45
TSHR P16473 4/20 0.45
HPGD P15428 2/20 0.45
HSD17B10 Q99714 2/20 0.45
ESR1 P03372 1/20 0.45
ITGB3 P05106 1/20 0.45
ITGA2B P08514 1/20 0.45
HMGB1 P09429 1/20 0.45
GGT1 P19440 1/20 0.45
PTGS1 P23219 1/20 0.45
PTGS2 P35354 1/20 0.45
BLM P54132 1/20 0.45
NAPRT Q6XQN6 1/20 0.45
TDP1 Q9NUW8 1/20 0.45
CA12 O43570 2/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28598129 0.84 KDM4E (0.54) KDM4EKMT2AMEN1RECQLHTT
SCHEMBL6941434 0.84 KDM4E (0.54) KDM4EKMT2AMEN1RECQLHTT
SCHEMBL15457980 0.83 KDM4E (0.51) KDM4EKMT2AMEN1RECQLHTT
Hydrochloric Acid SCHEMBL28541924 0.82 KDM4E (0.49) KDM4EKMT2AMEN1RECQLHTT
SCHEMBL1014228 0.79 ALDH1A1 (0.53) KDM4EKMT2AMEN1RECQLALDH1A1
SCHEMBL7631174 0.78 KDM4E (0.50) KDM4EKMT2AMEN1RECQLHTT
SCHEMBL28220415 0.78 LMNA (0.69) KDM4EKMT2AMEN1RECQLHTT
SCHEMBL8904304 0.78 ALDH1A1 (0.56) KDM4EKMT2AMEN1RECQLALDH1A1
SCHEMBL28831773 0.77 KMT2A (0.72) KDM4EKMT2AMEN1RECQLALDH1A1
SCHEMBL28219879 0.77 KMT2A (0.72) KDM4EKMT2AMEN1RECQLALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0031561-A2 A rectally administered suppository comprising a drug and an adjuvant MERCK & CO. INC. (US) 1981-07-08 EP claimed
CN-110799173-A Water-releasing type sunscreen cosmetic 信越化学工业株式会社 2020-02-14 CN disclosed
EP-1912892-A1 SOLID SALT PREPARATION, THE PRODUCTION THEREOF AND ITS USE Baerlocher GmbH (DE) 2008-04-23 EP disclosed
EP-1913065-A1 SOLID ORGANIC SALT PREPARATION, THE PRODUCTION THEREOF AND ITS USE Baerlocher GmbH (DE) 2008-04-23 EP disclosed
WO-2007003433-A2 SOLID ORGANIC SALT PREPARATION, THE PRODUCTION THEREOF AND ITS USE BAERLOCHER GMBH (DE) 2007-01-11 WO disclosed
WO-2007003434-A1 SOLID SALT PREPARATION, THE PRODUCTION THEREOF AND ITS USE BAEROLOCHER GMBH (DE) 2007-01-11 WO disclosed
EP-1395630-A1 FINELY DISTRIBUTED STABILIZING COMPOSITION FOR POLYMERS CONTAINING HALOGEN Baerlocher GmbH (DE) 2004-03-10 EP disclosed
EP-1379582-A1 STABILISER COMBINATION FOR HALOGENATED POLYMERS AND THE USE THEREOF Baerlocher GmbH (DE) 2004-01-14 EP disclosed
WO-2002098964-A1 STABILISER COMBINATION FOR HALOGENATED POLYMERS AND THE USE THEREOF BAERLOCHER GMBH (DE) 2002-12-12 WO disclosed
WO-2002094919-A1 FINELY DISTRIBUTED STABILIZING COMPOSITION FOR POLYMERS CONTAINING HALOGEN BAERLOCHER GMBH (DE) 2002-11-28 WO disclosed
US-6392090-B1 Process for preparing hydroxybenzoic acids MITSUI CHEMICALS, INC. (JP) 2002-05-21 US disclosed
EP-0357409-B1 Heat-sensitive recording material FUJI PHOTO FILM CO LTD (JP) 1994-07-20 EP disclosed
EP-0322091-B1 PROCESS FOR PREPARING ZINC SALT OF SALICYCLIC ACID COMPOUND Fuji Photo Film Co., Ltd. (JP) 1993-08-11 EP disclosed
US-5030281-A MIXTURE OF PHENOLIC COLOR DEVELOPER, DIVALENT ZINC AND AROMATIC CARBOXYLATE; PRESSURE OR HEAT SENSITIVE; SOLVENT RESISTANCE APPLETON PAPERS INC. (US) 1991-07-09 US disclosed
US-4879368-A POLYXYLYLENES; CARBONLESS COPYING BAYER AKTIENGESELLSCHAFT (DE) 1989-11-07 US disclosed
EP-0334607-A2 Heat-sensitive recording sheet material FUJI PHOTO FILM CO., LTD. (JP) 1989-09-27 EP disclosed
EP-0322091-A2 Process for preparing zinc salt of salicyclic acid compound Fuji Photo Film Co., Ltd. (JP) 1989-06-28 EP disclosed
US-4418942-A WRINKLE RESISTANCE; HYDROPHOBIC SURFACTANTS; LOW GAS PERMEABILITY FUJI PHOTO FILM CO., LTD. (JP) 1983-12-06 US disclosed