Ether

Ether

SCHEMBL460075

C=CCOC(C)=O.CCOCC.OCCO

nearest known ligand 0.45

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 9/20 0.45
TSHR P16473 5/20 0.45
LMNA P02545 2/20 0.43
HSD17B10 Q99714 2/20 0.43
TDP1 Q9NUW8 1/20 0.38
THRB P10828 1/20 0.36
CYP3A4 P08684 3/20 0.35
ALOX15 P16050 1/20 0.34
MAPT P10636 4/20 0.33
CACNA1B Q00975 1/20 0.33
APBA1 Q02410 1/20 0.33
SMN1; SMN2 Q16637 4/20 0.32
NPC1 O15118 1/20 0.32
POLB P06746 1/20 0.32
RAB9A P51151 1/20 0.32
USP2 O75604 2/20 0.32
RECQL P46063 1/20 0.32
HPGD P15428 1/20 0.31
PKM P14618 1/20 0.31
KMT2A Q03164 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ether SCHEMBL562465 0.96 ALDH1A1 (0.42) ALDH1A1TSHRLMNAHSD17B10TDP1
Ether SCHEMBL5396604 0.96 ALDH1A1 (0.42) ALDH1A1TSHRLMNAHSD17B10TDP1
Ether SCHEMBL131568 0.94 ALDH1A1 (0.50) ALDH1A1TSHRLMNAHSD17B10TDP1
Ether SCHEMBL7760163 0.93 ALDH1A1 (0.42) ALDH1A1TSHRLMNAHSD17B10TDP1
Ethylene Glycol SCHEMBL1075546 0.90 TSHR (0.42) ALDH1A1TSHRLMNAHSD17B10TDP1
2-Ethoxyethanol SCHEMBL413625 0.89 TSHR (0.52) ALDH1A1TSHRLMNAHSD17B10TDP1
Propylene Glycol SCHEMBL243614 0.86 TDP1 (0.41) ALDH1A1TSHRLMNAHSD17B10TDP1
Propylene Glycol SCHEMBL8605999 0.86 TDP1 (0.41) ALDH1A1TSHRLMNAHSD17B10TDP1
Ether SCHEMBL2865262 0.84 THRB (0.53) ALDH1A1TSHRLMNAHSD17B10TDP1
Ethyl Acetate SCHEMBL27578297 0.84 ALDH1A1 (0.64) ALDH1A1TSHRLMNAHSD17B10TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1891 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118344845-A Surface treatment method and composition for use in the method 富士胶片电子材料美国有限公司 2024-07-16 CN claimed
CN-117908329-A KrF positive photoresist and preparation method thereof 瑞红(苏州)电子化学品股份有限公司 2024-04-19 CN claimed
US-11920069-B2 Compositions containing semiconducting nanoparticles, and polymer or composite layers formed therefrom, and optical devices MERCK PATENT GMBH (DE) 2024-03-05 US claimed
US-20230343582-A1 SPIN ON CARBON COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2023-10-26 US claimed
US-11772041-B2 Composite amine absorbent, and device and method for removing CO2 or H2S, or both of CO2 and H2S MITSUBISHI HEAVY INDUSTRIES, LTD. (JP) 2023-10-03 US claimed
US-11746284-B2 Composition comprising a semiconducting light emitting nanoparticle MERCK PATENT GMBH (DE) 2023-09-05 US claimed
CN-111752103-B Red photosensitive resin composition and color filter comprising same 东友精细化工有限公司 2023-08-25 CN claimed
US-11728161-B2 Spin on carbon composition and method of manufacturing a semiconductor device TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2023-08-15 US claimed
CN-110799623-B Composition comprising semiconductor luminescent nanoparticles 默克专利股份有限公司 2023-06-27 CN claimed
EP-3635069-B1 A COMPOSITION COMPRISING SEMICONDUCTING LIGHT-EMITTING NANOPARTICLES HAVING THIOL FUNCTIONAL SURFACE LIGANDS MERCK PATENT GMBH (DE) 2023-06-07 EP claimed
US-5998103-A Adhesion promotion method employing glycol ether acetate as adhesion promoter material CHARTERED SEMICONDUCTOR MANUFACTURING, LTD. (SG) 1999-12-07 US claimed
US-5942369-A ALKALI-SOLUBLE NOVOLAK RESIN; ALKALI SOLUBLE ACRYLIC RESIN OF RADICAL-POLYMERIZABLE UNITS CONTAINING A: HYDROXYL GROUP, CARBOXYL GROUP, OR PHENOLIC HYDROXYL GROUP; QUINONEDIAZIDE AND SOLVENT; THICK FILMS AS BUMP FORMING MATERIALS JSR CORPORATION (JP) 1999-08-24 US claimed
EP-0923112-A1 DETERGENT FOR LITHOGRAPHY Clariant International Ltd. (CH) 1999-06-16 EP claimed
EP-0855620-A1 Positive photoresist composition JSR Corporation (JP) 1998-07-29 EP claimed
EP-0594452-B1 Radiation sensitive resin composition for microlens JAPAN SYNTHETIC RUBBER CO LTD (JP) 1997-01-15 EP claimed
EP-0331427-B1 System for low temperature refrigeration and chill storage using ammoniated complex compounds ROCKY RESEARCH (US) 1994-06-15 EP claimed
EP-0594452-A2 Radiation sensitive resin composition for microlens JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1994-04-27 EP claimed
US-RE34259-E System for low temperature refrigeration and chill storage using ammoniated complex compounds ROCKY RESEARCH (US) 1993-05-25 US claimed
EP-0331427-A1 System for low temperature refrigeration and chill storage using ammoniated complex compounds ROCKY RESEARCH (US) 1989-09-06 EP claimed
US-4848994-A HEAT EXCHANGING ROCKY RESEARCH, A CORP. OF NV. 1989-07-18 US claimed