2-Ethoxyethanol

2-Ethoxyethanol

SCHEMBL413625

C=CCOC(C)=O.CCOCCO

nearest known ligand 0.52

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 6/20 0.52
ALDH1A1 P00352 5/20 0.52
THRB P10828 1/20 0.42
LMNA P02545 1/20 0.40
HSD17B10 Q99714 1/20 0.40
TDP1 Q9NUW8 1/20 0.39
CYP3A4 P08684 1/20 0.33
ALOX15 P16050 1/20 0.33
MAPT P10636 2/20 0.32
CACNA1B Q00975 1/20 0.32
APBA1 Q02410 1/20 0.32
POLB P06746 2/20 0.32
HPGD P15428 1/20 0.32
MEN1 O00255 1/20 0.32
KMT2A Q03164 1/20 0.32
MAPK1 P28482 1/20 0.31
GALR3 O60755 1/20 0.31
NPC1 O15118 1/20 0.31
RAB9A P51151 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Di(Hydroxyethyl)Ether SCHEMBL3264555 0.91 TDP1 (0.42) TSHRALDH1A1LMNAHSD17B10TDP1
Triethylene Glycol SCHEMBL17332157 0.89 MEN1 (0.42) TSHRALDH1A1THRBLMNAHSD17B10
Ether SCHEMBL460075 0.89 ALDH1A1 (0.45) TSHRALDH1A1THRBLMNAHSD17B10
Ether SCHEMBL131568 0.87 ALDH1A1 (0.50) TSHRALDH1A1THRBLMNAHSD17B10
Ether SCHEMBL7760163 0.86 ALDH1A1 (0.42) TSHRALDH1A1THRBLMNAHSD17B10
Ether SCHEMBL562465 0.86 ALDH1A1 (0.42) TSHRALDH1A1THRBLMNAHSD17B10
Ether SCHEMBL5396604 0.86 ALDH1A1 (0.42) TSHRALDH1A1THRBLMNAHSD17B10
2-Ethoxyethanol SCHEMBL11346768 0.84 TSHR (0.55) TSHRALDH1A1THRBHSD17B10TDP1
SCHEMBL8810210 0.83 TSHR (0.53) TSHRALDH1A1THRBLMNATDP1
Ethylene Glycol SCHEMBL1075546 0.82 TSHR (0.42) TSHRALDH1A1LMNAHSD17B10TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 108 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113574119-B Polymer composition and single layer phase difference material 日产化学株式会社 2024-01-16 CN claimed
CN-113574119-A Polymer composition and single-layer phase difference material 日产化学株式会社 2021-10-29 CN claimed
WO-2020203632-A1 POLYMER COMPOSITION AND SINGLE-LAYER RETARDATION MATERIAL 日産化学株式会社 2020-10-08 WO claimed
CN-104685412-B Aligning agent for liquid crystal and the liquid crystal orientation film for having used the aligning agent for liquid crystal 日产化学工业株式会社 2018-02-13 CN claimed
CN-104685412-A Liquid crystal aligning agent, and liquid crystal alignment film produced using same NISSAN CHEMICAL IND LTD 2015-06-03 CN claimed
US-20090317752-A1 Rinse liquid for lithography and method for forming resist pattern using same KOBAYASHI MASAKAZU 2009-12-24 US claimed
US-20060124586-A1 Rinse liquid for lithography and method for forming resist pattern using same KOBAYASHI MASAKAZU 2006-06-15 US claimed
JP-58008722-A None JP disclosed
JP-63183440-A None JP disclosed
US-12046390-B2 Dopant, electroconductive composition and method for producing same THE UNIVERSITY OF TOKYO (JP) 2024-07-23 US disclosed
EP-3472671-B1 A RINSE COMPOSITION, A METHOD FOR FORMING RESIST PATTERNS AND A METHOD FOR MAKING SEMICONDUCTOR DEVICES MERCK PATENT GMBH (DE) 2024-06-26 EP disclosed
CN-118226643-A Head-up display system 中央玻璃产品株式会社 2024-06-21 CN disclosed
EP-3369596-B2 VEHICLE WINDOW GLASS AND METHOD FOR MANUFACTURING VEHICLE WINDOW GLASS CENTRAL GLASS CO LTD (JP) 2024-02-28 EP disclosed
EP-1775633-A1 COMPOSITION FOR ANTIREFLECTION COATING AND METHOD FOR FORMING PATTERN USING SAME Dainippon Ink and Chemicals, Incorporated (JP) 2007-04-18 EP disclosed
US-20060124586-A1 Rinse liquid for lithography and method for forming resist pattern using same KOBAYASHI MASAKAZU 2006-06-15 US disclosed
EP-1580606-A1 RINSE LIQUID FOR LITHOGRAPHY AND METHOD FOR FORMING RESIST PATTERN USING SAME AZ Electronic Materials (Japan) K.K. (JP) 2005-09-28 EP disclosed
US-20010021439-A1 Image receiving sheet and process for producing the same DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2001-09-13 US disclosed
US-6218069-B1 CONTAINING A 1,2-NAPHTHOQUINONEDIAZIDE-5-SULFONIC ACID COMPOUND SHIN-ETSU CHEMICAL CO. LTD. (JP) 2001-04-17 US disclosed
JP-S63183440-A PATTERN FORMING METHOD JAPAN SYNTHETIC RUBBER CO LTD 1988-07-28 JP disclosed
JP-S588722-A PRODUCTION OF FLEXIBLE MOLD POLYURETHANE FOAM DAI ICHI KOGYO SEIYAKU CO LTD 1983-01-18 JP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12046390-B2 Dopant, electroconductive composition and method for producing same HCN1, HCN2, TST TSHR 3472/4885ALDH1A1 291/4885THRB 4397/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.