SCHEMBL4601026

SCHEMBL4601026

CCCCc1ccc(C)c(S(=O)(=O)O)c1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 2/20 0.50
RECQL P46063 1/20 0.50
ESR2 Q92731 1/20 0.50
CYP3A4 P08684 3/20 0.49
CYP2D6 P10635 2/20 0.49
CYP2C9 P11712 2/20 0.49
SKP2 Q13309 1/20 0.49
CYP1A2 P05177 2/20 0.46
CYP2C19 P33261 1/20 0.46
CYP4Z1 Q86W10 1/20 0.46
CYP4F11 Q9HBI6 1/20 0.46
CYP4F12 Q9HCS2 1/20 0.46
IDH1 O75874 1/20 0.45
CA2 P00918 3/20 0.45
SMN1; SMN2 Q16637 1/20 0.45
HPGD P15428 3/20 0.44
NPC1 O15118 1/20 0.44
MAPK1 P28482 1/20 0.44
HTT P42858 1/20 0.44
RAB9A P51151 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6839192 0.95 POLB (0.49) POLBRECQLESR2CYP3A4CYP2D6
SCHEMBL447196 0.94 POLB (0.48) POLBRECQLESR2CYP3A4CYP2D6
SCHEMBL6840086 0.94 POLB (0.48) POLBRECQLESR2CYP3A4CYP2D6
SCHEMBL6839421 0.90 POLB (0.52) POLBRECQLESR2CYP3A4CYP2D6
SCHEMBL1270614 0.83 CA2 (0.45) SKP2CA2SMN1; SMN2HPGDNPC1
SCHEMBL31010886 0.83 CA2 (0.45) SKP2CA2SMN1; SMN2HPGDNPC1
SCHEMBL1803308 0.83 POLB (0.52) POLBRECQLESR2CA2SMN1; SMN2
SCHEMBL1803306 0.83 POLB (0.52) POLBRECQLESR2CYP3A4CYP2D6
SCHEMBL1309212 0.82 POLB (0.55) POLBRECQLESR2IDH1CA2
SCHEMBL9812259 0.82 POLB (0.44) POLBRECQLESR2CYP3A4CYP2D6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105511226-B Photosensitive resin composition 东友精细化工有限公司 2021-04-20 CN claimed
CN-112080029-A Quantum dot film and preparation method thereof 苏州星烁纳米科技有限公司 2020-12-15 CN claimed
CN-110785474-B Flame retardant composition and flame-retardant resin composition containing same 株式会社艾迪科 2022-06-17 CN disclosed
CN-111278950-B Composition and flame-retardant resin composition 株式会社艾迪科 2022-06-17 CN disclosed
CN-111032829-B Composition and flame-retardant resin composition 株式会社艾迪科 2022-03-22 CN disclosed
CN-111433326-B Composition and flame-retardant resin composition 株式会社艾迪科 2021-11-26 CN disclosed
CN-110869447-B Composition and flame-retardant resin composition 株式会社艾迪科 2021-11-05 CN disclosed
CN-110582553-B Flame retardant composition and flame-retardant resin composition containing same 株式会社艾迪科 2021-10-15 CN disclosed
CN-105511226-B Photosensitive resin composition 东友精细化工有限公司 2021-04-20 CN disclosed
CN-112080029-A Quantum dot film and preparation method thereof 苏州星烁纳米科技有限公司 2020-12-15 CN disclosed
EP-0905184-B1 Aromatic polycarbonate resin composition GEN ELECTRIC (US) 2008-04-23 EP disclosed
US-20040116618-A1 Polycarbonate resin composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2004-06-17 US disclosed
EP-1384755-A1 POLYCARBONATE RESIN COMPOSITION MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2004-01-28 EP disclosed
EP-0719813-B1 Copolycarbonate GEN ELECTRIC (US) 2000-10-18 EP disclosed
US-5973101-A COMPRISING A STABILIZER DEACTIVATING THE METAL IMPURITY, PREVENTING THE INTERACTION OF HYDROXYL END GROUPS OF POLYCARBONATES WITH METALS GENERAL ELECTRIC COMPANY (US) 1999-10-26 US disclosed
EP-0905184-A2 Aromatic polycarbonate resin composition GENERAL ELECTRIC COMPANY (US) 1999-03-31 EP disclosed
US-5670605-A MELT COPOLYMERIZATION DIHYDROXYAROMATIC COMPOUNDS TO FORM POLYMERS GENERAL ELECTRIC COMPANY (US) 1997-09-23 US disclosed
EP-0719813-A2 Copolycarbonate GENERAL ELECTRIC COMPANY (US) 1996-07-03 EP disclosed