Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Terephthalic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.57 |
| ▸ | TP53 | P04637 | 1/20 | 0.57 |
| ▸ | SRD5A2 | P31213 | 3/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.48 |
| ▸ | CA1 | P00915 | 3/20 | 0.48 |
| ▸ | CA2 | P00918 | 3/20 | 0.48 |
| ▸ | CA12 | O43570 | 1/20 | 0.48 |
| ▸ | CA3 | P07451 | 1/20 | 0.48 |
| ▸ | TYR | P14679 | 1/20 | 0.48 |
| ▸ | DRD1 | P21728 | 1/20 | 0.48 |
| ▸ | CA4 | P22748 | 1/20 | 0.48 |
| ▸ | CA6 | P23280 | 1/20 | 0.48 |
| ▸ | CA5A | P35218 | 1/20 | 0.48 |
| ▸ | CA7 | P43166 | 1/20 | 0.48 |
| ▸ | CA9 | Q16790 | 1/20 | 0.48 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.48 |
| ▸ | CA5B | Q9Y2D0 | 1/20 | 0.48 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.47 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.46 |
| ▸ | TPMT | P51580 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Terephthalic Acid SCHEMBL6067574 | 0.98 | TSHR (0.60) | TSHRTP53SRD5A2ALDH1A1CA1 | |
| Terephthalic Acid SCHEMBL4609059 | 0.98 | TSHR (0.60) | TSHRTP53SRD5A2ALDH1A1CA1 | |
| Terephthalic Acid SCHEMBL4605471 | 0.91 | TSHR (0.52) | TSHRTP53SRD5A2ALDH1A1CA1 | |
| Benzoic Acid SCHEMBL14890341 | 0.88 | TSHR (0.64) | TSHRTP53SRD5A2ALDH1A1DAO | |
| Benzoic Acid SCHEMBL28132510 | 0.88 | TSHR (0.64) | TSHRTP53SRD5A2ALDH1A1DAO | |
| Isophthalic Acid SCHEMBL4605143 | 0.83 | UNG (0.50) | TSHRTP53CA1CA2CA12 | |
| Terephthalic Acid SCHEMBL1194495 | 0.82 | TSHR (0.86) | TSHRTP53SRD5A2ALDH1A1CA1 | |
| Terephthalic Acid SCHEMBL28397286 | 0.82 | TSHR (0.86) | TSHRTP53SRD5A2ALDH1A1CA1 | |
| Terephthalic Acid SCHEMBL17628648 | 0.82 | TSHR (0.86) | TSHRTP53SRD5A2ALDH1A1CA1 | |
| Terephthalic Acid SCHEMBL210852 | 0.82 | TSHR (0.86) | TSHRTP53SRD5A2ALDH1A1CA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 57 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108271380-B | Antifouling composition | 佐敦公司 | 2020-10-23 | — | — | CN | claimed |
| WO-2017009301-A1 | ANTIFOULING COMPOSITION | JOTUN A/S (NO) | 2017-01-19 | — | — | WO | claimed |
| US-5364738-A | Divinyl ethers, solubility in developers | FUJI PHOTO FILM CO., LTD. (JP) | 1994-11-15 | — | — | US | claimed |
| CN-108271380-B | Antifouling composition | 佐敦公司 | 2020-10-23 | — | — | CN | disclosed |
| WO-2017009301-A1 | ANTIFOULING COMPOSITION | JOTUN A/S (NO) | 2017-01-19 | — | — | WO | disclosed |
| EP-2548739-A2 | Lithographic printing plate precursor | Fujifilm Corporation (JP) | 2013-01-23 | — | — | EP | disclosed |
| EP-1673222-B1 | PROCESS FOR PRODUCTION OF HEAT-SENSITIVE IMAGEABLE ELEMENTS | KODAK GRAPHIC COMM GMBH (DE) | 2008-07-09 | — | — | EP | disclosed |
| US-20070292809-A1 | Process for the Production of Double-Layer Heat-Sensitive Imageable Elements | KODAK POLYCHROME GRAPHICS, GMBH (DE) | 2007-12-20 | — | — | US | disclosed |
| EP-1287985-B1 | Lithographic printing plate precursor | FUJI PHOTO FILM CO LTD (JP) | 2006-10-11 | — | — | EP | disclosed |
| EP-1077391-B1 | Onium salts, photoacid generators for resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2006-09-27 | — | — | EP | disclosed |
| EP-1673222-A1 | PROCESS FOR PRODUCTION OF HEAT-SENSITIVE IMAGEABLE ELEMENTS | Kodak Polychrome Graphics GmbH (DE) | 2006-06-28 | — | — | EP | disclosed |
| EP-1077391-A1 | Onium salts, photoacid generators for resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-02-21 | — | — | EP | disclosed |
| EP-1039346-A1 | Resist compositions and pattering process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-09-27 | — | — | EP | disclosed |
| EP-1038890-A1 | Dendritic polymers and their preparation | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-09-27 | — | — | EP | disclosed |
| EP-0908473-A1 | Styrene polymers, chemically-amplified positive resist compositions, their preparation and use in a patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1999-04-14 | — | — | EP | disclosed |
| EP-0536690-B1 | Light-sensitive composition | FUJI PHOTO FILM CO LTD (JP) | 1998-09-09 | — | — | EP | disclosed |
| US-5658708-A | RADIATION ABSORBING MATERIAL CONTAINING ENOL ETHER GROUPS | FUJI PHOTO FILM CO., LTD. (JP) | 1997-08-19 | — | — | US | disclosed |
| US-5637428-A | POSITIVE WORKING PHOTOSENSITIVE COMPOSITION | FUJI PHOTO FILM CO., LTD. (JP) | 1997-06-10 | — | — | US | disclosed |
| US-5364738-A | Divinyl ethers, solubility in developers | FUJI PHOTO FILM CO., LTD. (JP) | 1994-11-15 | — | — | US | disclosed |
| EP-0536690-A1 | Light-sensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 1993-04-14 | — | — | EP | disclosed |