SCHEMBL4612224

SCHEMBL4612224

CC1(C)CC(O)C(=O)O1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8942920 0.79 CCR5 (0.32)
SCHEMBL15831127 0.77 KDM4E (0.36)
SCHEMBL4612235 0.74 MEN1 (0.32)
SCHEMBL9717735 0.73
SCHEMBL14272279 0.73
SCHEMBL12768176 0.73 L3MBTL1 (0.35)
SCHEMBL18762442 0.71
SCHEMBL5569224 0.71
SCHEMBL14275516 0.71
SCHEMBL13979848 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7183423-B1 Process for the preparation of organic compounds with imide catalysts DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2007-02-27 US claimed
JP-61282373-A None JP disclosed
EP-1091248-B1 Postive-working resist composition FUJIFILM CORP (JP) 2012-05-30 EP disclosed
EP-1055654-B1 PROCESS FOR THE PREPARATION OF ORGANIC COMPOUNDS WITH IMIDE CATALYSTS DAICEL CHEM (JP) 2008-02-20 EP disclosed
EP-1288186-B1 Preparation process of vinyl ether compounds DAICEL CHEM (JP) 2007-09-19 EP disclosed
US-7271297-B2 Process for producing vinyl ether compounds DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2007-09-18 US disclosed
EP-1826196-A2 Vinyl ether compounds Daicel Chemical Industries, Ltd. (JP) 2007-08-29 EP disclosed
US-7183423-B1 Process for the preparation of organic compounds with imide catalysts DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2007-02-27 US disclosed
US-20060205957-A1 Process for producing vinyl ether compounds ISHII YASUTAKA 2006-09-14 US disclosed
US-7074970-B2 Process for producing vinyl ether compounds DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2006-07-11 US disclosed
US-6440636-B1 HIGH ETCHING RESISTANCE, TRANSPARENCY, ALKALI SOLUBILITY, AND ADHESION; ACRYLIC ESTERS HAVING ADAMANTANE GROUP KABUSHIKI KAISHA TOSHIBA (JP) 2002-08-27 US disclosed
US-6403521-B1 FOR OXIDATION, NITRATION, CARBOXYLATION, SULFONATION; NO EXHAUST GAS TREATMENT; 6-TRIFLUOROMETHYL-L-HYDROXY BENZOTRIAZOLE; 3-HYDROXY-4-OXO-1,2,3-BENZOTRIAZINE TO OXIDIZE FLUORENE TO FLUORENONE; ADAMANTANE TO ADAMANTANOL DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2002-06-11 US disclosed
EP-1172384-A1 POLYMER FOR PHOTORESISTS AND RESIN COMPOSITIONS FOR PHOTORESISTS Daicel Chemical Industries, Ltd. (JP) 2002-01-16 EP disclosed
EP-1172694-A1 POLYMERIC COMPOUND FOR PHOTORESIST AND RESIN COMPOSITION FOR PHOTORESIST Daicel Chemical Industries, Ltd. (JP) 2002-01-16 EP disclosed
EP-1085015-A2 Catalyst comprising a nitrogen-containing heterocylic compound Daicel Chemical Industries, Ltd. (JP) 2001-03-21 EP disclosed
EP-1055654-A1 PROCESS FOR THE PREPARATION OF ORGANIC COMPOUNDS WITH IMIDE CATALYSTS Daicel Chemical Industries, Ltd. (JP) 2000-11-29 EP disclosed
US-4891435-A Preparation of 4,4-dimethyltetrahydrofuran-2,3-dione BASF AKTIENGESELLSCHAFT (DE) 1990-01-02 US disclosed
JP-S61282373-A PRODUCTION OF ALPHA-HYDROXY-GAMMA,GAMMA-DIMETHYL-GAMMA-BUTYROLACTONE NIPPON SYNTHETIC CHEM IND CO LTD:THE 1986-12-12 JP disclosed
EP-0100520-B1 PROCESS FOR THE PREPARATION OF 4,4-DIMETHYL-TETRAHYDROFURAN-2,3 DIONE BASF Aktiengesellschaft (DE) 1986-05-28 EP disclosed
EP-0100520-A1 Process for the preparation of 4,4-dimethyl-tetrahydrofuran-2,3 dione BASF Aktiengesellschaft (DE) 1984-02-15 EP disclosed