Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2283452 | 0.86 | — | — | |
| SCHEMBL3658214 | 0.86 | — | — | |
| SCHEMBL4612833 | 0.83 | — | — | |
| SCHEMBL249445 | 0.81 | — | — | |
| SCHEMBL20703833 | 0.81 | — | — | |
| SCHEMBL4326495 | 0.81 | — | — | |
| SCHEMBL1271789 | 0.81 | — | — | |
| SCHEMBL7195428 | 0.78 | LMNA (0.30) | — | |
| SCHEMBL6617973 | 0.78 | — | — | |
| SCHEMBL4614871 | 0.78 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 488 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119505361-A | Preparation method of fluorine-free waterproof breathable film based on irradiation technology | 天津工业大学绍兴柯桥研究院 | 2025-02-25 | — | — | CN | claimed |
| CN-106750448-B | Painted article coated with a paint composition for glazing polycarbonate | 现代自动车株式会社 | 2021-11-16 | — | — | CN | claimed |
| US-20170145246-A1 | PAINTED ARTICLE COATED WITH COATING PAINT COMPOSITION FOR POLYCARBONATE GLAZING | NOROO PAINT & COATINGS., LTD. (KR) | 2017-05-25 | — | — | US | claimed |
| US-8455605-B2 | Resin composition for transparent encapsulation material and electronic device formed using the same | CHEIL INDUSTRIES, INC. (KR) | 2013-06-04 | — | — | US | claimed |
| US-8298965-B2 | Volatile precursors for deposition of C-linked SiCOH dielectrics | AMERICAN AIR LIQUIDE, INC. (US) | 2012-10-30 | — | — | US | claimed |
| US-20120270998-A1 | RESIN COMPOSITION FOR TRANSPARENT ENCAPSULATION MATERIAL AND ELECTRONIC DEVICE FORMED USING THE SAME | CHEIL INDUSTRIES, INC. (KR) | 2012-10-25 | — | — | US | claimed |
| US-8026035-B2 | Organosilicon polymer containing chromogen; antireflactivity coating for lithography | CHEIL INDUSTRIES, INC. (KR) | 2011-09-27 | — | — | US | claimed |
| US-7999355-B2 | Aminosilanes for shallow trench isolation films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2011-08-16 | — | — | US | claimed |
| US-7932295-B2 | Organic silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device | JSR CORPORATION (JP) | 2011-04-26 | — | — | US | claimed |
| US-7875317-B2 | formed by hydrolyzing and condensing a siloxy compound in the presence of a polycarbosilane; low relative dielectric constant and excellent mechanical strength, storage stability, and chemical resistance; semiconductors | JSR CORPORATION (JP) | 2011-01-25 | — | — | US | claimed |
| US-20100052115-A1 | Volatile Precursors for Deposition of C-Linked SiCOH Dielectrics | AMERICAN AIR LIQUIDE, INC. (US) | 2010-03-04 | — | — | US | claimed |
| US-20100009546-A1 | Aminosilanes for Shallow Trench Isolation Films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2010-01-14 | — | — | US | claimed |
| EP-2144279-A2 | Aminosilanes for shallow trench isolation films | Air Products and Chemicals, Inc. (US) | 2010-01-13 | — | — | EP | claimed |
| US-7488693-B2 | Method for producing silicon oxide film | TOAGOSEI CO., LTD. (JP) | 2009-02-10 | — | — | US | claimed |
| US-20080246153-A1 | ORGANIC SILICA-BASED FILM, METHOD OF FORMING THE SAME, COMPOSITION FOR FORMING INSULATING FILM FOR SEMICONDUCTOR DEVICE, INTERCONNECT STRUCTURE, AND SEMICONDUCTOR DEVICE | JSR CORPORATION (JP) | 2008-10-09 | — | — | US | claimed |
| US-20080241748-A1 | Etch-resistant disilane and saturated hydrocarbon bridged silicon-containing polymers, method of making the same, and method of using the same | CHEIL INDUSTRIES, INC. (KR) | 2008-10-02 | — | — | US | claimed |
| US-7399715-B2 | Organic silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device | JSR CORPORATION (JP) | 2008-07-15 | — | — | US | claimed |
| US-4515901-A | MIXING WITH PILLARING AGENT, DRYING, ROASTING | TEXACO INC. (US) | 1985-05-07 | — | — | US | claimed |
| US-4137391-A | Continuous solution polymerization of a conjugated diene with a monovinylaromatic compound using alkoxysilicon treating agents in the first reactor means of a reactor series | PHILLIPS PETROLEUM COMPANY (US) | 1979-01-30 | — | — | US | claimed |
| CN-113921459-B | Semiconductor element and method for manufacturing the same | 南亚科技股份有限公司 | 2026-05-15 | — | — | CN | disclosed |
| CN-114388433-B | Semiconductor device and method for manufacturing the same | 南亚科技股份有限公司 | 2026-05-15 | — | — | CN | disclosed |
| US-12575404-B2 | Semiconductor device with protection layer and method for fabricating the same | NANYA TECHNOLOGY CORPORATION (TW) | 2026-03-10 | — | — | US | disclosed |
| US-20260040913-A1 | SEMICONDUCTOR DEVICE WITH ISOLATION STRUCTURE AND METHOD FOR FABRICATING THE SAME | NANYA TECHNOLOGY CORP (TW) | 2026-02-05 | — | — | US | disclosed |
| US-20260040912-A1 | SEMICONDUCTOR DEVICE WITH ISOLATION STRUCTURE AND METHOD FOR FABRICATING THE SAME | NANYA TECHNOLOGY CORP (TW) | 2026-02-05 | — | — | US | disclosed |
| CN-121063542-A | Si by-product of polysilicon2OCl6Prepared flexible SiO2Aerogel and method and application | 石河子大学 | 2025-12-05 | — | — | CN | disclosed |
| EP-4479479-B1 | SILPHENYLENE POLYMERS | WACKER CHEMIE AG (DE) | 2025-08-13 | — | — | EP | disclosed |
| US-20250215260-A1 | SILPHENYLENE POLYMERS | WACKER CHEMIE AG (DE) | 2025-07-03 | — | — | US | disclosed |
| US-12346026-B2 | Composition for forming underlayer film, resist pattern forming method, and manufacturing method of electronic device | FUJIFILM CORPORATION (JP) | 2025-07-01 | — | — | US | disclosed |
| CN-119505361-A | Preparation method of fluorine-free waterproof breathable film based on irradiation technology | 天津工业大学绍兴柯桥研究院 | 2025-02-25 | — | — | CN | disclosed |
| CN-119446903-A | Semiconductor element with protective layer and preparation method thereof | 南亚科技股份有限公司 | 2025-02-14 | — | — | CN | disclosed |
| CN-119446904-A | Semiconductor element with protective layer and preparation method thereof | 南亚科技股份有限公司 | 2025-02-14 | — | — | CN | disclosed |
| US-20250046709-A1 | SEMICONDUCTOR DEVICE WITH PROTECTION LAYER AND METHOD FOR FABRICATING THE SAME | NANYA TECHNOLOGY CORPORATION (TW) | 2025-02-06 | — | — | US | disclosed |
| US-20250046708-A1 | SEMICONDUCTOR DEVICE WITH PROTECTION LAYER AND METHOD FOR FABRICATING THE SAME | NANYA TECHNOLOGY CORPORATION (TW) | 2025-02-06 | — | — | US | disclosed |
| WO-2025028268-A1 | ETCHING LIQUID REGENERATION METHOD | ラサ工業株式会社 | 2025-02-06 | — | — | WO | disclosed |
| CN-119256051-A | Silicon phenylene Polymer | 瓦克化学股份公司 | 2025-01-03 | — | — | CN | disclosed |
| EP-4479479-A1 | SILPHENYLENE POLYMERS | Wacker Chemie AG (DE) | 2024-12-25 | — | — | EP | disclosed |
| US-12160988-B2 | Semiconductor device with composite word line structure and method for fabricating the same | NANYA TECHNOLOGY CORPORATION (TW) | 2024-12-03 | — | — | US | disclosed |
| CN-110168008-B | Rubber composition for tire tread and pneumatic tire | 横滨橡胶株式会社 | 2024-11-26 | — | — | CN | disclosed |
| US-20240365537-A1 | SEMICONDUCTOR DEVICE WITH COMPOSITE WORD LINE STRUCTURE AND METHOD FOR FABRICATING THE SAME | NANYA TECHNOLOGY CORPORATION (TW) | 2024-10-31 | — | — | US | disclosed |
| WO-2024122103-A1 | ETCHING SOLUTION COMPOSITION | ラサ工業株式会社 | 2024-06-13 | — | — | WO | disclosed |
| WO-2024080172-A1 | MODIFIED GROUP-CONTAINING HYDROGENATED BLOCK COPOLYMER AND METHOD FOR PRODUCING MODIFIED GROUP-CONTAINING HYDROGENATED BLOCK COPOLYMER | 日本ゼオン株式会社 | 2024-04-18 | — | — | WO | disclosed |
| US-20240030062-A1 | INTEGRATION OF FULLY ALIGNED VIA THROUGH SELECTIVE DEPOSITION AND RESISTIVITY REDUCTION | LAM RESEARCH CORPORATION | 2024-01-25 | — | — | US | disclosed |
| US-11851554-B2 | Rubber composition for a vehicle part | HYUNDAI MOTOR COMPANY (KR) | 2023-12-26 | — | — | US | disclosed |
| CN-117121173-A | Integration of fully aligned vias by selective deposition and resistivity reduction | 朗姆研究公司 | 2023-11-24 | — | — | CN | disclosed |
| WO-2023222203-A1 | SILPHENYLENE POLYMERS | WACKER CHEMIE AG (DE) | 2023-11-23 | — | — | WO | disclosed |
| EP-3419982-B1 | NEW STABLE SILYLATING REAGENTS | CALIFORNIA INST OF TECHN (US) | 2023-11-15 | — | — | EP | disclosed |
| US-20230328970-A1 | SEMICONDUCTOR DEVICE WITH COMPOSITE WORD LINE STRUCTURE AND METHOD FOR FABRICATING THE SAME | NANYA TECHNOLOGY CORPORATION (TW) | 2023-10-12 | — | — | US | disclosed |
| US-20230212344-A1 | THERMOPLASTIC ELASTOMER COMPOSITION FOR IMPACT-RESISTANT MATERIAL AND IMPACT-RESISTANT MATERIAL | ZEON CORPORATION (JP) | 2023-07-06 | — | — | US | disclosed |
| US-11683928-B2 | Semiconductor device with single step height | NANYA TECHNOLOGY CORPORATION (TW) | 2023-06-20 | — | — | US | disclosed |
| US-11631735-B2 | Semiconductor device with flowable layer | NANYA TECHNOLOGY CORPORATION (TW) | 2023-04-18 | — | — | US | disclosed |
| US-20230074171-A1 | RUBBER COMPOSITION FOR A VEHICLE PART | HYUNDAI MOTOR COMPANY (KR) | 2023-03-09 | — | — | US | disclosed |
| EP-4112654-A1 | THERMOPLASTIC ELASTOMER COMPOSITION FOR IMPACT-RESISTANT MATERIAL AND IMPACT-RESISTANT MATERIAL | Zeon Corporation (JP) | 2023-01-04 | — | — | EP | disclosed |
| US-11502165-B2 | Semiconductor device with flowable layer and method for fabricating the same | NANYA TECHNOLOGY CORPORATION (TW) | 2022-11-15 | — | — | US | disclosed |
| US-11492452-B2 | Multi-block copolymer composition obtained by modification treatment, and film | ZEON CORPORATION (JP) | 2022-11-08 | — | — | US | disclosed |
| WO-2022221881-A1 | INTEGRATION OF FULLY ALIGNED VIA THROUGH SELECTIVE DEPOSITION AND RESISTIVITY REDUCTION | LAM RESEARCH CORPORATION (US) | 2022-10-20 | — | — | WO | disclosed |
| US-11459417-B2 | Block copolymer composition including ionic group, and film | ZEON CORPORATION (JP) | 2022-10-04 | — | — | US | disclosed |
| US-20220252985-A1 | COMPOSITION FOR FORMING UNDERLAYER FILM, RESIST PATTERN FORMING METHOD, AND MANUFACTURING METHOD OF ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2022-08-11 | — | — | US | disclosed |
| US-11359075-B2 | Rubber composition for a tire tread and pneumatic tire using the same | THE YOKOHAMA RUBBER CO., LTD. (JP) | 2022-06-14 | — | — | US | disclosed |
| US-20220181438-A1 | SEMICONDUCTOR DEVICE WITH FLOWABLE LAYER | NANYA TECHNOLOGY CORPORATION (TW) | 2022-06-09 | — | — | US | disclosed |
| EP-3569651-B1 | RUBBER COMPOSITION FOR TIRE TREADS AND PNEUMATIC TIRE | YOKOHAMA RUBBER CO LTD (JP) | 2022-04-27 | — | — | EP | disclosed |
| CN-114388433-A | Semiconductor device and method for manufacturing the same | 南亚科技股份有限公司 | 2022-04-22 | — | — | CN | disclosed |
| US-20220122991-A1 | SEMICONDUCTOR DEVICE WITH SINGLE STEP HEIGHT AND METHOD FOR FABRICATING THE SAME | NANYA TECHNOLOGY CORPORATION (TW) | 2022-04-21 | — | — | US | disclosed |
| US-20220122992-A1 | SEMICONDUCTOR DEVICE WITH SINGLE STEP HEIGHT | NANYA TECHNOLOGY CORPORATION (TW) | 2022-04-21 | — | — | US | disclosed |
| US-11309316-B1 | Semiconductor device with single step height and method for fabricating the same | NANYA TECHNOLOGY CORPORATION (TW) | 2022-04-19 | — | — | US | disclosed |
| CN-114149462-A | Preparation method of phenyl alkoxy silane | 湖北兴瑞硅材料有限公司 | 2022-03-08 | — | — | CN | disclosed |
| US-11264474-B1 | Semiconductor device with boron nitride layer and method for fabricating the same | NANYA TECHNOLOGY CORPORATION (TW) | 2022-03-01 | — | — | US | disclosed |
| US-20220059666-A1 | SEMICONDUCTOR DEVICE WITH BORON NITRIDE LAYER AND METHOD FOR FABRICATING THE SAME | NANYA TECHNOLOGY CORPORATION (TW) | 2022-02-24 | — | — | US | disclosed |
| CN-113929713-A | Method for preparing alkoxy disilane by using organic silicon byproduct high-boiling residues | 湖北兴瑞硅材料有限公司 | 2022-01-14 | — | — | CN | disclosed |
| US-20220013629-A1 | SEMICONDUCTOR DEVICE WITH FLOWABLE LAYER AND METHOD FOR FABRICATING THE SAME | NANYA TECHNOLOGY CORPORATION (TW) | 2022-01-13 | — | — | US | disclosed |
| CN-113666955-A | Novel stable silylating agents | 加州理工学院 | 2021-11-19 | — | — | CN | disclosed |
| CN-106750448-B | Painted article coated with a paint composition for glazing polycarbonate | 现代自动车株式会社 | 2021-11-16 | — | — | CN | disclosed |
| US-20210323983-A1 | STABLE SILYLATING REAGENTS | CALIFORNIA INSTITUTE OF TECHNOLOGY | 2021-10-21 | — | — | US | disclosed |
| US-20210230336-A1 | BLOCK COPOLYMER COMPOSITION INCLUDING IONIC GROUP, AND FILM | ZEON CORPORATION (JP) | 2021-07-29 | — | — | US | disclosed |
| US-11059994-B2 | Silicone resin, related methods, and film formed therewith | DOW SILICONES CORPORATION (US) | 2021-07-13 | — | — | US | disclosed |
| US-11028107-B2 | Stable silylating reagents | CALIFORNIA INSTITUTE OF TECHNOLOGY (US) | 2021-06-08 | — | — | US | disclosed |
| WO-2021106537-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION, PATTERN FORMING METHOD, AND ELECTRONIC DEVICE MANUFACTURING METHOD | 富士フイルム株式会社 | 2021-06-03 | — | — | WO | disclosed |
| US-20200255607-A1 | MULTI-BLOCK COPOLYMER COMPOSITION OBTAINED BY MODIFICATION TREATMENT, AND FILM | ZEON CORPORATION (JP) | 2020-08-13 | — | — | US | disclosed |
| US-20200248031-A1 | SILICONE RESIN, RELATED METHODS, AND FILM FORMED THEREWITH | DOW SILICONES CORPORATION | 2020-08-06 | — | — | US | disclosed |
| EP-3677645-A1 | MULTI-BLOCK COPOLYMER COMPOSITION OBTAINED BY MODIFICATION TREATMENT, AND FILM | Zeon Corporation (JP) | 2020-07-08 | — | — | EP | disclosed |
| US-20200123346-A1 | Rubber Composition for a Tire Tread and Pneumatic Tire Using the Same | THE YOKOHAMA RUBBER CO., LTD. (JP) | 2020-04-23 | — | — | US | disclosed |
| EP-3569651-A1 | RUBBER COMPOSITION FOR TIRE TREADS AND PNEUMATIC TIRE | The Yokohama Rubber Co., Ltd. (JP) | 2019-11-20 | — | — | EP | disclosed |
| WO-2019216241-A1 | BLOCK COPOLYMER COMPOSITION HAVING IONIC GROUP AND FILM | 日本ゼオン株式会社 (JP) | 2019-11-14 | — | — | WO | disclosed |
| EP-1520891-B1 | FILM FORMING COMPOSITION, PROCESS FOR PRODUCING FILM FORMING COMPOSITION, INSULATING FILM FORMING MATERIAL, PROCESS FOR FORMING FILM, AND SILICA-BASED FILM | JSR CORP (JP) | 2019-05-01 | — | — | EP | disclosed |
| US-10234762-B2 | Pattern-forming method | JSR CORPORATION (JP) | 2019-03-19 | — | — | US | disclosed |
| WO-2019027908-A1 | SILICONE RESIN, RELATED METHODS, AND FILM FORMED THEREWITH | DOW SILICONES CORPORATION (US) | 2019-02-07 | — | — | WO | disclosed |
| EP-3419982-A1 | NEW STABLE SILYLATING REAGENTS | California Institute of Technology (US) | 2019-01-02 | — | — | EP | disclosed |
| US-10170297-B2 | Compositions and methods using same for flowable oxide deposition | VERSUM MATERIALS US, LLC (US) | 2019-01-01 | — | — | US | disclosed |
| CN-104884552-B | The curable coating composition of one pack system, its preparation and application and coating prepared therefrom and product | 巴斯夫涂料有限公司 | 2018-09-14 | — | — | CN | disclosed |
| US-10072138-B2 | Rubber composition for use in tire treads | THE YOKOHAMA RUBBER CO., LTD (JP) | 2018-09-11 | — | — | US | disclosed |
| US-20180208839-A1 | COLOR CONVERSION FILMS COMPRISING A RHODAMINE-BASED FLUORESCENT (RBF) COMPOUND AND PLASMON ENHANCED FLUORESCENT DYES | StoreDot Ltd. (IL) | 2018-07-26 | — | — | US | disclosed |
| US-10025188-B2 | Resist pattern-forming method | JSR CORPORATION (JP) | 2018-07-17 | — | — | US | disclosed |
| US-9994765-B2 | — | — | 2018-06-12 | — | — | US | disclosed |
| US-20180105696-A1 | COLOR CONVERSION WITH SOLID MATRIX FILMS AND GREEN RHODAMINES | StoreDot Ltd. (IL) | 2018-04-19 | — | — | US | disclosed |
| US-20180072892-A1 | MODIFICATIONS OF THE SOL-GEL AND PROCESS THEREOF | StoreDot Ltd. (IL) | 2018-03-15 | — | — | US | disclosed |
| US-20180051174-A1 | COLOR CONVERSION IN LCD DISPLAYS WITH SILICA NANOPARTICLES | MOLECULED LTD. (IL) | 2018-02-22 | — | — | US | disclosed |
| US-20180039131-A1 | CONTROL OF ILLUMINATION SPECTRA FOR LCD DISPLAYS | StoreDot Ltd. (IL) | 2018-02-08 | — | — | US | disclosed |
| US-20180037738-A1 | COLOR CONVERSION WITH SOLID MATRIX FILMS | StoreDot Ltd. (IL) | 2018-02-08 | — | — | US | disclosed |
| US-9868859-B2 | Color conversion in LCD displays | StoreDot Ltd. (IL) | 2018-01-16 | — | — | US | disclosed |
| US-9847222-B2 | Treatment for flowable dielectric deposition on substrate surfaces | LAM RESEARCH CORPORATION (US) | 2017-12-19 | — | — | US | disclosed |
| US-20170322492-A1 | RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2017-11-09 | — | — | US | disclosed |
| WO-2017147110-A1 | NEW STABLE SILYLATING REAGENTS | CALIFORNIA INSTITUTE OF TECHNOLOGY (US) | 2017-08-31 | — | — | WO | disclosed |
| US-20170240571-A1 | STABLE SILYLATING REAGENTS | CALIFORNIA INSTITUTE OF TECHNOLOGY | 2017-08-24 | — | — | US | disclosed |
| US-9719169-B2 | System and apparatus for flowable deposition in semiconductor fabrication | NOVELLUS SYSTEMS, INC. (US) | 2017-08-01 | — | — | US | disclosed |
| US-20170145246-A1 | PAINTED ARTICLE COATED WITH COATING PAINT COMPOSITION FOR POLYCARBONATE GLAZING | NOROO PAINT & COATINGS., LTD. (KR) | 2017-05-25 | — | — | US | disclosed |
| US-20170137628-A1 | COLOR CONVERSION IN LCD DISPLAYS | MOLECULED LTD. (IL) | 2017-05-18 | — | — | US | disclosed |
| US-20170137630-A1 | COLOR CONVERSION IN LCD DISPLAYS | MOLECULED LTD. (IL) | 2017-05-18 | — | — | US | disclosed |
| US-20170137630-A1 | COLOR CONVERSION IN LCD DISPLAYS | MOLECULED LTD. (IL) | 2017-05-18 | — | — | US | disclosed |
| US-20170139270-A1 | COLOR CONVERSION IN LCD DISPLAYS | MOLECULED LTD. (IL) | 2017-05-18 | — | — | US | disclosed |
| US-20170137628-A1 | COLOR CONVERSION IN LCD DISPLAYS | MOLECULED LTD. (IL) | 2017-05-18 | — | — | US | disclosed |
| US-20170139270-A1 | COLOR CONVERSION IN LCD DISPLAYS | MOLECULED LTD. (IL) | 2017-05-18 | — | — | US | disclosed |
| US-20170137705-A1 | COLOR CONVERSION FILMS WITH PLASMON ENHANCED FLUORESCENT DYES | MOLECULED LTD. (IL) | 2017-05-18 | — | — | US | disclosed |
| US-20170137627-A1 | COLOR CONVERSION IN LCD DISPLAYS | MOLECULED LTD. (IL) | 2017-05-18 | — | — | US | disclosed |
| US-20170139277-A1 | COLOR CONVERSION IN LCD DISPLAYS | MOLECULED LTD. (IL) | 2017-05-18 | — | — | US | disclosed |
| US-20170137627-A1 | COLOR CONVERSION IN LCD DISPLAYS | MOLECULED LTD. (IL) | 2017-05-18 | — | — | US | disclosed |
| US-20170139271-A1 | COLOR CONVERSION IN LCD DISPLAYS | MOLECULED LTD. (IL) | 2017-05-18 | — | — | US | disclosed |
| US-20170139271-A1 | COLOR CONVERSION IN LCD DISPLAYS | MOLECULED LTD. (IL) | 2017-05-18 | — | — | US | disclosed |
| US-20170139277-A1 | COLOR CONVERSION IN LCD DISPLAYS | MOLECULED LTD. (IL) | 2017-05-18 | — | — | US | disclosed |
| US-20170137705-A1 | COLOR CONVERSION FILMS WITH PLASMON ENHANCED FLUORESCENT DYES | MOLECULED LTD. (IL) | 2017-05-18 | — | — | US | disclosed |
| US-9567451-B2 | Rubber composition for use in tire treads | THE YOKOHAMA RUBBER CO., LTD. (JP) | 2017-02-14 | — | — | US | disclosed |
| US-20170003592-A1 | PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2017-01-05 | — | — | US | disclosed |
| US-9493638-B2 | Rubber composition for tire | THE YOKOHAMA RUBBER CO., LTD. (JP) | 2016-11-15 | — | — | US | disclosed |
| US-20160320705-A1 | RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2016-11-03 | — | — | US | disclosed |
| US-9475924-B2 | Rubber composition for tire tread and pneumatic tire using the same | THE YOKOHAMA RUBBER CO., LTD. (JP) | 2016-10-25 | — | — | US | disclosed |
| EP-2001965-B1 | COATING COMPOSITIONS, ARTICLES, AND METHODS OF COATING ARTICLES | SDC TECHNOLOGIES INC (US) | 2016-10-05 | — | — | EP | disclosed |
| US-9434609-B2 | Method for forming pattern, and polysiloxane composition | JSR CORPORATION (JP) | 2016-09-06 | — | — | US | disclosed |
| US-9416252-B2 | Rubber composition for tire tread | THE YOKOHAMA RUBBER CO., LTD. (JP) | 2016-08-16 | — | — | US | disclosed |
| US-9337054-B2 | Precursors for silicon dioxide gap fill | ENTEGRIS, INC. (US) | 2016-05-10 | — | — | US | disclosed |
| US-9329478-B2 | Polysiloxane composition and pattern-forming method | JSR CORPORATION (JP) | 2016-05-03 | — | — | US | disclosed |
| US-20160097978-A1 | RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2016-04-07 | — | — | US | disclosed |
| US-9299559-B2 | Flowable oxide film with tunable wet etch rate | NOVELLUS SYSTEMS, INC. (US) | 2016-03-29 | — | — | US | disclosed |
| US-20160056071-A1 | FLOWABLE DIELECTRIC FOR SELECTIVE ULTRA LOW-K PORE SEALING | LAM RESEARCH CORPORATION | 2016-02-25 | — | — | US | disclosed |
| US-9245739-B2 | Low-K oxide deposition by hydrolysis and condensation | LAM RESEARCH CORPORATION (US) | 2016-01-26 | — | — | US | disclosed |
| US-9233840-B2 | Method for improving self-assembled polymer features | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2016-01-12 | — | — | US | disclosed |
| EP-1391476-B1 | PHOTOREACTIVE COMPOSITION | SEKISUI CHEMICAL CO LTD (JP) | 2015-12-09 | — | — | EP | disclosed |
| EP-2657257-B1 | CONJUGATED DIENE RUBBER, RUBBER COMPOSITION, RUBBER CROSSLINKED PRODUCT, AND TIRE | ZEON CORP (JP) | 2015-10-14 | — | — | EP | disclosed |
| US-9139721-B2 | Rubber composition for tire treads | THE YOKOHAMA RUBBER CO., LTD. (JP) | 2015-09-22 | — | — | US | disclosed |
| US-9126231-B2 | Insulation pattern-forming method and insulation pattern-forming material | JSR CORPORATION (JP) | 2015-09-08 | — | — | US | disclosed |
| US-9116427-B2 | Composition for forming resist underlayer film and pattern-forming method | JSR CORPORATION (JP) | 2015-08-25 | — | — | US | disclosed |
| US-20150160556-A1 | RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2015-06-11 | — | — | US | disclosed |
| US-9034292-B2 | Method and apparatus for producing disilane through pyrolysis of monosilane | OCI MATERIALS CO., LTD. (KR) | 2015-05-19 | — | — | US | disclosed |
| US-20150126643-A1 | Rubber Composition for Tire | THE YOKOHAMA RUBBER CO., LTD. (JP) | 2015-05-07 | — | — | US | disclosed |
| US-20150118863-A1 | METHODS AND APPARATUS FOR FORMING FLOWABLE DIELECTRIC FILMS HAVING LOW POROSITY | LAM RESEARCH CORPORATION | 2015-04-30 | — | — | US | disclosed |
| US-20150118862-A1 | TREATMENT FOR FLOWABLE DIELECTRIC DEPOSITION ON SUBSTRATE SURFACES | LAM RESEARCH CORPORATION | 2015-04-30 | — | — | US | disclosed |
| US-8993223-B2 | Resist pattern-forming method | JSR CORPORATION (JP) | 2015-03-31 | — | — | US | disclosed |
| US-20150078980-A1 | METHOD AND APPARATUS FOR PRODUCING DISILANE THROUGH PYROLYSIS OF MONOSILANE | OCI MATERIALS CO., LTD. | 2015-03-19 | — | — | US | disclosed |
| US-20150056822-A1 | COMPOSITIONS AND METHODS USING SAME FOR FLOWABLE OXIDE DEPOSITION | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2015-02-26 | — | — | US | disclosed |
| US-20150054192-A1 | Method for Producing Rubber-Like Polymer | ASAHI KASEI CHEMICALS CORPORATION (JP) | 2015-02-26 | — | — | US | disclosed |
| EP-2840164-A1 | Compositions and methods using same for flowable oxide deposition | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2015-02-25 | — | — | EP | disclosed |
| US-8962747-B2 | Resist underlayer composition and process of producing integrated circuit devices using the same | CHEIL INDUSTRIES, INC. (KR) | 2015-02-24 | — | — | US | disclosed |
| US-20150050600-A9 | RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2015-02-19 | — | — | US | disclosed |
| US-20150048046-A1 | METHOD FOR FORMING PATTERN, AND POLYSILOXANE COMPOSITION | JSR CORPORATION (JP) | 2015-02-19 | — | — | US | disclosed |
| US-8956807-B2 | Method for forming resist pattern, and composition for forming resist underlayer film | JSR CORPORATION (JP) | 2015-02-17 | — | — | US | disclosed |
| US-20150044882-A1 | FLOWABLE OXIDE FILM WITH TUNABLE WET ETCH RATE | NOVELLUS SYSTEMS INC (US) | 2015-02-12 | — | — | US | disclosed |
| EP-2832752-A1 | METHOD FOR MANUFACTURING RUBBER-LIKE POLYMER | Asahi Kasei Chemicals Corporation (JP) | 2015-02-04 | — | — | EP | disclosed |
| US-20150031791-A1 | Rubber Composition for Tire Treads | THE YOKOHAMA RUBBER CO., LTD. (JP) | 2015-01-29 | — | — | US | disclosed |
| US-8937130-B2 | Conjugated diene rubber, rubber composition, cross-linked rubber, and tire | ZEON CORPORATION (JP) | 2015-01-20 | — | — | US | disclosed |
| US-8927201-B2 | Multilayer resist process pattern-forming method and multilayer resist process inorganic film-forming composition | JSR CORPORATION (JP) | 2015-01-06 | — | — | US | disclosed |
| US-20150004806-A1 | LOW-K OXIDE DEPOSITION BY HYDROLYSIS AND CONDENSATION | LAM RESEARCH CORPORATION | 2015-01-01 | — | — | US | disclosed |
| US-20140302689-A1 | METHODS AND APPARATUS FOR DIELECTRIC DEPOSITION | NOVELLUS SYSTEMS, INC. (US) | 2014-10-09 | — | — | US | disclosed |
| US-8846536-B2 | Flowable oxide film with tunable wet etch rate | NOVELLUS SYSTEMS, INC. (US) | 2014-09-30 | — | — | US | disclosed |
| US-8841218-B2 | Resist underlayer composition and process of producing integrated circuit devices using same | CHEIL INDUSTRIES, INC. (KR) | 2014-09-23 | — | — | US | disclosed |
| US-8734904-B2 | Methods of forming topographical features using segregating polymer mixtures | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-05-27 | — | — | US | disclosed |
| US-8728958-B2 | Gap fill integration | NOVELLUS SYSTEMS, INC. (US) | 2014-05-20 | — | — | US | disclosed |
| US-20140134544-A1 | RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2014-05-15 | — | — | US | disclosed |
| US-8703395-B2 | Pattern-forming method | JSR CORPORATION (JP) | 2014-04-22 | — | — | US | disclosed |
| US-8669042-B2 | Resist pattern-forming method | JSR CORPORATION (JP) | 2014-03-11 | — | — | US | disclosed |
| US-20140030660-A1 | MULTILAYER RESIST PROCESS PATTERN-FORMING METHOD AND MULTILAYER RESIST PROCESS INORGANIC FILM-FORMING COMPOSITION | JSR CORPORATION (JP) | 2014-01-30 | — | — | US | disclosed |
| US-20130338255-A1 | RUBBER COMPOSITION FOR TIRE TREAD | THE YOKOHAMA RUBBER CO., LTD. (JP) | 2013-12-19 | — | — | US | disclosed |
| EP-2272878-B1 | Coupled polymers and manufacturing method thereof | TSRC CORP (TW) | 2013-12-18 | — | — | EP | disclosed |
| US-20130324638-A1 | RUBBER COMPOSITION FOR USE IN TIRE TREADS | THE YOKOHAMA RUBBER CO., LTD. (JP) | 2013-12-05 | — | — | US | disclosed |
| EP-2657257-A1 | CONJUGATED DIENE RUBBER, RUBBER COMPOSITION, RUBBER CROSSLINK PRODUCT, AND TIRE | Zeon Corporation (JP) | 2013-10-30 | — | — | EP | disclosed |
| US-20130267646-A1 | RUBBER COMPOSITION FOR TIRE TREAD AND PNEUMATIC TIRE USING THE SAME | THE YOKOHAMA RUBBER CO., LTD. (JP) | 2013-10-10 | — | — | US | disclosed |
| US-20130267649-A1 | CONJUGATED DIENE RUBBER, RUBBER COMPOSITION, CROSS-LINKED RUBBER, AND TIRE | ZEON CORPORATION (JP) | 2013-10-10 | — | — | US | disclosed |
| US-8536242-B2 | Photocurable composition | SEKISUI CHEMICAL CO., LTD. (JP) | 2013-09-17 | — | — | US | disclosed |
| US-20130233825-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM AND PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2013-09-12 | — | — | US | disclosed |
| US-20130230987-A1 | FLOWABLE OXIDE FILM WITH TUNABLE WET ETCH RATE | NOVELLUS SYSTEMS, INC. | 2013-09-05 | — | — | US | disclosed |
| EP-2615497-A1 | RESIST PATTERN FORMING METHOD | JSR Corporation (JP) | 2013-07-17 | — | — | EP | disclosed |
| CN-101528974-B | Method for deposition of dielectric layer in clearance formed on a substrate and filling the clearance using the dielectric material | APPLIED MATERIALS INC | 2013-07-17 | — | — | CN | disclosed |
| US-8481649-B2 | Coupled polymers and manufacturing method thereof | TSRC CORPORATION (TW) | 2013-07-09 | — | — | US | disclosed |
| EP-1746122-B1 | METHOD FOR FORMING ORGANIC SILICA FILM, ORGANIC SILICA FILM, WIRING STRUCTURE AND SEMICONDUCTOR DEVICE | JSR CORP (JP) | 2013-06-12 | — | — | EP | disclosed |
| US-8455605-B2 | Resin composition for transparent encapsulation material and electronic device formed using the same | CHEIL INDUSTRIES, INC. (KR) | 2013-06-04 | — | — | US | disclosed |
| US-8450045-B2 | Pattern forming method | JSR CORPORATION (JP) | 2013-05-28 | — | — | US | disclosed |
| US-20130130179-A1 | POLYSILOXANE COMPOSITION AND PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2013-05-23 | — | — | US | disclosed |
| US-20130107235-A1 | PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2013-05-02 | — | — | US | disclosed |
| WO-2013061601-A1 | PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2013-05-02 | — | — | WO | disclosed |
| US-20130101942-A1 | METHOD FOR FORMING RESIST PATTERN, AND COMPOSITION FOR FORMING RESIST UNDERLAYER FILM | JSR CORPORATION (JP) | 2013-04-25 | — | — | US | disclosed |
| EP-2579304-A1 | INSULATION PATTERN FORMING METHOD AND INSULATION PATTERN FORMING MATERIAL FOR DAMASCENE PROCESS | JSR Corporation (JP) | 2013-04-10 | — | — | EP | disclosed |
| US-20130084394-A1 | INSULATION PATTERN-FORMING METHOD AND INSULATION PATTERN-FORMING MATERIAL | JSR CORPORATION (JP) | 2013-04-04 | — | — | US | disclosed |
| US-8404786-B2 | Polymer and process for producing the same, composition for forming insulating film, and insulating film and method of forming the same | JSR CORPORATION (JP) | 2013-03-26 | — | — | US | disclosed |
| EP-1705208-B1 | COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING SAME, SILICA INSULATING FILM, AND METHOD FOR FORMING SAME | JSR CORP (JP) | 2013-03-20 | — | — | EP | disclosed |
| US-20130037921-A1 | RESIST UNDERLAYER COMPOSITION AND PROCESS OF PRODUCING INTEGRATED CIRCUIT DEVICES USING SAME | CHEIL INDUSTRIES, INC. (KR) | 2013-02-14 | — | — | US | disclosed |
| EP-2003146-B1 | USE OF A CONJUGATED DIENE RUBBER FOR A TIRE | ZEON CORP (JP) | 2012-12-26 | — | — | EP | disclosed |
| US-8298965-B2 | Volatile precursors for deposition of C-linked SiCOH dielectrics | AMERICAN AIR LIQUIDE, INC. (US) | 2012-10-30 | — | — | US | disclosed |
| US-20120270981-A1 | RESIST UNDERLAYER COMPOSITION AND PROCESS OF PRODUCING INTEGRATED CIRCUIT DEVICES USING THE SAME | CHEIL INDUSTRIES, INC. (KR) | 2012-10-25 | — | — | US | disclosed |
| US-20120270998-A1 | RESIN COMPOSITION FOR TRANSPARENT ENCAPSULATION MATERIAL AND ELECTRONIC DEVICE FORMED USING THE SAME | CHEIL INDUSTRIES, INC. (KR) | 2012-10-25 | — | — | US | disclosed |
| EP-1705207-B1 | METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM | JSR CORP (JP) | 2012-10-24 | — | — | EP | disclosed |
| EP-2503022-A1 | Formation of high quality dielectric films of silicon dioxide for STI: usage of different siloxane-based precursors for HARP II - remote plasma enhanced deposition processes | Applied Materials, Inc. (US) | 2012-09-26 | — | — | EP | disclosed |
| US-8268403-B2 | Curing a coating of a siloxane compound and a carbosilane compound using ultraviolet radiation; a low relative dielectric constant, excellent chemical resistance, plasma resistance, mechanical strength | JSR CORPORATION (JP) | 2012-09-18 | — | — | US | disclosed |
| US-20120231575-A1 | METHOD FOR PRODUCING SOLAR CELL | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2012-09-13 | — | — | US | disclosed |
| US-8263316-B2 | Electronic device manufacture | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2012-09-11 | — | — | US | disclosed |
| EP-2495771-A1 | SOLAR CELL | Hitachi Chemical Company, Ltd. (JP) | 2012-09-05 | — | — | EP | disclosed |
| EP-2495770-A1 | METHOD FOR PRODUCING SOLAR CELL | Hitachi Chemical Company, Ltd. (JP) | 2012-09-05 | — | — | EP | disclosed |
| US-20120211076-A1 | SOLAR CELL | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2012-08-23 | — | — | US | disclosed |
| US-20120183908-A1 | RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2012-07-19 | — | — | US | disclosed |
| US-20120161405-A1 | SYSTEM AND APPARATUS FOR FLOWABLE DEPOSITION IN SEMICONDUCTOR FABRICATION | NOVELLUS SYSTEMS, INC. | 2012-06-28 | — | — | US | disclosed |
| US-20120149213-A1 | BOTTOM UP FILL IN HIGH ASPECT RATIO TRENCHES | NOVELLUS SYSTEMS, INC. | 2012-06-14 | — | — | US | disclosed |
| US-20120135146-A1 | METHODS OF FORMING TOPOGRAPHICAL FEATURES USING SEGREGATING POLYMER MIXTURES | JSR CORPORATION (JP) | 2012-05-31 | — | — | US | disclosed |
| US-20120122036-A1 | PATTERN FORMING METHOD | JSR CORPORATION (JP) | 2012-05-17 | — | — | US | disclosed |
| US-8173348-B2 | Method of forming pattern and composition for forming of organic thin-film for use therein | JSR CORPORATION (JP) | 2012-05-08 | — | — | US | disclosed |
| US-20120103935-A1 | METHOD FOR IMPROVING SELF-ASSEMBLED POLYMER FEATURES | JSR CORPORATION (JP) | 2012-05-03 | — | — | US | disclosed |
| US-8158191-B2 | Coating compositions, articles, and methods of coating articles | SDC COATINGS, INC. (US) | 2012-04-17 | — | — | US | disclosed |
| US-8158301-B2 | Polyelectrolyte membranes and methods for making | GENERAL ELECTRIC COMPANY (US) | 2012-04-17 | — | — | US | disclosed |
| US-8158981-B2 | Radiation-sensitive composition, method of forming silica-based coating film, silica-based coating film, apparatus and member having silica-based coating film and photosensitizing agent for insulating film | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2012-04-17 | — | — | US | disclosed |
| US-8153348-B2 | Process sequence for formation of patterned hard mask film (RFP) without need for photoresist or dry etch | APPLIED MATERIALS, INC. (US) | 2012-04-10 | — | — | US | disclosed |
| US-8153348-B2 | Process sequence for formation of patterned hard mask film (RFP) without need for photoresist or dry etch | APPLIED MATERIALS, INC. (US) | 2012-04-10 | — | — | US | disclosed |
| US-8153197-B2 | Coating compositions, articles, and methods of coating articles | SDC TECHNOLOGIES, INC. (US) | 2012-04-10 | — | — | US | disclosed |
| US-8153196-B2 | Coating compositions, articles, and methods of coating articles | SDC TECHNOLOGIES, INC. (US) | 2012-04-10 | — | — | US | disclosed |
| US-20120049401-A1 | COATING COMPOSITIONS, ARTICLES, AND METHODS OF COATING ARTICLES | SDC TECHNOLOGIES, INC. (US) | 2012-03-01 | — | — | US | disclosed |
| US-8119324-B2 | Method of forming pattern, composition for forming upper-layer film, and composition for forming under-layer film | JSR CORPORATION (JP) | 2012-02-21 | — | — | US | disclosed |
| US-8034545-B2 | Radiation curable composition, storing method thereof, forming method of cured film, patterning method, use of pattern, electronic components and optical waveguide | HITACHI CHEMICAL CO., LTD. (JP) | 2011-10-11 | — | — | US | disclosed |
| EP-1160848-B1 | Composition for silica-based film formation | JSR CORP (JP) | 2011-10-05 | — | — | EP | disclosed |
| US-8026035-B2 | Organosilicon polymer containing chromogen; antireflactivity coating for lithography | CHEIL INDUSTRIES, INC. (KR) | 2011-09-27 | — | — | US | disclosed |
| US-7999355-B2 | Aminosilanes for shallow trench isolation films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2011-08-16 | — | — | US | disclosed |
| US-7972656-B2 | Coating compositions, articles, and methods of coating articles | SDC TECHNOLOGIES, INC. (US) | 2011-07-05 | — | — | US | disclosed |
| US-20110151678-A1 | NOVEL GAP FILL INTEGRATION | NOVELLUS SYSTEMS, INC. | 2011-06-23 | — | — | US | disclosed |
| EP-1981074-B1 | ORGANIC SILICA FILM AND METHOD FOR FORMING SAME, COMPOSITION FOR FORMING INSULATING FILM OF SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING SAME, WIRING STRUCTURE AND SEMICONDUCTOR DEVICE | JSR CORP (JP) | 2011-06-22 | — | — | EP | disclosed |
| WO-2011072143-A2 | NOVEL GAP FILL INTEGRATION | NOVELLUS SYSTEMS, INC. (US) | 2011-06-16 | — | — | WO | disclosed |
| US-7943531-B2 | Methods for forming a silicon oxide layer over a substrate | APPLIED MATERIALS, INC. (US) | 2011-05-17 | — | — | US | disclosed |
| US-7943531-B2 | Methods for forming a silicon oxide layer over a substrate | APPLIED MATERIALS, INC. (US) | 2011-05-17 | — | — | US | disclosed |
| US-20110097669-A1 | PHOTOCURABLE COMPOSITION | SEKISUI CHEMICAL CO., LTD. (JP) | 2011-04-28 | — | — | US | disclosed |
| US-7932295-B2 | Organic silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device | JSR CORPORATION (JP) | 2011-04-26 | — | — | US | disclosed |
| US-20110077364-A1 | COMPOSITION CONTAINING SILICON-CONTAINING POLYMER, CURED PRODUCT OF THE COMPOSITION, SILICON-CONTAINING POLYMER, AND METHOD OF PRODUCING THE SILICON-CONTAINING POLYMER | JSR CORPORATION (JP) | 2011-03-31 | — | — | US | disclosed |
| US-20110042789-A1 | MATERIAL FOR CHEMICAL VAPOR DEPOSITION, SILICON-CONTAINING INSULATING FILM AND METHOD FOR PRODUCTION OF THE SILICON-CONTAINING INSULATING FILM | JSR CORPORATION (JP) | 2011-02-24 | — | — | US | disclosed |
| US-7893538-B2 | Organic silica film and method for forming same, composition for forming insulating film of semiconductor device and method for producing same, wiring structure and semiconductor device | JSR CORPORATION (JP) | 2011-02-22 | — | — | US | disclosed |
| US-7875317-B2 | formed by hydrolyzing and condensing a siloxy compound in the presence of a polycarbosilane; low relative dielectric constant and excellent mechanical strength, storage stability, and chemical resistance; semiconductors | JSR CORPORATION (JP) | 2011-01-25 | — | — | US | disclosed |
| US-20110009588-A1 | COUPLED POLYMERS AND MANUFACTURING METHOD THEREOF | TSRC CORPORATION (TW) | 2011-01-13 | — | — | US | disclosed |
| EP-2272878-A1 | Coupled polymers and manufacturing method thereof | TSRC Corporation (TW) | 2011-01-12 | — | — | EP | disclosed |
| EP-2264219-A1 | MATERIAL FOR CHEMICAL VAPOR DEPOSITION, SILICON-CONTAINING INSULATING FILM AND PROCESS FOR PRODUCTION THEREOF | JSR Corporation (JP) | 2010-12-22 | — | — | EP | disclosed |
| US-20100310876-A1 | COATING COMPOSITIONS, ARTICLES, AND METHODS OF COATING ARTICLES | SDC TECHNOLOGIES, INC. (US) | 2010-12-09 | — | — | US | disclosed |
| US-7825040-B1 | Method for depositing flowable material using alkoxysilane or aminosilane precursor | ASM JAPAN K.K. (JP) | 2010-11-02 | — | — | US | disclosed |
| EP-1296365-B1 | Method of film formation | JSR CORP (JP) | 2010-09-22 | — | — | EP | disclosed |
| US-20100233635-A1 | METHOD OF FORMING PATTERN AND COMPOSITION FOR FORMING OF ORGANIC THIN-FILM FOR USE THEREIN | JSR CORPORATION (JP) | 2010-09-16 | — | — | US | disclosed |
| EP-2042531-B1 | BLOCK COPOLYMER, COMPOSITION FOR RESIN MODIFICATION, AND MODIFIED RESIN COMPOSITION | ZEON CORP (JP) | 2010-09-01 | — | — | EP | disclosed |
| EP-2208222-A1 | METHODS FOR FORMING A SILICON OXIDE LAYER OVER A SUBSTRATE | Applied Materials, Inc. (US) | 2010-07-21 | — | — | EP | disclosed |
| US-20100178620-A1 | INVERTED PATTERN FORMING METHOD AND RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-07-15 | — | — | US | disclosed |
| US-20100164057-A1 | PRECURSORS FOR SILICON DIOXIDE GAP FILL | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2010-07-01 | — | — | US | disclosed |
| US-20100168327-A1 | POLYMER AND PROCESS FOR PRODUCING THE SAME, COMPOSITION FOR FORMING INSULATING FILM, AND INSULATING FILM AND METHOD OF FORMING THE SAME | JSR CORPORATION (JP) | 2010-07-01 | — | — | US | disclosed |
| US-20100167024-A1 | NEGATIVE-TONE RADIATION-SENSITIVE COMPOSITION, CURED PATTERN FORMING METHOD, AND CURED PATTERN | JSR CORPORATION (JP) | 2010-07-01 | — | — | US | disclosed |
| US-7736748-B2 | Insulating-film-forming composition, method of producing the same, silica-based insulating film, and method of forming the same | JSR CORPORATION (JP) | 2010-06-15 | — | — | US | disclosed |
| US-20100119736-A1 | AMBIENT PRESSURE SYNTHESIS OF ZEOLITE FILMS AND THEIR APPLICATION AS CORROSION RESISTANT COATINGS | THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) | 2010-05-13 | — | — | US | disclosed |
| US-20100102321-A1 | RADIATION-SENSITIVE COMPOSITION, METHOD OF FORMING SILICA-BASED COATING FILM, SILICA-BASED COATING FILM, APPARATUS AND MEMBER HAVING SILICA-BASED COATING FILM AND PHOTOSENSITIZING AGENT FOR INSULATING FILM | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2010-04-29 | — | — | US | disclosed |
| US-20100052115-A1 | Volatile Precursors for Deposition of C-Linked SiCOH Dielectrics | AMERICAN AIR LIQUIDE, INC. (US) | 2010-03-04 | — | — | US | disclosed |
| US-20100007025-A1 | ORGANIC SILICA FILM AND METHOD FOR FORMING SAME, COMPOSITION FOR FORMING INSULATING FILM OF SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING SAME, WIRING STRUCTURE AND SEMICONDUCTOR DEVICE | JSR CORPORATION (JP) | 2010-01-14 | — | — | US | disclosed |
| US-20100009546-A1 | Aminosilanes for Shallow Trench Isolation Films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2010-01-14 | — | — | US | disclosed |
| EP-2144279-A2 | Aminosilanes for shallow trench isolation films | Air Products and Chemicals, Inc. (US) | 2010-01-13 | — | — | EP | disclosed |
| US-20090311622-A1 | METHOD OF FORMING PATTERN, COMPOSITION FOR FORMING UPPER-LAYER FILM, AND COMPOSITION FOR FORMING UNDER-LAYER FILM | JSR CORPORATION (JP) | 2009-12-17 | — | — | US | disclosed |
| US-20090297911-A1 | POLYELECTROLYTE MEMBRANES AND METHODS FOR MAKING | BHA ALTAIR, LLC | 2009-12-03 | — | — | US | disclosed |
| US-20090297839-A1 | Coating Compositions, Articles, and Methods of Coating Articles | SDC TECHNOLOGIES, INC. (US) | 2009-12-03 | — | — | US | disclosed |
| EP-2128921-A1 | Polyelectrolyte membranes and methods for making | General Electric Company (US) | 2009-12-02 | — | — | EP | disclosed |
| EP-1090967-B1 | Composition for film formation, method of film formation, and insulating film | JSR CORP (JP) | 2009-11-11 | — | — | EP | disclosed |
| US-7608928-B2 | Laminated body and semiconductor device | JSR CORPORATION (JP) | 2009-10-27 | — | — | US | disclosed |
| US-20090251652-A1 | Silica based positive type photosensitive organic compound | HITACHI CHEMICAL CO., LTD. | 2009-10-08 | — | — | US | disclosed |
| CN-101528974-A | Formation of high quality dielectric films of silicon dioxide for sti: usage of different siloxane-based precursors for harp II-remote plasma enhanced deposition processes | APPLIED MATERIALS INC (US) | 2009-09-09 | — | — | CN | disclosed |
| US-20090220897-A1 | RADIATION CURABLE COMPOSITION, STORING METHOD THEREOF, FORMING METHOD OF CURED FILM, PATTERNING METHOD, USE OF PATTERN, ELECTRONIC COMPONENTS AND OPTICAL WAVEGUIDE | HITACHI CHEMICAL CO., LTD. (JP) | 2009-09-03 | — | — | US | disclosed |
| WO-2009105347-A2 | PROCESS SEQUENCE FOR FORMATION OF PATTERNED HARD MASK FILM (RFP) WITHOUT NEED FOR PHOTORESIST OR DRY ETCH | APPLIED MATERIALS, INC. (US) | 2009-08-27 | — | — | WO | disclosed |
| US-20090214796-A1 | Method for Forming Antireflection Film | MITSUBISHI DENKI KABUSHIKI KAISHA (JP) | 2009-08-27 | — | — | US | disclosed |
| US-20090208880-A1 | PROCESS SEQUENCE FOR FORMATION OF PATTERNED HARD MASK FILM (RFP) WITHOUT NEED FOR PHOTORESIST OR DRY ETCH | APPLIED MATERIALS, INC. (US) | 2009-08-20 | — | — | US | disclosed |
| US-20090208880-A1 | PROCESS SEQUENCE FOR FORMATION OF PATTERNED HARD MASK FILM (RFP) WITHOUT NEED FOR PHOTORESIST OR DRY ETCH | APPLIED MATERIALS, INC. (US) | 2009-08-20 | — | — | US | disclosed |
| EP-2082078-A2 | FORMATION OF HIGH QUALITY DIELECTRIC FILMS OF SILICON DIOXIDE FOR STI: USAGE OF DIFFERENT SILOXANE-BASED PRECURSORS FOR HARP II - REMOTE PLASMA ENHANCED DEPOSITION PROCESSES | Applied Materials, INC. (US) | 2009-07-29 | — | — | EP | disclosed |
| US-7556860-B2 | Laminate and method of forming the same, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2009-07-07 | — | — | US | disclosed |
| EP-2071400-A1 | Coating compositions for use with an overcoated photoresist | Rohm and Haas Electronic Materials LLC (US) | 2009-06-17 | — | — | EP | disclosed |
| US-20090148789-A1 | Coating compositions for use with an overcoated photoresist | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2009-06-11 | — | — | US | disclosed |
| US-7530683-B2 | Fixing fluid and inkjet ink sets comprising same | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2009-05-12 | — | — | US | disclosed |
| EP-2003146-A9 | CONJUGATED DIENE RUBBER, METHOD FOR PRODUCING THE SAME, RUBBER COMPOSITION FOR TIRE, AND TIRE | ZEON CORPORATION (JP) | 2009-05-06 | — | — | EP | disclosed |
| US-7528207-B2 | Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film | JSR CORPORATION (JP) | 2009-05-05 | — | — | US | disclosed |
| WO-2009055340-A1 | METHODS FOR FORMING A SILICON OXIDE LAYER OVER A SUBSTRATE | APPLIED MATERIALS, INC. (US) | 2009-04-30 | — | — | WO | disclosed |
| US-20090104791-A1 | Methods for Forming a Silicon Oxide Layer Over a Substrate | APPLIED MATERIALS, INC. A DELAWARE CORPORATION (US) | 2009-04-23 | — | — | US | disclosed |
| US-20090104791-A1 | Methods for Forming a Silicon Oxide Layer Over a Substrate | APPLIED MATERIALS, INC. A DELAWARE CORPORATION (US) | 2009-04-23 | — | — | US | disclosed |
| EP-2048541-A1 | METHOD OF FORMING PATTERN, COMPOSITION FOR FORMING UPPER-LAYER FILM, AND COMPOSITION FOR FORMING LOWER-LAYER FILM | JSR Corporation (JP) | 2009-04-15 | — | — | EP | disclosed |
| EP-1127929-B1 | Composition for film formation, method of film formation, and silica-based film | JSR CORP (JP) | 2009-04-15 | — | — | EP | disclosed |
| US-7514151-B2 | Insulating film and method for forming the same, and film-forming composition | JSR CORPORATION (JP) | 2009-04-07 | — | — | US | disclosed |
| EP-2042531-A1 | BLOCK COPOLYMER, COMPOSITION FOR RESIN MODIFICATION, AND MODIFIED RESIN COMPOSITION | ZEON CORPORATION (JP) | 2009-04-01 | — | — | EP | disclosed |
| EP-2034364-A1 | METHOD OF FORMING PATTERN AND COMPOSITION FOR FORMING OF ORGANIC THIN-FILM FOR USE THEREIN | JSR Corporation (JP) | 2009-03-11 | — | — | EP | disclosed |
| EP-1778799-B1 | FIXING FLUID AND INKJET INK SETS COMPRISING SAME | DU PONT (US) | 2009-03-04 | — | — | EP | disclosed |
| US-7498273-B2 | Formation of high quality dielectric films of silicon dioxide for STI: usage of different siloxane-based precursors for harp II—remote plasma enhanced deposition processes | APPLIED MATERIALS, INC. (US) | 2009-03-03 | — | — | US | disclosed |
| US-7498273-B2 | Formation of high quality dielectric films of silicon dioxide for STI: usage of different siloxane-based precursors for harp II—remote plasma enhanced deposition processes | APPLIED MATERIALS, INC. (US) | 2009-03-03 | — | — | US | disclosed |
| US-7488693-B2 | Method for producing silicon oxide film | TOAGOSEI CO., LTD. (JP) | 2009-02-10 | — | — | US | disclosed |
| EP-2001965-A1 | COATING COMPOSITIONS, ARTICLES, AND METHODS OF COATING ARTICLES | SDC COATINGS, INC. (US) | 2008-12-17 | — | — | EP | disclosed |
| EP-2003146-A2 | CONJUGATED DIENE RUBBER, METHOD FOR PRODUCING THE SAME, RUBBER COMPOSITION FOR TIRE, AND TIRE | ZEON CORPORATION (JP) | 2008-12-17 | — | — | EP | disclosed |
| US-7462678-B2 | Film forming composition, process for producing film forming composition, insulating film forming material, process for forming film, and silica-based film | JSR CORPORATION (JP) | 2008-12-09 | — | — | US | disclosed |
| US-20080268264-A1 | Method for Forming Organic Silica Film, Organic Silica Film, Wiring Structure, Semiconductor Device, and Composition for Film Formation | JSR CORPORATION (JP) | 2008-10-30 | — | — | US | disclosed |
| US-20080260956-A1 | Film, Silica Film and Method of Forming the Same, Composition for Forming Silica Film, and Electronic Part | HITACHI CHEMICAL CO., LTD. (JP) | 2008-10-23 | — | — | US | disclosed |
| EP-1981074-A1 | ORGANIC SILICA FILM AND METHOD FOR FORMING SAME, COMPOSITION FOR FORMING INSULATING FILM OF SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING SAME, WIRING STRUCTURE AND SEMICONDUCTOR DEVICE | JSR Corporation (JP) | 2008-10-15 | — | — | EP | disclosed |
| US-20080246153-A1 | ORGANIC SILICA-BASED FILM, METHOD OF FORMING THE SAME, COMPOSITION FOR FORMING INSULATING FILM FOR SEMICONDUCTOR DEVICE, INTERCONNECT STRUCTURE, AND SEMICONDUCTOR DEVICE | JSR CORPORATION (JP) | 2008-10-09 | — | — | US | disclosed |
| US-20080241748-A1 | Etch-resistant disilane and saturated hydrocarbon bridged silicon-containing polymers, method of making the same, and method of using the same | CHEIL INDUSTRIES, INC. (KR) | 2008-10-02 | — | — | US | disclosed |
| US-20080233330-A1 | SILICON SUBSTRATE FOR MAGNETIC RECORDING MEDIA AND METHOD OF FABRICATING THE SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-09-25 | — | — | US | disclosed |
| US-20080193831-A1 | ANODE ACTIVE MATERIAL, METHOD OF PREPARING THE SAME, ANODE AND LITHIUM BATTERY CONTAINING THE MATERIAL | SAMSUNG SDI CO., LTD. (KR) | 2008-08-14 | — | — | US | disclosed |
| EP-1246239-B1 | Method of forming dual damascene structure | JSR CORP (JP) | 2008-07-23 | — | — | EP | disclosed |
| US-7399715-B2 | Organic silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device | JSR CORPORATION (JP) | 2008-07-15 | — | — | US | disclosed |
| US-20080166478-A1 | Composite Material, Coating Liquid and Manufacturing Method of Composite Material | TOTO LTD. (JP) | 2008-07-10 | — | — | US | disclosed |
| US-20080145547-A1 | Coating Compositions, Articles, And Methods Of Coating Articles | SDC TECHNOLOGIES, INC. (US) | 2008-06-19 | — | — | US | disclosed |
| WO-2008048862-A2 | FORMATION OF HIGH QUALITY DIELECTRIC FILMS OF SILICON DIOXIDE FOR STI: USAGE OF DIFFERENT SILOXANE-BASED PRECURSORS FOR HARP II - REMOTE PLASMA ENHANCED DEPOSITION PROCESSES | APPLIED MATERIALS, INC. (US) | 2008-04-24 | — | — | WO | disclosed |
| US-20080044664-A1 | Laminated Body and Semiconductor Drive | JSR CORPORATION (JP) | 2008-02-21 | — | — | US | disclosed |
| EP-1890172-A1 | METHOD FOR FORMING ANTIREFLECTION FILM | Hitachi Chemical Co., Ltd. (JP) | 2008-02-20 | — | — | EP | disclosed |
| US-20080038527-A1 | Method for Forming Organic Silica Film, Organic Silica Film, Wiring Structure, Semiconductor Device, and Composition for Film Formation | JSR CORPORATION (JP) | 2008-02-14 | — | — | US | disclosed |
| US-20080014339-A1 | COATING COMPOSITIONS, ARTICLES, AND METHODS OF COATING ARTICLES | SDC COATINGS, INC. (US) | 2008-01-17 | — | — | US | disclosed |
| EP-1535976-B1 | Composition for film formation, method for preparing the composition, and method for forming insulating film | JSR CORP (JP) | 2008-01-16 | — | — | EP | disclosed |
| US-7312013-B2 | Photoreactive composition | SEKISUI CHEMICAL CO., LTD. (JP) | 2007-12-25 | — | — | US | disclosed |
| US-20070281495-A1 | FORMATION OF HIGH QUALITY DIELECTRIC FILMS OF SILICON DIOXIDE FOR STI: USAGE OF DIFFERENT SILOXANE-BASED PRECURSORS FOR HARP II - REMOTE PLASMA ENHANCED DEPOSITION PROCESSES | APPLIED MATERIALS, INC. (US) | 2007-12-06 | — | — | US | disclosed |
| US-20070281495-A1 | FORMATION OF HIGH QUALITY DIELECTRIC FILMS OF SILICON DIOXIDE FOR STI: USAGE OF DIFFERENT SILOXANE-BASED PRECURSORS FOR HARP II - REMOTE PLASMA ENHANCED DEPOSITION PROCESSES | APPLIED MATERIALS, INC. (US) | 2007-12-06 | — | — | US | disclosed |
| US-7297464-B2 | Radiation curable composition, storing method thereof, forming method of cured film, patterning method, use of pattern, electronic components and optical waveguide | HITACHI CHEMICAL CO., LTD. (JP) | 2007-11-20 | — | — | US | disclosed |
| US-7291567-B2 | Silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device | JSR CORPORATION (JP) | 2007-11-06 | — | — | US | disclosed |
| WO-2007114808-A1 | COATING COMPOSITIONS, ARTICLES, AND METHODS OF COATING ARTICLES | SDC COATINGS, INC. (US) | 2007-10-11 | — | — | WO | disclosed |
| EP-1837173-A1 | COMPOSITE MATERIAL, COATING FLUID AND METHOD FOR PRODUCING COMPOSITE MATERIAL | TOTO LTD. (JP) | 2007-09-26 | — | — | EP | disclosed |
| EP-1648709-B1 | METHOD FOR MODIFYING THE SURFACE OF SUBSTRATE | 3M INNOVATIVE PROPERTIES CO (US) | 2007-09-19 | — | — | EP | disclosed |
| EP-1829945-A1 | FILM, SILICA FILM AND METHOD OF FORMING THE SAME, COMPOSITION FOR FORMING SILICA FILM, AND ELECTRONIC PART | Hitachi Chemical Co., Ltd. (JP) | 2007-09-05 | — | — | EP | disclosed |
| US-7265179-B2 | Coating compositions, articles, and methods of coating articles | SDC TECHNOLOGIES, INC. (US) | 2007-09-04 | — | — | US | disclosed |
| EP-1814930-A2 | COATING COMPOSITIONS, ARTICLES, AND METHODS OF COATING ARTICLES | SDC COATINGS, INC. (US) | 2007-08-08 | — | — | EP | disclosed |
| EP-1175466-B1 | COMPOSITION FOR PROVIDING AN ABRASION-RESISTANT COATING | SDC COATINGS INC (US) | 2007-08-01 | — | — | EP | disclosed |
| US-20070173072-A1 | Method for producing silicon oxide film | TOAGOSEI CO., LTD. (JP) | 2007-07-26 | — | — | US | disclosed |
| US-20070135565-A1 | COMPOSITION FOR FORMING POROUS FILM, POROUS FILM AND METHOD FOR FORMING THE SAME, INTERLEVEL INSULATOR FILM, AND SEMICONDUCTOR DEVICE | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2007-06-14 | — | — | US | disclosed |
| US-20070104968-A1 | COATING COMPOSITIONS, ARTICLES, AND METHODS OF COATING ARTICLES | SDC COATINGS, INC. (US) | 2007-05-10 | — | — | US | disclosed |
| EP-1760774-A1 | LAMINATED BODY AND SEMICONDUCTOR DEVICE | JSR Corporation (JP) | 2007-03-07 | — | — | EP | disclosed |
| US-20070031687-A1 | Insulating-film-forming composition, method of producing the same, silica-based insulating film, and method of forming the same | JSR CORPORATION (JP) | 2007-02-08 | — | — | US | disclosed |
| US-20070027287-A1 | Polymer and process for producing the same, composition for forming insulating film, and insulating film and method of forming the same | JSR CORPORATION (JP) | 2007-02-01 | — | — | US | disclosed |
| US-20070020467-A1 | Composition for forming insulating film, method for producing same, silica-based insulating film, and method for forming same | JSR CORPORATION (JP) | 2007-01-25 | — | — | US | disclosed |
| US-20070021580-A1 | Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film | JSR CORPORATION (JP) | 2007-01-25 | — | — | US | disclosed |
| EP-1746139-A1 | COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING SAME, SILICA INSULATING FILM AND METHOD FOR FORMING SAME | JSR Corporation (JP) | 2007-01-24 | — | — | EP | disclosed |
| EP-1088868-B1 | Composition for film formation, method of film formation, and insulating film | JSR CORP (JP) | 2007-01-24 | — | — | EP | disclosed |
| EP-1746122-A1 | METHOD FOR FORMING ORGANIC SILICA FILM, ORGANIC SILICA FILM, WIRING STRUCTURE, SEMICONDUCTOR DEVICE, AND COMPOSITION FOR FILM FORMATION | JSR Corporation (JP) | 2007-01-24 | — | — | EP | disclosed |
| EP-1746123-A1 | METHOD FOR FORMING ORGANIC SILICA FILM, ORGANIC SILICA FILM, WIRING STRUCTURE, SEMICONDUCTOR DEVICE, AND COMPOSITION FOR FILM FORMATION | JSR Corporation (JP) | 2007-01-24 | — | — | EP | disclosed |
| US-20070015892-A1 | Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film | JSR CORPORATION (JP) | 2007-01-18 | — | — | US | disclosed |
| EP-1298176-B1 | Stacked film insulating film and substrate for semiconductor | JSR CORP (JP) | 2007-01-03 | — | — | EP | disclosed |
| EP-1295924-B1 | Stacked film, method for the formation of stacked film, insulating film, and substrate for semiconductor | JSR CORP (JP) | 2006-12-13 | — | — | EP | disclosed |
| US-20060275614-A1 | Insulating film and method for forming the same, and film-forming composition | JSR CORPORATION (JP) | 2006-12-07 | — | — | US | disclosed |
| EP-1719793-A1 | POLYMER AND PROCESS FOR PRODUCING THE SAME, COMPOSITION FOR FORMING INSULATING FILM, AND INSULATING FILM AND METHOD OF FORMING THE SAME | JSR Corporation (JP) | 2006-11-08 | — | — | EP | disclosed |
| US-7132473-B2 | Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2006-11-07 | — | — | US | disclosed |
| EP-1717848-A1 | METHOD FOR PRODUCING SILICON OXIDE FILM | TOAGOSEI CO., LTD. (JP) | 2006-11-02 | — | — | EP | disclosed |
| US-7128976-B2 | Composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2006-10-31 | — | — | US | disclosed |
| EP-1312649-B1 | Stable composition | SHIPLEY CO LLC (US) | 2006-10-25 | — | — | EP | disclosed |
| EP-1253175-B1 | Composition for film formation, method of film formation, and silica-based film | JSR CORP (JP) | 2006-10-11 | — | — | EP | disclosed |
| US-20060216531-A1 | Laminate and method of forming the same, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2006-09-28 | — | — | US | disclosed |
| EP-1705208-A1 | COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING SAME, SILICA INSULATING FILM AND METHOD FOR FORMING SAME | JSR Corporation (JP) | 2006-09-27 | — | — | EP | disclosed |
| EP-1705206-A1 | METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM | JSR Corporation (JP) | 2006-09-27 | — | — | EP | disclosed |
| EP-1705207-A1 | METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM | JSR Corporation (JP) | 2006-09-27 | — | — | EP | disclosed |
| US-20060210812-A1 | Insulating film and method of forming the same | JSR CORPORATION (JP) | 2006-09-21 | — | — | US | disclosed |
| US-20060204742-A1 | Electronic device manufacture | SHIPLEY COMPANY, L.L.C. (US) | 2006-09-14 | — | — | US | disclosed |
| US-7105598-B2 | Composition for providing an abrasion resistant coating on a substrate with a matched refractive index and controlled tintability | SDC TECHNOLOGIES, INC. (US) | 2006-09-12 | — | — | US | disclosed |
| EP-1696478-A1 | INSULATING FILM, METHOD FOR FORMING SAME AND COMPOSITION FOR FORMING FILM | JSR Corporation (JP) | 2006-08-30 | — | — | EP | disclosed |
| US-7097704-B1 | Tintable abrasion resistant coating composition and methods of making and using same | SDC TECHNOLOGIES, INC. (US) | 2006-08-29 | — | — | US | disclosed |
| EP-1122770-B1 | Silica-based insulating film and its manufacture | JSR CORP (JP) | 2006-08-09 | — | — | EP | disclosed |
| EP-1679184-A1 | LAMINATE AND METHOD FOR FORMATION THEREOF, INSULATING FILM, SEMICONDUCTOR DEVICE, AND COMPOSITION FOR FORMING FILM | JSR Corporation (JP) | 2006-07-12 | — | — | EP | disclosed |
| EP-1672427-A1 | RADIATION-CURING COMPOSITION, METHOD FOR STORING SAME, METHOD FOR FORMING CURED FILM, METHOD FOR FORMING PATTERN, METHOD FOR USING PATTERN, ELECTRONIC COMPONENT, AND OPTICAL WAVEGUIDE | Hitachi Chemical Co., Ltd. (JP) | 2006-06-21 | — | — | EP | disclosed |
| EP-1672426-A1 | RADIATION CURABLE COMPOSITION, STORING METHOD THEREOF, FORMING METHOD OF CURED FILM, PATTERNING METHOD, USE OF PATTERN, ELECTRONIC COMPONENTS AND OPTICAL WAVEGUIDE | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2006-06-21 | — | — | EP | disclosed |
| WO-2006044340-A2 | COATING COMPOSITIONS, ARTICLES, AND METHODS OF COATING ARTICLES | SDC COATINGS, INC. (US) | 2006-04-27 | — | — | WO | disclosed |
| EP-1648709-A1 | METHOD FOR MODIFYING THE SURFACE OF SUBSTRATE | 3M Innovative Properties Company (US) | 2006-04-26 | — | — | EP | disclosed |
| US-7026053-B2 | Process for producing silica-based film, silica-based film, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2006-04-11 | — | — | US | disclosed |
| US-20060073423-A1 | Electronic device manufacture | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2006-04-06 | — | — | US | disclosed |
| US-20060069171-A1 | Composition and method | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2006-03-30 | — | — | US | disclosed |
| US-7018678-B2 | Electronic device manufacture | SHIPLEY COMPANY, L.L.C. (US) | 2006-03-28 | — | — | US | disclosed |
| US-7014918-B2 | Composition for providing an abrasion resistant coating on a substrate with a matched refractive index and controlled tintability | SDC TECHNOLOGIES, INC. (US) | 2006-03-21 | — | — | US | disclosed |
| EP-1045290-B1 | Composition for resist underlayer film and method for producing the same | JSR CORP (JP) | 2006-03-15 | — | — | EP | disclosed |
| US-7011868-B2 | Fluorine-free plasma curing process for porous low-k materials | AXCELIS TECHNOLOGIES, INC. (US) | 2006-03-14 | — | — | US | disclosed |
| EP-1632956-A1 | Compositions comprising an organic polysilica and an arylgroup-capped polyol, and methods for preparing porous organic polysilica films | Rohm and Haas Electronic Materials, L.L.C. (US) | 2006-03-08 | — | — | EP | disclosed |
| EP-1146092-B1 | Composition for film formation, method of film formation, and silica-based film | JSR CORP (JP) | 2006-03-08 | — | — | EP | disclosed |
| EP-1627021-A1 | METHOD FOR APPLYING ADHESIVE TO A SUBSTRATE | 3M Innovative Properties Company (US) | 2006-02-22 | — | — | EP | disclosed |
| US-7001642-B2 | Composition for providing an abrasion resistant coating on a substrate with a matched refractive index and controlled tintability | SDC TECHNOLOGIES, INC. (US) | 2006-02-21 | — | — | US | disclosed |
| US-20060024980-A1 | Silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device | JSR CORPORATION (JP) | 2006-02-02 | — | — | US | disclosed |
| US-20060023044-A1 | Fixing fluid and inkjet ink sets comprising same | E. I. DU PONT DE NEMOURS AND COMPANY | 2006-02-02 | — | — | US | disclosed |
| EP-1619226-A1 | Silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device | JSR Corporation (JP) | 2006-01-25 | — | — | EP | disclosed |
| US-20060006541-A1 | Organic silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device | JSR CORPORATION (JP) | 2006-01-12 | — | — | US | disclosed |
| EP-1615260-A2 | Organic silicon-oxide-based film, composition and method for forming the same, and semiconductor device | JSR Corporation (JP) | 2006-01-11 | — | — | EP | disclosed |
| US-20050266344-A1 | Radiation curable composition, storing method thereof, forming method of cured film, patterning method, use of pattern, electronic components and optical waveguide | HITACHI CHEMICAL CO., LTD. (JP) | 2005-12-01 | — | — | US | disclosed |
| US-6969166-B2 | Method for modifying the surface of a substrate | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2005-11-29 | — | — | US | disclosed |
| US-6967222-B2 | Porous optical materials | SHIPLEY COMPANY, L.L.C. (US) | 2005-11-22 | — | — | US | disclosed |
| EP-1593149-A1 | FLUORINE-FREE PLASMA CURING PROCESS FOR POROUS LOW-K-MATERIALS | Axcelis Technologies, Inc. (US) | 2005-11-09 | — | — | EP | disclosed |
| US-20050239953-A1 | Radiation curable composition, storing method thereof, forming method of cured film, patterning method, use of pattern, electronic components and optical waveguide | HITACHI CHEMICAL CO., LTD. (JP) | 2005-10-27 | — | — | US | disclosed |
| EP-1568744-A1 | COMPOSITION FOR POROUS FILM FORMATION, POROUS FILM, PROCESS FOR PRODUCING THE SAME, INTERLAYER INSULATION FILM AND SEMICONDUCTOR DEVICE | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2005-08-31 | — | — | EP | disclosed |
| EP-1117102-B1 | Method of manufacturing material for forming insulating film | JSR CORP (JP) | 2005-08-10 | — | — | EP | disclosed |
| EP-1058274-B1 | Composition for film formation and material for insulating film formation | JSR CORP (JP) | 2005-07-27 | — | — | EP | disclosed |
| US-6902771-B2 | Process for producing silica-based film, silica-based film, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2005-06-07 | — | — | US | disclosed |
| EP-1535976-A1 | Composition for film formation, method for preparing the composition, and method for forming insulating film | JSR Corporation (JP) | 2005-06-01 | — | — | EP | disclosed |
| US-20050112386-A1 | Composition for film formation, method for preparing the composition, and method for forming insulating film | JSR CORPORATION (JP) | 2005-05-26 | — | — | US | disclosed |
| US-20050113472-A1 | Porous materials | ROHM AND HAAS ELECTRONIC MATERIALS, L.L.C. (US) | 2005-05-26 | — | — | US | disclosed |
| US-6890605-B2 | Method of film formation, insulating film, and substrate for semiconductor | JSR CORPORATION (JP) | 2005-05-10 | — | — | US | disclosed |
| US-20050096415-A1 | Film forming composition, process for producing film forming composition, insulating film forming material, process for forming film, and silica-based film | JSR CORPORATION (JP) | 2005-05-05 | — | — | US | disclosed |
| EP-1520891-A1 | Film forming composition, process for producing film forming composition, insulating film forming material, process for forming film, and silica-based film | JSR Corporation (JP) | 2005-04-06 | — | — | EP | disclosed |
| EP-1146014-B1 | Mesoporous silica films with mobile ion gettering and accelerated processing | APPLIED MATERIALS INC (US) | 2005-03-30 | — | — | EP | disclosed |
| US-20050042464-A1 | Process for producing silica-based film, silica-based film, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2005-02-24 | — | — | US | disclosed |
| US-6852367-B2 | A curable B-staged organo polysilsesquioxanes free of the alcohol of reaction and stabilized by an organic acid for longer shelf life; forming a dielectric film by curing and removing an included pore-forming material | SHIPLEY COMPANY, L.L.C. (US) | 2005-02-08 | — | — | US | disclosed |
| WO-2004106077-A1 | METHOD FOR MODIFYING THE SURFACE OF SUBSTRATE | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2004-12-09 | — | — | WO | disclosed |
| WO-2004106448-A1 | METHOD FOR APPLYING ADHESIVE TO A SUBSTRATE | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2004-12-09 | — | — | WO | disclosed |
| US-20040241451-A1 | Method for modifying the surface of a substrate | 3M INNOVATIVE PROPERTIES COMPANY | 2004-12-02 | — | — | US | disclosed |
| US-20040241323-A1 | Confining a liquid adhesive to a region of a substrate surface by first forming a fixed coating on a substrate with a boundary enclosing a region of the substrate surface and an average receding contact angle with water at least 30 degrees higher than the average receding contact angle of the enclosure | 3M INNOVATIVE PROPERTIES COMPANY | 2004-12-02 | — | — | US | disclosed |
| US-6824833-B2 | STACKED DIELECTRIC | JSR CORPORATION (JP) | 2004-11-30 | — | — | US | disclosed |
| US-20040219372-A1 | Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. | 2004-11-04 | — | — | US | disclosed |
| US-20040202956-A1 | a photocurable mixture of a hydrolyzable metal (silyl) compound and a reaction, polymerization or crosslinking promoter; curing; adhesives, seals, semiconductors, dielectrics, microlenses, optical fibers, color filters, gas permeable films | SEKISUI CHEMICAL CO., LTD. (JP) | 2004-10-14 | — | — | US | disclosed |
| US-6800330-B2 | PRODUCT OBTAINED BY HYDROLYZING AND CONDENSING AT LEAST ONE SILANE COMPOUND, A COMPOUND COMPATIBLE WITH OR DISPERSIBLE IN THAT COMPOUND AND HAVING A BOILING POINT OR DECOMPOSITION TEMPERATURE OF 250-450 DEGREES C, SOLVENT | JSR CORPORATION (JP) | 2004-10-05 | — | — | US | disclosed |
| US-6787191-B2 | Coating composition for the production of insulating thin films | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2004-09-07 | — | — | US | disclosed |
| US-6787193-B2 | DECOMPOSITION OF AN ORGANOSILICON COMPOUND | JSR CORPORATION (JP) | 2004-09-07 | — | — | US | disclosed |
| WO-2004066374-A1 | FLUORINE-FREE PLASMA CURING PROCESS FOR POROUS LOW-K-MATERIALS | AXCELIS TECHNOLOGIES, INC. (US) | 2004-08-05 | — | — | WO | disclosed |
| EP-1137721-B1 | COMPOSITION FOR PROVIDING AN ABRASION RESISTANT COATING ON A SUBSTRATE HAVING IMPROVED ADHESION AND IMPROVED RESISTANCE TO CRACK FORMATION | SDC COATINGS INC (US) | 2004-08-04 | — | — | EP | disclosed |
| US-20040130032-A1 | Electronic device manufacture | SHIPLEY COMPANY, L.L.C. | 2004-07-08 | — | — | US | disclosed |
| US-6749944-B2 | VAPOR DEPOSITION, OSCILLATION, HEATING USING ORGANOSILICON COMPOUND; FORMING DIELECTRIC | JSR CORPORATION (JP) | 2004-06-15 | — | — | US | disclosed |
| US-20040097647-A1 | Composition for providing an abrasion resistant coating on a substrate with a matched refractive index and controlled tintability | SDC TECHNOLOGIES, INC. | 2004-05-20 | — | — | US | disclosed |
| US-20040097646-A1 | Composition for providing an abrasion resistant coating on a substrate with a matched refractive index and controlled tintability | SDC TECHNOLOGIES, INC. | 2004-05-20 | — | — | US | disclosed |
| EP-1238024-B1 | CURABLE INKJET PRINTABLE INK COMPOSITIONS | 3M INNOVATIVE PROPERTIES CO (US) | 2004-04-28 | — | — | EP | disclosed |
| US-20040077757-A1 | Coating composition for use in producing an insulating thin film | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2004-04-22 | — | — | US | disclosed |
| US-6719422-B2 | Curable inkjet printable ink compositions | 3M INNOVATIVE PROPERTIES COMPANY | 2004-04-13 | — | — | US | disclosed |
| EP-1403925-A2 | Dielectric material for electronic devices | Shipley Co. L.L.C. (US) | 2004-03-31 | — | — | EP | disclosed |
| US-20040052948-A1 | Electronic device manufacture | SHIPLEY COMPANY, L.L.C. | 2004-03-18 | — | — | US | disclosed |
| EP-1391476-A1 | PHOTOREACTIVE COMPOSITION | SEKISUI CHEMICAL CO., LTD. (JP) | 2004-02-25 | — | — | EP | disclosed |
| US-20040033700-A1 | Electronic device manufacture | SHIPLEY COMPANY, L.L.C. (US) | 2004-02-19 | — | — | US | disclosed |
| US-20040028916-A1 | Fluorine-free plasma curing process for porous low-k materials | AXCELIS TECHNOLOGIES, INC. | 2004-02-12 | — | — | US | disclosed |
| EP-1369908-A2 | Methods for depositing pinhole-defect free organic polysilica coatings | Shipley Company LLC (US) | 2003-12-10 | — | — | EP | disclosed |
| US-20030224544-A1 | Test method | SHIPLEY COMPANY, L.L.C. | 2003-12-04 | — | — | US | disclosed |
| US-6645881-B2 | Method of forming coating film, method of manufacturing semiconductor device and coating solution | KABUSHIKI KAISHA TOSHIBA (JP) | 2003-11-11 | — | — | US | disclosed |
| US-6642352-B2 | Providing a silicon inorganic polymer compound or polyarylenes or polyphenylene ether organic polymer compound, treating the polymeric compound with a zeta-potential producing filter material, and producing curable polymer compound | JSR CORPORATION (JP) | 2003-11-04 | — | — | US | disclosed |
| US-20030157340-A1 | Process for producing silica-based film, silica-based film, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2003-08-21 | — | — | US | disclosed |
| US-20030139063-A1 | Method of forming coating film, method of manufacturing semiconductor device and coating solution | TOSHIBA MEMORY CORPORATION (JP) | 2003-07-24 | — | — | US | disclosed |
| US-6582804-B2 | A compound having 2 reactive silyl groups, a compound having >/= 3 reactive silyl groups, acid generating catalyst, and pigment or pigment chip printed thereon | 3M INNOVATIVE PROPERTIES COMPANY | 2003-06-24 | — | — | US | disclosed |
| US-6576393-B1 | Hydrolysate and/or a condensate of a siloxane compound; compound generating an acid by ultraviolet irradiation and/or heating; adhesion, resistance to a developing solution, decrease in film loss in oxygen ashing of the resist | JSR CORPORATION (JP) | 2003-06-10 | — | — | US | disclosed |
| US-20030104225-A1 | Process for producing silica-based film, silica-based film, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2003-06-05 | — | — | US | disclosed |
| US-20030099844-A1 | Coating composition for the production of insulating thin films | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2003-05-29 | — | — | US | disclosed |
| US-20030100644-A1 | Stable composition | SHIPLEY COMPANY, L.L.C. (US) | 2003-05-29 | — | — | US | disclosed |
| EP-1312649-A2 | Stable composition | Shipley Co. L.L.C. (US) | 2003-05-21 | — | — | EP | disclosed |
| US-20030091838-A1 | Composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2003-05-15 | — | — | US | disclosed |
| US-6558747-B2 | Dissolving methylpolysiloxane in solvent; applying solution to semiconductor substrate to form coating film; heat-treating to form organosilicon oxide film | KABUSHIKI KAISHA TOSHIBA (JP) | 2003-05-06 | — | — | US | disclosed |
| US-6559070-B1 | Mesoporous silica films with mobile ion gettering and accelerated processing | APPLIED MATERIALS, INC. | 2003-05-06 | — | — | US | disclosed |
| US-20030077461-A1 | Stacked film, insulating film and substrate for semiconductor | JSR CORPORATION (JP) | 2003-04-24 | — | — | US | disclosed |
| EP-1298176-A2 | Stacked film insulating film and substrate for semiconductor | JSR Corporation (JP) | 2003-04-02 | — | — | EP | disclosed |
| US-20030059550-A1 | Method of film formation, insulating film, and substrate for semiconductor | JSR CORPORATION (JP) | 2003-03-27 | — | — | US | disclosed |
| US-20030059628-A1 | Stacked film, method for the formation of stacked film, insulating film, and substrate for semiconductor | JSR CORPORATION (JP) | 2003-03-27 | — | — | US | disclosed |
| EP-1296365-A2 | Method of film formation, insulating film, and substrate for semiconductor | JSR Corporation (JP) | 2003-03-26 | — | — | EP | disclosed |
| EP-1295924-A2 | Stacked film, method for the formation of stacked film, insulating film, and substrate for semiconductor | JSR Corporation (JP) | 2003-03-26 | — | — | EP | disclosed |
| US-20030031843-A1 | Curable inkjet printable ink compositions | 3M INNOVATIVE PROPERTIES COMPANY | 2003-02-13 | — | — | US | disclosed |
| US-20030007050-A1 | Curable inkjet printable ink compositions | 3M INNOVATIVE PROPERTIES COMPANY | 2003-01-09 | — | — | US | disclosed |
| US-20030008155-A1 | Method for the formation of silica film, silica film, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2003-01-09 | — | — | US | disclosed |
| US-20030008244-A1 | Porous optical materials | SHIPLEY COMPANY, L.L.C. (US) | 2003-01-09 | — | — | US | disclosed |
| US-6503633-B2 | Semiconductors | JSR CORPORATION (JP) | 2003-01-07 | — | — | US | disclosed |
| US-20020189495-A1 | Composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2002-12-19 | — | — | US | disclosed |
| EP-1267395-A2 | Method for the formation of silica film, silica film, insulating film, and semiconductor device | JSR Corporation (JP) | 2002-12-18 | — | — | EP | disclosed |
| US-6495264-B2 | HYDROLYSIS AND CONDENSATION OF SILANE COMPOUND IN PRESENCE OF WATER AND TETRAALKYLAMMONIUM HYDROXIDES, ALICYCLIC AMINES, AND METAL HYDROXIDES IN SOLVENT FOR FORMING DIELECTRIC LAYER FOR SEMICONDUCTORS | JSR CORPORATION (JP) | 2002-12-17 | — | — | US | disclosed |
| EP-1265080-A2 | Porous optical materials | Shipley Company LLC (US) | 2002-12-11 | — | — | EP | disclosed |
| EP-1253175-A2 | Composition for film formation, method of film formation, and silica-based film | JSR Corporation (JP) | 2002-10-30 | — | — | EP | disclosed |
| US-6472079-B2 | PRODUCT OF HYDROLYSIS AND CONDENSATION OF AN ORGANOSILICON COMPOUND; 1A OR 2A COMPOUND, ESPECIALLY CARBOXYLIC SALT; SOLVENT; EXCELLENT CRACKING RESISTANCE AFTER A PCT (PRESSURE COOKER TEST). | JSR CORPORATION (JP) | 2002-10-29 | — | — | US | disclosed |
| US-6461419-B1 | Curable inkjet printable ink compositions | 3M INNOVATIVE PROPERTIES COMPANY | 2002-10-08 | — | — | US | disclosed |
| US-20020142586-A1 | Method of forming dual damascene structure | JSR CORPORATION (JP) | 2002-10-03 | — | — | US | disclosed |
| EP-1246239-A1 | Method of forming dual damascene structure | JSR Corporation (JP) | 2002-10-02 | — | — | EP | disclosed |
| EP-1238024-A1 | CURABLE INKJET PRINTABLE INK COMPOSITIONS | 3M Innovative Properties Company (US) | 2002-09-11 | — | — | EP | disclosed |
| US-20020086167-A1 | Composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2002-07-04 | — | — | US | disclosed |
| US-20020086169-A1 | Method of forming insulating film and process for producing semiconductor device | KABUSHIKI KAISHA TOSHIBA (JP) | 2002-07-04 | — | — | US | disclosed |
| US-6413647-B1 | USEFUL AS INTERLAYER DIELECTRIC FILM IN SEMICONDUCTOR DEVICES; MECHANICAL STRENGTH | JSR CORPORATION (JP) | 2002-07-02 | — | — | US | disclosed |
| US-6410151-B1 | Composition for film formation, method of film formation, and insulating film | JSR CORPORATION (JP) | 2002-06-25 | — | — | US | disclosed |
| US-6410150-B1 | Composition for film formation, method of film formation, and insulating film | JSR CORPORATION (JP) | 2002-06-25 | — | — | US | disclosed |
| US-6376634-B1 | ORGANOSILICON POLYMERS | JSR CORPORATION (JP) | 2002-04-23 | — | — | US | disclosed |
| US-20020045693-A1 | Composition for film formation, method of film formation and silica-based film | JSR CORPORATION (JP) | 2002-04-18 | — | — | US | disclosed |
| US-20020020327-A1 | Composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2002-02-21 | — | — | US | disclosed |
| US-6348269-B1 | TRANSPARENT COATINGS UPON CURING; HYDROLYSIS PRODUCTS AND PARTIAL CONDENSATES OF AN EPOXY FUNCTIONAL SILANE AND A DISILANE AND A CARBOXYLIC ACID COMPONENT | SDC COATINGS, INC. | 2002-02-19 | — | — | US | disclosed |
| EP-1175466-A1 | COMPOSITION FOR PROVIDING AN ABRASION-RESISTANT COATING | SDC COATINGS, INC. (US) | 2002-01-30 | — | — | EP | disclosed |
| US-6342097-B1 | Composition for providing an abrasion resistant coating on a substrate with a matched refractive index and controlled tintability | SDC COATINGS, INC. | 2002-01-29 | — | — | US | disclosed |
| US-20010056157-A1 | Composition for providing an abrasion resistant coating on a substrate with a matched refractive index and controlled tintability | SDC TECHNOLOGIES, INC. | 2001-12-27 | — | — | US | disclosed |
| US-20010055892-A1 | Composition for film formation, process for producing composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2001-12-27 | — | — | US | disclosed |
| EP-1160848-A2 | Composition for silica-based film formation | JSR Corporation (JP) | 2001-12-05 | — | — | EP | disclosed |
| EP-1148105-A2 | Composition for film formation, method of film formation, and silica-based film | JSR Corporation (JP) | 2001-10-24 | — | — | EP | disclosed |
| EP-1146092-A2 | Composition for film formation, method of film formation, and silica-based film | JSR Corporation (JP) | 2001-10-17 | — | — | EP | disclosed |
| EP-1146014-A2 | Mesoporous silica films with mobile ion gettering and accelerated processing | Applied Materials, Inc. (US) | 2001-10-17 | — | — | EP | disclosed |
| EP-1137721-A1 | COMPOSITION FOR PROVIDING AN ABRASION RESISTANT COATING ON A SUBSTRATE HAVING IMPROVED ADHESION AND IMPROVED RESISTANCE TO CRACK FORMATION | SDC COATINGS, INC. (US) | 2001-10-04 | — | — | EP | disclosed |
| US-20010018129-A1 | Process for producing silica-based film, silica-based film, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2001-08-30 | — | — | US | disclosed |
| EP-1127929-A2 | Composition for film formation, method of film formation, and silica-based film | JSR Corporation (JP) | 2001-08-29 | — | — | EP | disclosed |
| EP-1122770-A2 | Silica-based insulating film and its manufacture | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |
| US-20010009936-A1 | Method of manufacturing material for forming insulating film | JSR CORPORATION (JP) | 2001-07-26 | — | — | US | disclosed |
| EP-1117102-A2 | Method of manufacturing material for forming insulating film | JSR Corporation (JP) | 2001-07-18 | — | — | EP | disclosed |
| WO-2001032789-A1 | CURABLE INKJET PRINTABLE INK COMPOSITIONS | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2001-05-10 | — | — | WO | disclosed |
| EP-1090967-A2 | Composition for film formation, method of film formation, and insulating film | JSR Corporation (JP) | 2001-04-11 | — | — | EP | disclosed |
| EP-1088868-A2 | Composition for film formation, method of film formation, and insulating film | JSR Corporation (JP) | 2001-04-04 | — | — | EP | disclosed |
| EP-1058274-A1 | Composition for film formation and material for insulating film formation | JSR Corporation (JP) | 2000-12-06 | — | — | EP | disclosed |
| WO-2000064992-A1 | COMPOSITION FOR PROVIDING AN ABRASION-RESISTANT COATING | SDC COATINGS, INC. (US) | 2000-11-02 | — | — | WO | disclosed |
| EP-1045290-A2 | Composition for resist underlayer film and method for producing the same | JSR Corporation (JP) | 2000-10-18 | — | — | EP | disclosed |
| WO-2000024831-A1 | COMPOSITION FOR PROVIDING AN ABRASION RESISTANT COATING ON A SUBSTRATE HAVING IMPROVED ADHESION AND IMPROVED RESISTANCE TO CRACK FORMATION | SDC COATINGS, INC. (US) | 2000-05-04 | — | — | WO | disclosed |
| US-5250646-A | Reacting disilane with organometallic compound | WACKER-CHEMIE GMBH (DE) | 1993-10-05 | — | — | US | disclosed |
| US-5166287-A | Reaction of a disilane to form polysiloxanes | WACKER-CHEMIE GMBH (DE) | 1992-11-24 | — | — | US | disclosed |
| EP-0486946-A2 | Process for the production of metallopolysilanes and their use | Wacker-Chemie GmbH (DE) | 1992-05-27 | — | — | EP | disclosed |
| EP-0463624-A2 | Process for preparing organopolysilanes | WACKER-CHEMIE GMBH (DE) | 1992-01-02 | — | — | EP | disclosed |
| US-4759959-A | Reusable paint masking member | MOLD-EX RUBBER COMPANY, INC. (US) | 1988-07-26 | — | — | US | disclosed |
| US-4515901-A | MIXING WITH PILLARING AGENT, DRYING, ROASTING | TEXACO INC. (US) | 1985-05-07 | — | — | US | disclosed |
| US-4395562-A | FROM ALKYL ALLENE AND A DISILANE IN PRESENCE OF PHOSPHINE COMPLEX OF A TRANSITION METAL | CHISSO CORPORATION (JP) | 1983-07-26 | — | — | US | disclosed |
| US-4137391-A | Continuous solution polymerization of a conjugated diene with a monovinylaromatic compound using alkoxysilicon treating agents in the first reactor means of a reactor series | PHILLIPS PETROLEUM COMPANY (US) | 1979-01-30 | — | — | US | disclosed |
| US-4137391-A | Continuous solution polymerization of a conjugated diene with a monovinylaromatic compound using alkoxysilicon treating agents in the first reactor means of a reactor series | PHILLIPS PETROLEUM COMPANY (US) | 1979-01-30 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (7 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20210323983-A1 | STABLE SILYLATING REAGENTS | KCNH3, KCNH2, KCNH1 | CA1 69/4885CA2 168/4885 |
| US-12575404-B2 | Semiconductor device with protection layer and method for fabricating the same | DSG1, RAD51, SOS1 | CA1 2334/4885CA2 3616/4885 |
| US-11028107-B2 | Stable silylating reagents | OGDH, CD44, SOD1 | CA1 36/4885CA2 112/4885 |
| US-20110042789-A1 | MATERIAL FOR CHEMICAL VAPOR DEPOSITION, SILICON-CONTAINING INSULATING FILM AND METHOD FOR PRODUCTION OF THE SILICON-CONTAINING INSULATING FILM | SAT1, SUV39H2, SUV39H1 | CA1 217/4885CA2 1983/4885 |
| US-20170240571-A1 | STABLE SILYLATING REAGENTS | OGDH, CD44, SOD1 | CA1 36/4885CA2 112/4885 |
| US-20260040913-A1 | SEMICONDUCTOR DEVICE WITH ISOLATION STRUCTURE AND METHOD FOR FABRICATING THE SAME | TES, LSM8, TESK2 | CA1 3059/4885CA2 4399/4885 |
| US-20260040912-A1 | SEMICONDUCTOR DEVICE WITH ISOLATION STRUCTURE AND METHOD FOR FABRICATING THE SAME | DSTN, TES, CD2 | CA1 3490/4885CA2 4295/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.