SCHEMBL4614060

SCHEMBL4614060

O=C(O)CC/C=C/C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
THRB P10828 1/20 0.39
MAPT P10636 2/20 0.37
FFAR1 O14842 1/20 0.37
ALDH1A1 P00352 1/20 0.37
CYP19A1 P11511 1/20 0.37
RXRA P19793 1/20 0.37
PPARG P37231 1/20 0.37
OXER1 Q8TDS5 1/20 0.37
GMNN O75496 1/20 0.34
USP2 O75604 1/20 0.34
CYP1A2 P05177 1/20 0.34
POLB P06746 1/20 0.34
CYP3A4 P08684 1/20 0.34
CYP2D6 P10635 1/20 0.34
CYP2C9 P11712 1/20 0.34
APEX1 P27695 1/20 0.34
CYP2C19 P33261 1/20 0.34
RECQL P46063 1/20 0.34
BLM P54132 1/20 0.34
HSD17B10 Q99714 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4614062 1.00 THRB (0.39) THRBMAPTFFAR1ALDH1A1CYP19A1
SCHEMBL13526065 0.89 BLM (0.46) MAPTALDH1A1CYP19A1RXRAPPARG
SCHEMBL6202237 0.77 MAPT (0.43) MAPTFFAR1ALDH1A1CYP19A1RXRA
SCHEMBL8597777 0.75 FAAH (0.39) MAPTALDH1A1CYP19A1PPARGGMNN
SCHEMBL27582658 0.74 THRB (0.37) THRB
SCHEMBL5704685 0.73 THRB (0.31) THRB
SCHEMBL1684938 0.73 THRB (0.31) THRB
SCHEMBL8616829 0.73 THRB (0.31) THRB
SCHEMBL8830567 0.73 THRB (0.46) THRBALDH1A1
SCHEMBL16178793 0.73 THRB (0.46) THRBALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1572856-B1 CLEANING AGENT COMPOSITION, CLEANING AND PRODUCTION METHODS FOR SEMICONDUCTOR WAFER SHOWA DENKO KK (JP) 2008-02-13 EP disclosed
US-20070010411-A1 Cleaning agent composition, cleaning and production methods for semiconductor wafer, and semiconductor wafer SHOWA DENKO K.K. (JP) 2007-01-11 US disclosed
EP-1572856-A1 CLEANING AGENT COMPOSITION, CLEANING AND PRODUCTION METHODS FOR SEMICONDUCTOR WAFER, AND SEMICONDUCTOR WAFER Showa Denko K.K. (JP) 2005-09-14 EP disclosed
WO-2004053045-A1 CLEANING AGENT COMPOSITION, CLEANING AND PRODUCTION METHODS FOR SEMICONDUCTOR WAFER, AND SEMICONDUCTOR WAFER SHOWA DENKO K.K. (JP) 2004-06-24 WO disclosed
US-20020155964-A1 Cleaning agent composition, method for cleaning and use thereof SHOWA DENKO K.K. 2002-10-24 US disclosed
US-6417147-B2 COMPRISING FLUORINE-CONTAINING ANIONIC SURFACTANT, QUATERNARY AMMONIUM HYDROXIDE AND/OR AN ALKANOLAMINE; MANUFACTURE OF SEMICONDUCTOR WAFERS OR PRECISION INSTRUMENTS SHOWA DENKO K.K. (JP) 2002-07-09 US disclosed
US-20010025017-A1 Cleaning agent composition, method for cleaning and use thereof SHOWA DENKO K.K. (JP) 2001-09-27 US disclosed