Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 10/20 | 0.61 |
| ▸ | KMT2A | Q03164 | 10/20 | 0.61 |
| ▸ | ALDH1A1 | P00352 | 9/20 | 0.61 |
| ▸ | MAPT | P10636 | 9/20 | 0.61 |
| ▸ | HPGD | P15428 | 7/20 | 0.61 |
| ▸ | MEN1 | O00255 | 7/20 | 0.61 |
| ▸ | HTT | P42858 | 3/20 | 0.61 |
| ▸ | LMNA | P02545 | 2/20 | 0.54 |
| ▸ | THRB | P10828 | 1/20 | 0.54 |
| ▸ | F2 | P00734 | 4/20 | 0.45 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.45 |
| ▸ | XBP1 | P17861 | 2/20 | 0.43 |
| ▸ | VDR | P11473 | 3/20 | 0.42 |
| ▸ | POLB | P06746 | 1/20 | 0.41 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.40 |
| ▸ | HTR1A | P08908 | 1/20 | 0.40 |
| ▸ | DRD2 | P14416 | 1/20 | 0.40 |
| ▸ | HTR2A | P28223 | 1/20 | 0.40 |
| ▸ | HTR7 | P34969 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL450075 | 0.89 | KDM4E (0.55) | KDM4EKMT2AALDH1A1MAPTHPGD | |
| SCHEMBL29369802 | 0.89 | KDM4E (0.55) | KDM4EKMT2AALDH1A1MAPTHPGD | |
| SCHEMBL28770528 | 0.83 | KDM4E (0.66) | KDM4EKMT2AALDH1A1MAPTHPGD | |
| SCHEMBL548395 | 0.81 | KDM4E (0.68) | KDM4EKMT2AALDH1A1MAPTHPGD | |
| SCHEMBL461884 | 0.81 | KMT2A (0.40) | KDM4EKMT2AALDH1A1MAPTHPGD | |
| SCHEMBL28618961 | 0.80 | KDM4E (0.66) | KDM4EKMT2AALDH1A1MAPTHPGD | |
| SCHEMBL27090597 | 0.78 | KDM4E (0.70) | KDM4EKMT2AALDH1A1MAPTHPGD | |
| SCHEMBL547931 | 0.78 | KDM4E (0.71) | KDM4EKMT2AALDH1A1MAPTHPGD | |
| SCHEMBL3827591 | 0.78 | KMT2A (0.47) | KDM4EKMT2AALDH1A1MAPTHPGD | |
| SCHEMBL382760 | 0.77 | KMT2A (0.47) | KDM4EKMT2AALDH1A1MAPTHPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 463 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108267933-B | Radiation-sensitive composition and patterning and metallization process | 罗门哈斯电子材料有限责任公司 | 2021-12-03 | — | — | CN | claimed |
| US-10962880-B2 | Radiation-sensitive compositions and patterning and metallization processes | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2021-03-30 | — | — | US | claimed |
| US-20200201175-A1 | RADIATION-SENSITIVE COMPOSITIONS AND PATTERNING AND METALLIZATION PROCESSES | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2020-06-25 | — | — | US | claimed |
| US-20180188648-A1 | RADIATION-SENSITIVE COMPOSITIONS AND PATTERNING AND METALLIZATION PROCESSES | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2018-07-05 | — | — | US | claimed |
| EP-3343293-A1 | RADIATION-SENSITIVE COMPOSITIONS AND PATTERNING AND METALLIZATION PROCESSES | Rohm and Haas Electronic Materials LLC (US) | 2018-07-04 | — | — | EP | claimed |
| US-5994022-A | BECOMES SOLUBLE IN ALKALI DEVELOPING SOLUTION BY ACTION OF AN ACID | JSR CORPORATION (JP) | 1999-11-30 | — | — | US | claimed |
| EP-4375750-A1 | FILM-FORMING MATERIAL FOR SEMICONDUCTOR, MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, PROCESS MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, UNDERLAYER FILM-FORMING MATERIAL, UNDERLAYER FILM, AND SEMICONDUCTOR DEVICE | ADEKA CORPORATION (JP) | 2024-05-29 | — | — | EP | disclosed |
| EP-3010943-B1 | CURABLE COMPOSITION, FILM, AND METHOD OF PRODUCING FILM | CANON KK (JP) | 2024-04-03 | — | — | EP | disclosed |
| US-11940730-B2 | Photoresist compositions and pattern formation methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2024-03-26 | — | — | US | disclosed |
| CN-117616337-A | Film forming material for semiconductor, member forming material for semiconductor, process member forming material for semiconductor, underlayer film forming material, underlayer film, and semiconductor device | 株式会社艾迪科 | 2024-02-27 | — | — | CN | disclosed |
| US-11880135-B2 | Photoresist compositions and pattern formation methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2024-01-23 | — | — | US | disclosed |
| US-20230420401-A1 | METALLIZATION METHOD | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2023-12-28 | — | — | US | disclosed |
| US-11852970-B2 | Material for lithography, production method therefor, composition for lithography, pattern formation method, compound, resin, and method for purifying the compound or the resin | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-12-26 | — | — | US | disclosed |
| EP-0898201-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 1999-02-24 | — | — | EP | disclosed |
| EP-0843220-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1998-05-20 | — | — | EP | disclosed |
| US-5679495-A | TERPOLYMER PHOTORESIST CONTAINING VINYLPHENOL DERIVATIVE, TERT-BUTYL (METH)ACRYLATE, AND A UNIT TO REDUCE ALKALINE SOLUBILITY; DRY ETCH RESISTANCE | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-10-21 | — | — | US | disclosed |
| EP-0793144-A2 | Radiation sensitive composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-09-03 | — | — | EP | disclosed |
| EP-0660187-B1 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1997-03-05 | — | — | EP | disclosed |
| US-5556734-A | RESISTS | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1996-09-17 | — | — | US | disclosed |
| EP-0660187-A1 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1995-06-28 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11852970-B2 | Material for lithography, production method therefor, composition for lithography, pattern formation method, compound, resin, and method for purifying the compound or the resin | SLC39A11, CROCC, TERB1 | KDM4E 3079/4885KMT2A 2526/4885ALDH1A1 3830/4885 |
| US-11880135-B2 | Photoresist compositions and pattern formation methods | PARG, SUN2, ALAD | KDM4E 1489/4885KMT2A 1305/4885ALDH1A1 2212/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.