Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 9/20 | 0.78 |
| ▸ | KDM4E | B2RXH2 | 8/20 | 0.78 |
| ▸ | HPGD | P15428 | 8/20 | 0.78 |
| ▸ | MAPT | P10636 | 5/20 | 0.78 |
| ▸ | KMT2A | Q03164 | 5/20 | 0.78 |
| ▸ | MEN1 | O00255 | 3/20 | 0.78 |
| ▸ | HTT | P42858 | 1/20 | 0.78 |
| ▸ | LMNA | P02545 | 4/20 | 0.77 |
| ▸ | THRB | P10828 | 1/20 | 0.77 |
| ▸ | VDR | P11473 | 2/20 | 0.57 |
| ▸ | F2 | P00734 | 1/20 | 0.52 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.51 |
| ▸ | POLB | P06746 | 1/20 | 0.51 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.50 |
| ▸ | CLTC | Q00610 | 1/20 | 0.47 |
| ▸ | CA12 | O43570 | 3/20 | 0.47 |
| ▸ | CA1 | P00915 | 3/20 | 0.47 |
| ▸ | CA2 | P00918 | 3/20 | 0.47 |
| ▸ | CA9 | Q16790 | 3/20 | 0.47 |
| ▸ | UBE2N | P61088 | 1/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31218469 | 0.88 | ALDH1A1 (1.00) | ALDH1A1KDM4EHPGDMAPTKMT2A | |
| SCHEMBL1088835 | 0.88 | ALDH1A1 (1.00) | ALDH1A1KDM4EHPGDMAPTKMT2A | |
| SCHEMBL462047 | 0.87 | ALDH1A1 (1.00) | ALDH1A1KDM4EHPGDMAPTKMT2A | |
| SCHEMBL7572742 | 0.87 | ALDH1A1 (1.00) | ALDH1A1KDM4EHPGDMAPTKMT2A | |
| SCHEMBL547931 | 0.86 | KDM4E (0.71) | ALDH1A1KDM4EHPGDMAPTKMT2A | |
| SCHEMBL2468373 | 0.86 | KMT2A (1.00) | ALDH1A1KDM4EHPGDMAPTKMT2A | |
| SCHEMBL27842380 | 0.85 | KDM4E (0.72) | ALDH1A1KDM4EHPGDMAPTKMT2A | |
| SCHEMBL10409879 | 0.83 | KDM4E (0.75) | ALDH1A1KDM4EHPGDMAPTKMT2A | |
| SCHEMBL22697999 | 0.83 | ALDH1A1 (0.71) | ALDH1A1KDM4EHPGDMAPTKMT2A | |
| SCHEMBL13721000 | 0.83 | ALDH1A1 (0.71) | ALDH1A1KDM4EHPGDMAPTKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 181 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240219832-A1 | PHOTOSENSITIVE COMPOSITION | JSR CORPORATION (JP) | 2024-07-04 | — | — | US | disclosed |
| EP-3010943-B1 | CURABLE COMPOSITION, FILM, AND METHOD OF PRODUCING FILM | CANON KK (JP) | 2024-04-03 | — | — | EP | disclosed |
| CN-111324013-B | Chemically amplified positive photosensitive resin composition and application thereof | 奇美实业股份有限公司 | 2023-12-01 | — | — | CN | disclosed |
| CN-116982004-A | Photosensitive composition | JSR株式会社 | 2023-10-31 | — | — | CN | disclosed |
| CN-110383170-B | Method for producing plated molded article | JSR株式会社 | 2023-10-03 | — | — | CN | disclosed |
| CN-116360211-A | Chemically amplified positive photosensitive resin composition, protective film, and element having protective film | 奇美实业股份有限公司 | 2023-06-30 | — | — | CN | disclosed |
| CN-111381438-B | Chemically amplified positive photosensitive resin composition and application thereof | 奇美实业股份有限公司 | 2023-06-20 | — | — | CN | disclosed |
| US-11681227-B2 | Enhanced EUV photoresist materials, formulations and processes | IRRESISTIBLE MATERIALS LTD (GB) | 2023-06-20 | — | — | US | disclosed |
| US-11592605-B2 | Color developing structure having concave-convex layer, method for producing such structure, and display | TOPPAN PRINTING CO., LTD. (JP) | 2023-02-28 | — | — | US | disclosed |
| US-20230036031-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RESIST PATTERN FILM, METHOD FOR PRODUCING PLATED FORMED PRODUCT, AND METHOD FOR PRODUCING TIN-SILVER PLATED-FORMED PRODUCT | JSR CORPORATION (JP) | 2023-02-02 | — | — | US | disclosed |
| EP-0898201-B1 | Radiation sensitive resin composition | JSR CORP (JP) | 2003-04-09 | — | — | EP | disclosed |
| US-20020090569-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-07-11 | — | — | US | disclosed |
| US-6280900-B1 | RADIATION SENSITIVE COMPOSITION WITH ALKALINE DEVELOPER SOLUBLE IN POLYMER COATED ON SUBSTRATE | JSR CORPORATION (JP) | 2001-08-28 | — | — | US | disclosed |
| US-6235446-B1 | MIXTURE OF P-HYDROXYSTYRENE, ACRYLATED ESTER | JSR CORPORATION (JP) | 2001-05-22 | — | — | US | disclosed |
| US-6143460-A | PHOTOACID GENERATOR PROVIDING IMPROVED PHOTORESIST RESOLUTION | JSR CORPORATION (JP) | 2000-11-07 | — | — | US | disclosed |
| US-6136500-A | CONTAINS A PHOTOACID GENERATOR COMPRISING A COMBINATION OF A COMPOUND THAT GENERATES A CARBOXYLIC ACID UPON EXPOSURE TO RADIATION AND ANOTHER COMPOUND THAT GENERATES ANOTHER ACID UPON EXPOSURE TO RADIATION | JSR CORPORATION (JP) | 2000-10-24 | — | — | US | disclosed |
| US-6120972-A | COPOLYMER OF ACRYLIC ESTER AND CARBONATE WITH PHOTOACID GENERATOR FOR PHOTOSENSITIVE ELEMENTS | JSR CORPORATION (JP) | 2000-09-19 | — | — | US | disclosed |
| EP-0959389-A1 | Diazodisulfone compound and radiation-sensitive resin composition | JSR Corporation (JP) | 1999-11-24 | — | — | EP | disclosed |
| EP-0901043-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 1999-03-10 | — | — | EP | disclosed |
| EP-0898201-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 1999-02-24 | — | — | EP | disclosed |