Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 12/20 | 1.00 |
| ▸ | KDM4E | B2RXH2 | 12/20 | 1.00 |
| ▸ | HPGD | P15428 | 9/20 | 1.00 |
| ▸ | VDR | P11473 | 2/20 | 0.78 |
| ▸ | MAPT | P10636 | 9/20 | 0.76 |
| ▸ | KMT2A | Q03164 | 7/20 | 0.76 |
| ▸ | MEN1 | O00255 | 4/20 | 0.76 |
| ▸ | HTT | P42858 | 3/20 | 0.76 |
| ▸ | LMNA | P02545 | 3/20 | 0.75 |
| ▸ | THRB | P10828 | 1/20 | 0.75 |
| ▸ | F2 | P00734 | 4/20 | 0.58 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.56 |
| ▸ | XBP1 | P17861 | 2/20 | 0.53 |
| ▸ | POLB | P06746 | 1/20 | 0.50 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.49 |
| ▸ | GAA | P10253 | 1/20 | 0.49 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.49 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.49 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.49 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.49 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19985736 | 0.92 | KDM4E (0.85) | ALDH1A1KDM4EHPGDVDRMAPT | |
| SCHEMBL64277 | 0.88 | VDR (1.00) | ALDH1A1KDM4EHPGDVDRMAPT | |
| SCHEMBL29370293 | 0.88 | VDR (1.00) | ALDH1A1KDM4EHPGDVDRMAPT | |
| SCHEMBL31108702 | 0.88 | KDM4E (0.77) | ALDH1A1KDM4EHPGDVDRMAPT | |
| SCHEMBL462229 | 0.87 | ALDH1A1 (0.78) | ALDH1A1KDM4EHPGDVDRMAPT | |
| SCHEMBL1088835 | 0.87 | ALDH1A1 (1.00) | ALDH1A1KDM4EHPGDVDRMAPT | |
| SCHEMBL31218469 | 0.87 | ALDH1A1 (1.00) | ALDH1A1KDM4EHPGDVDRMAPT | |
| SCHEMBL24943446 | 0.87 | KDM4E (0.76) | ALDH1A1KDM4EHPGDVDRMAPT | |
| SCHEMBL7572742 | 0.86 | ALDH1A1 (1.00) | ALDH1A1KDM4EHPGDVDRMAPT | |
| SCHEMBL19985734 | 0.86 | KDM4E (0.74) | ALDH1A1KDM4EHPGDVDRMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 612 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8748894-B2 | Composition of organic insulating layer and thin film transistor substrate and display device using the same | LG DISPLAY CO., LTD. (KR) | 2014-06-10 | — | — | US | claimed |
| US-20130134426-A1 | COMPOSITION OF ORGANIC INSULATING LAYER AND THIN FILM TRANSISTOR SUBSTRATE AND DISPLAY DEVICE USING THE SAME | LG DISPLAY CO., LTD. (KR) | 2013-05-30 | — | — | US | claimed |
| US-5994022-A | BECOMES SOLUBLE IN ALKALI DEVELOPING SOLUTION BY ACTION OF AN ACID | JSR CORPORATION (JP) | 1999-11-30 | — | — | US | claimed |
| US-12479960-B2 | Triazine ring-containing polymer and film forming composition containing same | NISSAN CHEMICAL CORPORATION (JP) | 2025-11-25 | — | — | US | disclosed |
| US-12434998-B2 | Resin-coated ultra-thin glass | TORAY INDUSTRIES, INC. (JP) | 2025-10-07 | — | — | US | disclosed |
| US-12410345-B2 | Polyvinyl aromate-polydiene-block copolymer-based adhesive compounds having improved thermal shear strength | TESA SE (DE) | 2025-09-09 | — | — | US | disclosed |
| US-12297381-B2 | Laminate, release agent composition, and method for manufacturing processed semiconductor substrate | NISSAN CHEMICAL CORPORATION (JP) | 2025-05-13 | — | — | US | disclosed |
| CN-119836863-A | Organic EL display device | 东丽株式会社 | 2025-04-15 | — | — | CN | disclosed |
| WO-2025062940-A1 | RESIN COMPOSITION, SUBSTRATE WITH PIEZOELECTRIC FILM, AND METHOD FOR PRODUCING SUBSTRATE WITH PIEZOELECTRIC FILM | 東レ株式会社 | 2025-03-27 | — | — | WO | disclosed |
| CN-114599704-B | Triazine ring-containing polymer and film-forming composition containing same | 日产化学株式会社 | 2025-02-14 | — | — | CN | disclosed |
| CN-116648353-B | Resin coated ultra-thin plate glass and display device | 东丽株式会社 | 2025-01-21 | — | — | CN | disclosed |
| EP-0660187-B1 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1997-03-05 | — | — | EP | disclosed |
| US-5556734-A | RESISTS | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1996-09-17 | — | — | US | disclosed |
| US-5449705-A | Silicon-containing polyamic acid derivative and photosensitive resin composition using it | CHISSO CORPORATION (JP) | 1995-09-12 | — | — | US | disclosed |
| US-5449588-A | Shrinkage inhibition | CHISSO CORPORATION (JP) | 1995-09-12 | — | — | US | disclosed |
| US-5442024-A | Polyamic acid having a crosslinkable silane group or copolymerized with a polysiloxane and a compound generating an acid catalyst to effect imidation upon radiating; films; photoresists; shrinkage inhibition; resolution; adhesion | CHISSO CORPORATION (JP) | 1995-08-15 | — | — | US | disclosed |
| EP-0660187-A1 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1995-06-28 | — | — | EP | disclosed |
| EP-0058638-B1 | CURABLE COMPOSITIONS CONTAINING AN ACID-CURABLE RESIN, AND PROCESS FOR CURING THEM | CIBA-GEIGY AG (CH) | 1985-08-28 | — | — | EP | disclosed |
| US-4371605-A | Photopolymerizable compositions containing N-hydroxyamide and N-hydroxyimide sulfonates | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1983-02-01 | — | — | US | disclosed |
| EP-0058638-A2 | Curable compositions containing an acid-curable resin, and process for curing them | CIBA-GEIGY AG (CH) | 1982-08-25 | — | — | EP | disclosed |