SCHEMBL4624809

SCHEMBL4624809

CC(=O)OCC1CC2OC2CC1C

nearest known ligand 0.34

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NLRP3 Q96P20 2/20 0.34
PDK1 Q15118 1/20 0.34
PPP5C P53041 1/20 0.33
CA12 O43570 2/20 0.33
CA1 P00915 2/20 0.33
CA2 P00918 2/20 0.33
CA9 Q16790 2/20 0.33
TSHR P16473 2/20 0.33
HSD17B10 Q99714 2/20 0.31
LMNA P02545 2/20 0.31
THRB P10828 2/20 0.31
ALDH1A1 P00352 1/20 0.31
CYP2D6 P10635 1/20 0.31
SMN1; SMN2 Q16637 2/20 0.31
HIF1A Q16665 1/20 0.31
NR3C1 P04150 1/20 0.31
FYN P06241 1/20 0.31
ADRA2A P08913 1/20 0.31
ADORA3 P0DMS8 1/20 0.31
ADRA2B P18089 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Bicarbonate SCHEMBL29160648 0.97 PPP5C (0.35) NLRP3PDK1PPP5CCA12CA1
SCHEMBL11764057 0.87 PPP5C (0.34) PPP5CPPM1BPTPN1PPP1CC
SCHEMBL31375709 0.87 PPP5C (0.34) PPP5CALDH1A1CHRNB2CHRNA3CHRNA4
SCHEMBL13003493 0.87
SCHEMBL259361 0.84 LMNA (0.34) NLRP3PPP5CTSHRLMNAALDH1A1
SCHEMBL12881657 0.84 MGAM (0.33) PPP5C
SCHEMBL14505077 0.83 ALDH1A1 (0.50) PPP5CTSHRTHRBALDH1A1CYP2D6
SCHEMBL30139969 0.83 PPP5C (0.32) PPP5C
SCHEMBL13935420 0.83 CHRNB2 (0.33) PPP5CCHRM4CHRM5CHRM1CHRNB2
SCHEMBL8660632 0.83 PPP5C (0.32) PPP5CLMNATHRBALDH1A1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-62175432-A None JP disclosed
US-10767044-B2 Ionizing radiation resistant polycarbonate resin composition and molded article containing same LOTTE ADVANCED MATERIALS CO., LTD. (KR) 2020-09-08 US disclosed
US-20170002197-A1 Ionizing Radiation Resistant Polycarbonate Resin Composition and Article Comprising the Same LOTTE ADVANCED MATERIALS CO., LTD. (KR) 2017-01-05 US disclosed
US-20170002197-A1 Ionizing Radiation Resistant Polycarbonate Resin Composition and Article Comprising the Same LOTTE ADVANCED MATERIALS CO., LTD. (KR) 2017-01-05 US disclosed
US-20160297964-A1 Ionizing Radiation Resistant Polycarbonate Resin Composition and Article Comprising the Same LOTTE ADVANCED MATERIALS CO., LTD. (KR) 2016-10-13 US disclosed
US-20160297964-A1 Ionizing Radiation Resistant Polycarbonate Resin Composition and Article Comprising the Same LOTTE ADVANCED MATERIALS CO., LTD. (KR) 2016-10-13 US disclosed
US-20160137811-A1 Ionizing Radiation Resistant Polycarbonate Resin Composition and Article Comprising the Same LOTTE ADVANCED MATERIALS CO., LTD. (KR) 2016-05-19 US disclosed
US-20160137811-A1 Ionizing Radiation Resistant Polycarbonate Resin Composition and Article Comprising the Same LOTTE ADVANCED MATERIALS CO., LTD. (KR) 2016-05-19 US disclosed
US-20150146294-A1 POLARIZING PLATE, FABRICATION METHOD FOR POLARIZING PLATE, AND IMAGE DISPLAY DEVICE Konica Minolta, Inc. (JP) 2015-05-28 US disclosed
US-7690783-B2 Ink for inkjet printing, lithographic printing plate using it and method for making such plate FUJIFILM CORPORATION (JP) 2010-04-06 US disclosed
US-20100061212-A1 METHOD AND DEVICE FOR OPTICAL RECORDING MEDIUM, AND OPTICAL RECORDING AND REPRODUCING APPARATUS FUJIFILM CORPORATION (JP) 2010-03-11 US disclosed
EP-1373361-B1 POLYESTER IONOMER COMPOSITION GEN ELECTRIC (US) 2008-06-25 EP disclosed
US-20070042275-A1 Composition for optical recording, optical recording medium, and production method thereof FUJI PHOTO FILM CO., LTD. 2007-02-22 US disclosed
US-7169446-B2 Oxetane compound, actinic ray curable composition, ink composition for ink jet recording, and image formation method KONICA MINOLTA MEDICAL & GRAPHIC, INC. (JP) 2007-01-30 US disclosed
US-6476157-B2 A POLYESTER COPOLYMER OF AN AROMATIC DICAROXYLIC ACID CONTAINING SULFONATE GROUP, AN ARYL DICARBOXYLIC ACID AND A DIOL, END GROUP OF THE ACID IS ENDCAPPED WITH 3,4-EPOXYCYCLOHEXYLMETHYL-3,4-CYCLOHEXYLCARBOXYLATE GENERAL ELECTRIC COMPANY 2002-11-05 US disclosed
US-20020111440-A1 Polyester ionomer composition GENERAL ELECTRIC COMPANY 2002-08-15 US disclosed
JP-S62175432-A STABILIZER OR CORROSION-PROTECTIVE AGENT FOR HALOGEN-CONTAINING COMPOUND DAICEL CHEM IND LTD 1987-08-01 JP disclosed