Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.42 |
| ▸ | THRB | P10828 | 1/20 | 0.40 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.36 |
| ▸ | POLB | P06746 | 1/20 | 0.34 |
| ▸ | APEX1 | P27695 | 1/20 | 0.34 |
| ▸ | HTT | P42858 | 1/20 | 0.34 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4955679 | 0.84 | TSHR (0.55) | TSHRTHRBPOLBAPEX1HTT | |
| SCHEMBL496658 | 0.83 | TSHR (0.57) | TSHRTHRBALOX15POLBAPEX1 | |
| Hydrochloric Acid SCHEMBL17865376 | 0.82 | TSHR (0.53) | TSHRTHRBPOLBAPEX1HTT | |
| SCHEMBL25220357 | 0.81 | TSHR (0.52) | TSHRTHRBALOX15POLBAPEX1 | |
| SCHEMBL9326798 | 0.81 | TSHR (0.47) | TSHRTHRBALOX15POLBAPEX1 | |
| SCHEMBL11528787 | 0.81 | TSHR (0.61) | TSHRTHRBALOX15POLBAPEX1 | |
| SCHEMBL5941686 | 0.81 | TSHR (0.52) | TSHRTHRBALOX15POLBAPEX1 | |
| SCHEMBL1440495 | 0.80 | THRB (0.50) | TSHRTHRBPOLBAPEX1HTT | |
| SCHEMBL11526952 | 0.80 | TSHR (0.64) | TSHRTHRBALOX15POLBAPEX1 | |
| SCHEMBL4671949 | 0.80 | TSHR (0.46) | TSHRTHRBALOX15POLBAPEX1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 179 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110506100-A | Composite and application method after chemical mechanical grinding | ENTEGRIS INC | 2019-11-26 | — | — | CN | claimed |
| CN-118938595-A | Pixel pattern manufacturing method, color filter manufacturing method and liquid crystal display device | 奇美实业股份有限公司 | 2024-11-12 | — | — | CN | disclosed |
| CN-107636038-B | Reactive compositions containing mercapto-functional silicon compounds | 莫门蒂夫性能材料股份有限公司 | 2020-09-22 | — | — | CN | disclosed |
| CN-107132729-B | Photosensitive resin composition and application thereof | 奇美实业股份有限公司 | 2020-08-14 | — | — | CN | disclosed |
| US-10676594-B2 | Reactive compositions containing mercapto-functional silicon compound | MOMENTIVE PERFORMANCE MATERIALS INC. (US) | 2020-06-09 | — | — | US | disclosed |
| CN-106933033-B | Photosensitive resin composition, optical filter and manufacturing method thereof, and liquid crystal display device | 奇美实业股份有限公司 | 2020-03-13 | — | — | CN | disclosed |
| CN-107015435-B | Photosensitive resin composition, color filter and manufacturing method and application thereof | 奇美实业股份有限公司 | 2019-12-13 | — | — | CN | disclosed |
| CN-105607422-B | Alkali-soluble resin, photosensitive resin composition containing same and application | 奇美实业股份有限公司 | 2019-11-12 | — | — | CN | disclosed |
| CN-110392919-A | Pattern forming method and processing substrate, optical component and quartz molds duplicate manufacturing method and for imprint pretreated coating material and its with the combination of imprint Resist | 佳能株式会社 | 2019-10-29 | — | — | CN | disclosed |
| CN-105425542-B | Photosensitive resin composition for color filter and application thereof | 奇美实业股份有限公司 | 2019-10-18 | — | — | CN | disclosed |
| CN-1584741-A | Light sensitive resin composition for gap | QIMEI IND CO LTD (CN) | 2005-02-23 | — | — | CN | disclosed |
| CN-1570764-A | Light-sensitive resin composition for black matrix | CHI MEI CORP (CN) | 2005-01-26 | — | — | CN | disclosed |
| CN-1564083-A | Light sensitive resin compsn. for black matrix | QIMEI IND CO LTD (CN) | 2005-01-12 | — | — | CN | disclosed |
| CN-1554959-A | Light sensitive resin composition for color filter | 奇美实业股份有限公司 | 2004-12-15 | — | — | CN | disclosed |
| CN-1529206-A | Light-sensitive resin composition for colour filter film | 奇美实业股份有限公司 | 2004-09-15 | — | — | CN | disclosed |
| CN-1509424-A | Radiation-sensitive resin composition | ������ʱ����ʽ���� | 2004-06-30 | — | — | CN | disclosed |
| US-6558873-B1 | Interlayer containing a compound capable of forming a complex with aluminum and a photopolymerizable photosensitive layer containing a photopolymerization initiator, an addition polymerizable compound capable of complexing with aluminum | FUJI PHOTO FILM CO., LTD. (JP) | 2003-05-06 | — | — | US | disclosed |
| EP-1091251-A2 | Lithographic printing plate precursor | FUJI PHOTO FILM CO., LTD. (JP) | 2001-04-11 | — | — | EP | disclosed |
| US-6114404-A | COMPRISING A PIGMENT, A RADIATION CROSS-LINKABLE MONOMER OR OLIGOMER, AND A RHEOLOGY MODIFIER | CORNING INCORPORATED (US) | 2000-09-05 | — | — | US | disclosed |
| CN-1252136-A | Photocurable resin composition | DSM NV (NL) | 2000-05-03 | — | — | CN | disclosed |