Hydrochloric Acid

Hydrochloric Acid

SCHEMBL4632934

CC1=C([Ti+3])C([Si](C)(C)C)c2ccccc21.[Cl-].[Cl-].[Cl-]

nearest known ligand 0.31

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA

The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
GPR3 P46089 1/20 0.31
GAA P10253 1/20 0.31
ALDH1A1 P00352 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4651299 0.79 GPR3 (0.34) GPR3GAA
SCHEMBL6671925 0.75 GPR3 (0.46) GPR3ALDH1A1
SCHEMBL30390148 0.75 GPR3 (0.46) GPR3ALDH1A1
Hydrochloric Acid SCHEMBL6352940 0.75 GPR3 (0.34) GPR3
SCHEMBL6511788 0.74 HTR2A (0.31) GPR3
Hydrochloric Acid SCHEMBL4633144 0.74 GPR3 (0.35) GPR3
Hydrochloric Acid SCHEMBL6517936 0.74
Hydrochloric Acid SCHEMBL6515042 0.74
Hydrochloric Acid SCHEMBL4633591 0.73 CYP19A1 (0.33) GPR3
SCHEMBL6910317 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1520862-B1 Butadiene polymer, and process for producing conjugated diene polymer AGENCY IND SCIENCE TECHN (JP) 2008-05-28 EP disclosed
EP-1520862-A2 Butadiene polymer, and process for producing conjugated diene polymer JAPAN as Represented by DIRECTOR GENERAL OF AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 2005-04-06 EP disclosed
EP-1054026-B1 BUTADIENE POLYMERS AND PROCESS FOR PRODUCING CONJUGATED DIENE POLYMERS JP AGENCY OF INDUSTRIALSCIENCE (JP) 2004-12-08 EP disclosed
US-6653430-B1 Addition polymerizing in presence of Group 4 metal complex having cyclopentadienyl structure and alumoxane cocatalyst; high cis configuration JAPAN AS REPRESENTED BY DIRECTOR GENERAL OF THE AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 2003-11-25 US disclosed
EP-1054026-A1 BUTADIENE POLYMERS AND PROCESS FOR PRODUCING CONJUGATED DIENE POLYMERS JAPAN as Represented by DIRECTOR GENERAL OF AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 2000-11-22 EP disclosed