SCHEMBL4642453

SCHEMBL4642453

CC(S)c1c2ccccc2cc2ccccc12

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.41
HSD17B10 Q99714 4/20 0.41
HIF1A Q16665 1/20 0.41
CYP1B1 Q16678 1/20 0.41
CYP1A2 P05177 4/20 0.40
CYP2A6 P11509 3/20 0.40
HTR2A P28223 1/20 0.40
L3MBTL1 Q9Y468 1/20 0.40
HPGD P15428 2/20 0.39
KDM4E B2RXH2 2/20 0.39
MEN1 O00255 1/20 0.39
GLA P06280 1/20 0.39
CYP2C19 P33261 1/20 0.39
KMT2A Q03164 1/20 0.39
CYP3A4 P08684 1/20 0.38
ERBB2 P04626 1/20 0.38
FYN P06241 1/20 0.38
MAOA P21397 1/20 0.38
ACHE P22303 1/20 0.38
AHR P35869 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29853772 1.00 ALDH1A1 (0.41) ALDH1A1HSD17B10HIF1ACYP1B1CYP1A2
SCHEMBL40806 0.81 ALDH1A1 (0.44) ALDH1A1HSD17B10HIF1ACYP1B1CYP1A2
SCHEMBL4642610 0.79 ALDH1A1 (0.42) ALDH1A1HSD17B10HIF1ACYP1B1CYP1A2
SCHEMBL29853842 0.79 ALDH1A1 (0.42) ALDH1A1HSD17B10HIF1ACYP1B1CYP1A2
SCHEMBL24200933 0.77 HTR2A (0.45) ALDH1A1HSD17B10HIF1ACYP1B1CYP1A2
SCHEMBL240650 0.77 UGT2B7 (0.47) ALDH1A1HSD17B10HIF1ACYP1B1CYP1A2
SCHEMBL8080922 0.77 HTR2A (0.45) ALDH1A1HSD17B10HIF1ACYP1B1CYP1A2
SCHEMBL4645643 0.77 L3MBTL1 (0.45) ALDH1A1HSD17B10HIF1ACYP1B1CYP1A2
SCHEMBL4647817 0.77 ALDH1A1 (0.41) ALDH1A1HSD17B10HIF1ACYP1B1CYP1A2
SCHEMBL7560523 0.77 UGT2B7 (0.47) ALDH1A1HSD17B10HIF1ACYP1B1CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4091578-B1 METHOD FOR PRODUCING PLATE DENTURE TOKUYAMA DENTAL CORP (JP) 2024-10-09 EP disclosed
US-11857385-B2 Method of producing plate denture, curable composition for stereolithography, and plate denture production kit TOKUYAMA DENTAL CORPORATION (JP) 2024-01-02 US disclosed
CN-114929158-B Method for producing denture, curable composition for photoforming, and kit for producing denture 株式会社德山齿科 2023-10-20 CN disclosed
US-20230137898-A1 METHOD OF PRODUCING PLATE DENTURE, CURABLE COMPOSITION FOR STEREOLITHOGRAPHY, AND PLATE DENTURE PRODUCTION KIT TOKUYAMA DENTAL CORPORATION (JP) 2023-05-04 US disclosed
EP-4091578-A1 METHOD FOR PRODUCING PLATE DENTURE, CURABLE STEREOLITHOGRAPHIC COMPOSITION, AND PLATE DENTURE PRODUCTION KIT Tokuyama Dental Corporation (JP) 2022-11-23 EP disclosed
CN-114929158-A Method for producing a denture, curable composition for photo-molding, and kit for producing a denture 株式会社德山齿科 2022-08-19 CN disclosed
US-20160164075-A1 PROCESS FOR PRODUCING AN ACTIVE CATHODE MATERIAL COMPRISING A MIXTURE OF A METAL OXIDE AND A METAL SULFIDE AND USE OF THE ACTIVE CATHODE MATERIAL IN RECHARGEABLE ELECTROCHEMICAL CELLS BASF SE (DE) 2016-06-09 US disclosed
EP-3022786-A1 PROCESS FOR PRODUCING ACTIVE CATHODE MATERIAL COMPRISING MIXTURE OF METAL OXIDE AND METAL SULFIDE AND USE OF ACTIVE CATHODE MATERIAL IN RECHARGEABLE ELECTROCHEMICAL CELLS BASF SE (DE) 2016-05-25 EP disclosed
CN-105409037-A Process for producing active cathode material comprising mixture of metal oxide and metal sulfide and use of active cathode material in rechargeable electrochemical cells BASF SE 2016-03-16 CN disclosed
CN-103988313-A Method for manufacturing silicon substrate having textured structure TOKUYAMA CORPROATION 2014-08-13 CN disclosed
EP-1591098-B1 Cationically curable composition for dental use TOKUYAMA CORP (JP) 2008-08-13 EP disclosed
US-7365106-B2 Cationically curable composition for dental use TOKUYAMA CORPORATION (JP) 2008-04-29 US disclosed
EP-1431315-B1 Photopolymerization initiator and photopolymerizable composition TOKUYAMA CORP (JP) 2007-10-17 EP disclosed
CN-1732883-A Cationically curable composition for dental use TOKUYAMA CORP (JP) 2006-02-15 CN disclosed
US-20050250868-A1 Cationically curable composition for dental use TOKUYAMA CORPORATION (JP) 2005-11-10 US disclosed
EP-1591098-A1 Cationically curable composition for dental use TOKUYAMA CORPORATION (JP) 2005-11-02 EP disclosed
US-20040186195-A1 Photopolymerization initiator and photopolymerizable composition TOKUYAMA CORPORATION (JP) 2004-09-23 US disclosed
EP-1431315-A2 Photopolymerization initiator and photopolymerizable composition Tokuyama Corporation (JP) 2004-06-23 EP disclosed