Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MMP2 | P08253 | 6/20 | 0.33 |
| ▸ | MMP9 | P14780 | 6/20 | 0.33 |
| ▸ | MMP14 | P50281 | 6/20 | 0.33 |
| ▸ | MMP8 | P22894 | 5/20 | 0.33 |
| ▸ | MMP3 | P08254 | 1/20 | 0.33 |
| ▸ | MMP7 | P09237 | 1/20 | 0.33 |
| ▸ | TMEM97 | Q5BJF2 | 1/20 | 0.32 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.32 |
| ▸ | CAPN1 | P07384 | 1/20 | 0.30 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
| ▸ | MAPT | P10636 | 1/20 | 0.30 |
| ▸ | ACE | P12821 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10824285 | 0.88 | CAPN1 (0.46) | MMP2MMP9MMP14MMP8MMP3 | |
| SCHEMBL4646747 | 0.86 | MMP2 (0.49) | MMP2MMP9MMP14MMP8MMP3 | |
| SCHEMBL4647523 | 0.82 | MMP2 (0.43) | MMP2MMP9MMP14MMP8MMP3 | |
| SCHEMBL15282666 | 0.76 | CYP1A2 (0.48) | SIGMAR1 | |
| SCHEMBL5212421 | 0.71 | — | — | |
| SCHEMBL4742114 | 0.71 | — | — | |
| SCHEMBL6150876 | 0.70 | — | — | |
| SCHEMBL6151277 | 0.68 | — | — | |
| SCHEMBL1402882 | 0.67 | CRBN (0.33) | LMNA | |
| SCHEMBL1402763 | 0.67 | TSHR (0.37) | MMP2MMP9MMP14MMP8MMP3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20080206668-A1 | NEGATIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-08-28 | — | — | US | disclosed |
| EP-1962139-A1 | Negative resist composition and pattern forming method using the same | FUJIFILM Corporation (JP) | 2008-08-27 | — | — | EP | disclosed |