Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MMP2 | P08253 | 17/20 | 0.43 |
| ▸ | MMP9 | P14780 | 17/20 | 0.43 |
| ▸ | MMP14 | P50281 | 12/20 | 0.43 |
| ▸ | MMP8 | P22894 | 9/20 | 0.43 |
| ▸ | MMP7 | P09237 | 5/20 | 0.43 |
| ▸ | MMP3 | P08254 | 4/20 | 0.43 |
| ▸ | MMP1 | P03956 | 2/20 | 0.39 |
| ▸ | ADAM17 | P78536 | 1/20 | 0.39 |
| ▸ | HTR6 | P50406 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.37 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.37 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4644559 | 0.82 | MMP2 (0.33) | MMP2MMP9MMP14MMP8MMP7 | |
| SCHEMBL4646518 | 0.77 | MMP2 (0.41) | MMP2MMP9MMP14MMP8MMP7 | |
| SCHEMBL4645049 | 0.77 | MMP2 (0.38) | MMP2MMP9MMP14MMP8MMP7 | |
| SCHEMBL4989552 | 0.76 | HRH3 (0.36) | MMP2MMP9MMP14MMP8MMP7 | |
| SCHEMBL4992502 | 0.76 | ALDH1A1 (0.36) | MMP2MMP9MMP14MMP8MMP7 | |
| SCHEMBL29082286 | 0.74 | MMP2 (0.36) | MMP2MMP9MMP14MMP8MMP7 | |
| SCHEMBL10824285 | 0.72 | CAPN1 (0.46) | MMP2MMP9MMP14MMP8MMP7 | |
| SCHEMBL9189038 | 0.72 | PKM (0.56) | MMP2MMP1HTR6ALDH1A1CYP3A4 | |
| SCHEMBL1402785 | 0.72 | PKM (0.60) | MMP2MMP9MMP14MMP8MMP7 | |
| SCHEMBL1402877 | 0.72 | MMP2 (0.36) | MMP2MMP9MMP14MMP8MMP7 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20080206668-A1 | NEGATIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-08-28 | — | — | US | disclosed |
| EP-1962139-A1 | Negative resist composition and pattern forming method using the same | FUJIFILM Corporation (JP) | 2008-08-27 | — | — | EP | disclosed |