SCHEMBL4645175

SCHEMBL4645175

O=C(OCc1c2ccccc2c(COC(=O)c2ccccc2)c2ccccc12)c1ccccc1

nearest known ligand 0.66

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 3/20 0.66
KMT2A Q03164 2/20 0.66
SLC6A2 P23975 1/20 0.66
SLC6A3 Q01959 1/20 0.66
MAPK1 P28482 2/20 0.55
HIF1A Q16665 1/20 0.55
LMNA P02545 4/20 0.55
ALDH1A1 P00352 3/20 0.53
PPARG P37231 1/20 0.53
TSHR P16473 2/20 0.50
F2 P00734 1/20 0.50
NPSR1 Q6W5P4 1/20 0.49
HPGD P15428 2/20 0.47
MAPT P10636 1/20 0.47
KDM4E B2RXH2 1/20 0.47
GAA P10253 1/20 0.47
L3MBTL1 Q9Y468 1/20 0.47
NPC1 O15118 2/20 0.46
RAB9A P51151 2/20 0.46
ESR1 P03372 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29853739 1.00 TDP1 (0.66) TDP1KMT2ASLC6A2SLC6A3MAPK1
SCHEMBL4648309 0.88 TDP1 (0.56) TDP1KMT2ASLC6A2SLC6A3MAPK1
SCHEMBL17537989 0.82 TDP1 (0.63) TDP1KMT2ASLC6A2SLC6A3MAPK1
SCHEMBL8943796 0.82 EPHX1 (0.52) TDP1KMT2ASLC6A2SLC6A3MAPK1
SCHEMBL28758281 0.81 TDP1 (0.61) TDP1KMT2ASLC6A2SLC6A3MAPK1
SCHEMBL10608570 0.79 TDP1 (0.59) TDP1KMT2ASLC6A2SLC6A3MAPK1
Benzyl Benzoate SCHEMBL3038 0.79 KMT2A (1.00) TDP1KMT2ASLC6A2SLC6A3MAPK1
Benzyl Benzoate SCHEMBL901058 0.79 KMT2A (1.00) TDP1KMT2ASLC6A2SLC6A3MAPK1
SCHEMBL5085480 0.79 PPARG (0.71) TDP1KMT2ASLC6A2SLC6A3MAPK1
SCHEMBL5085718 0.79 KMT2A (0.92) TDP1KMT2ASLC6A2SLC6A3MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4091578-B1 METHOD FOR PRODUCING PLATE DENTURE TOKUYAMA DENTAL CORP (JP) 2024-10-09 EP disclosed
US-11857385-B2 Method of producing plate denture, curable composition for stereolithography, and plate denture production kit TOKUYAMA DENTAL CORPORATION (JP) 2024-01-02 US disclosed
US-20230137898-A1 METHOD OF PRODUCING PLATE DENTURE, CURABLE COMPOSITION FOR STEREOLITHOGRAPHY, AND PLATE DENTURE PRODUCTION KIT TOKUYAMA DENTAL CORPORATION (JP) 2023-05-04 US disclosed
EP-4091578-A1 METHOD FOR PRODUCING PLATE DENTURE, CURABLE STEREOLITHOGRAPHIC COMPOSITION, AND PLATE DENTURE PRODUCTION KIT Tokuyama Dental Corporation (JP) 2022-11-23 EP disclosed
CN-114929158-A Method for producing a denture, curable composition for photo-molding, and kit for producing a denture 株式会社德山齿科 2022-08-19 CN disclosed
EP-1591098-B1 Cationically curable composition for dental use TOKUYAMA CORP (JP) 2008-08-13 EP disclosed
US-7365106-B2 Cationically curable composition for dental use TOKUYAMA CORPORATION (JP) 2008-04-29 US disclosed
EP-1431315-B1 Photopolymerization initiator and photopolymerizable composition TOKUYAMA CORP (JP) 2007-10-17 EP disclosed
US-20050250868-A1 Cationically curable composition for dental use TOKUYAMA CORPORATION (JP) 2005-11-10 US disclosed
EP-1591098-A1 Cationically curable composition for dental use TOKUYAMA CORPORATION (JP) 2005-11-02 EP disclosed
US-20040186195-A1 Photopolymerization initiator and photopolymerizable composition TOKUYAMA CORPORATION (JP) 2004-09-23 US disclosed
EP-1431315-A2 Photopolymerization initiator and photopolymerizable composition Tokuyama Corporation (JP) 2004-06-23 EP disclosed