SCHEMBL464613

SCHEMBL464613

C=CCn1c(=O)n(CC(=O)O)c(=O)n(CC(=O)O)c1=O

nearest known ligand 0.67

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 2/20 0.67
MAPT P10636 2/20 0.50
NPSR1 Q6W5P4 1/20 0.47
APEX1 P27695 2/20 0.47
KMT2A Q03164 2/20 0.38
SMN1; SMN2 Q16637 2/20 0.38
ALDH1A1 P00352 2/20 0.37
HPGD P15428 2/20 0.37
HRH1 P35367 1/20 0.37
KDM4E B2RXH2 1/20 0.37
HSD17B10 Q99714 1/20 0.37
CYP1A2 P05177 1/20 0.37
CYP2D6 P10635 1/20 0.37
ADORA2B P29275 3/20 0.37
ADORA2A P29274 2/20 0.37
PLA2G4A P47712 2/20 0.36
ADORA3 P0DMS8 1/20 0.35
ADORA1 P30542 1/20 0.35
GLA P06280 1/20 0.35
ACE P12821 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL677187 0.82 APEX1 (0.62) APEX1KMT2AALDH1A1HPGDKDM4E
SCHEMBL28662 0.82 CYP3A4 (1.00) CYP3A4MAPTNPSR1KMT2ASMN1; SMN2
Acetone SCHEMBL11800599 0.80 CYP3A4 (0.76) CYP3A4MAPTNPSR1KMT2ASMN1; SMN2
SCHEMBL20737946 0.80 CYP3A4 (0.61) CYP3A4MAPTNPSR1APEX1KMT2A
SCHEMBL2730954 0.80 CYP3A4 (0.61) CYP3A4MAPTNPSR1APEX1KMT2A
SCHEMBL12580004 0.78 CYP3A4 (0.64) CYP3A4MAPTNPSR1KMT2ASMN1; SMN2
SCHEMBL12580005 0.78 CYP3A4 (0.64) CYP3A4MAPTNPSR1KMT2ASMN1; SMN2
SCHEMBL1006937 0.77 CYP3A4 (0.57) CYP3A4MAPTNPSR1KMT2ASMN1; SMN2
SCHEMBL24669059 0.76 CYP3A4 (0.76) CYP3A4MAPTNPSR1KMT2ASMN1; SMN2
SCHEMBL14319160 0.76 CYP3A4 (0.76) CYP3A4MAPTNPSR1KMT2ASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240184204-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING PROTECTED BASIC ORGANIC GROUP NISSAN CHEMICAL CORPORATION (JP) 2024-06-06 US disclosed
US-20230296984-A1 EUV RESIST UNDERLAYER FILM-FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2023-09-21 US disclosed
US-20230296984-A1 EUV RESIST UNDERLAYER FILM-FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2023-09-21 US disclosed
US-20220204686-A1 CHEMICAL-RESISTANT PROTECTIVE FILM FORMING COMPOSITION CONTAINING HYDROXYARYL-TERMINATED POLYMER NISSAN CHEMICAL CORPORATION (JP) 2022-06-30 US disclosed
JP-2011225457-A ISOCYANURATE COMPOUND SHIKOKU CHEM CORP 2011-11-10 JP disclosed
JP-2011219436-A 1-ALLYL-3, 5-BIS(CARBOXYMETHYL)ISOCYANURATE SHIKOKU CHEM CORP 2011-11-04 JP disclosed