⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4618496 | 0.83 | — | — | |
| SCHEMBL4645391 | 0.73 | — | — | |
| SCHEMBL4647198 | 0.69 | — | — | |
| SCHEMBL4563799 | 0.69 | — | — | |
| SCHEMBL15683856 | 0.68 | — | — | |
| SCHEMBL635199 | 0.67 | — | — | |
| SCHEMBL4646350 | 0.65 | ALDH1A1 (0.33) | — | |
| SCHEMBL4647270 | 0.65 | MAPK1 (0.36) | — | |
| SCHEMBL15434814 | 0.61 | ALDH1A1 (0.37) | — | |
| SCHEMBL4644863 | 0.60 | MAPK1 (0.46) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20080206668-A1 | NEGATIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-08-28 | — | — | US | disclosed |
| EP-1962139-A1 | Negative resist composition and pattern forming method using the same | FUJIFILM Corporation (JP) | 2008-08-27 | — | — | EP | disclosed |