Methacrylic Acid

Methacrylic Acid

SCHEMBL465137

C=C(C)C(=O)O.CCC1(COCC2(CC)CO2)CO1

nearest known ligand 0.32

Full drug profile on Sugi Atlas →

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
THRB P10828 1/20 0.32
ALDH1A1 P00352 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Acrylic Acid SCHEMBL465172 0.84 LMNA (0.36) ALDH1A1
Methacrylic Acid SCHEMBL2029683 0.81 PRKCD (0.32)
SCHEMBL27881844 0.78 THRB (0.57) THRBALDH1A1
SCHEMBL234066 0.78 ALDH1A1 (0.44) THRBALDH1A1
SCHEMBL15158131 0.73
SCHEMBL10002603 0.73 TET2 (0.31)
SCHEMBL866605 0.72 TET2 (0.31)
SCHEMBL7613994 0.70
SCHEMBL28181549 0.69
Methacrylic Acid SCHEMBL2849274 0.68 THRB (0.52) THRBALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20140377551-A1 PRESSURE-SENSITIVE ADHESIVE COMPOSITION, SURFACE PROTECTIVE FILM, AND OPTICAL MEMBER NITTO DENKO CORPORATION (JP) 2014-12-25 US disclosed
US-20130260148-A1 PRESSURE-SENSITIVE ADHESIVE SHEETS NITTO DENKO CORPORATION (JP) 2013-10-03 US disclosed
US-20130260147-A1 PRESSURE-SENSITIVE ADHESIVE SHEET AND OPTICAL MEMBER NITTO DENKO CORPORATION (JP) 2013-10-03 US disclosed
EP-2644673-A2 Pressure-sensitive adhesive sheet and optical member NITTO DENKO CORPORATION (JP) 2013-10-02 EP disclosed
EP-2644672-A2 Pressure-sensitive adhesive sheets NITTO DENKO CORPORATION (JP) 2013-10-02 EP disclosed
US-8217130-B2 Curable composition and method for producing the same CEMEDINE CO., LTD. (JP) 2012-07-10 US disclosed
EP-2093252-B1 Curing composition and method for producing curing composition CEMEDINE CO LTD (JP) 2012-05-16 EP disclosed
WO-2012026786-A3 DISPLACEMENT DESORPTION PROCESS FOR LIGHT OLEFIN SEPARATION KOREA INSTITUTE OF ENERGY RESEARCH (KR) 2012-05-10 WO disclosed
EP-2050772-B1 CURABLE RESIN AND CURABLE COMPOSITION MITSUI CHEMICALS INC (JP) 2011-11-30 EP disclosed
US-20100267898-A1 CURABLE COMPOSITION AND METHOD FOR PRODUCING THE SAME CEMEDINE CO., LTD. 2010-10-21 US disclosed
US-20100036050-A1 CURABLE RESIN AND CURABLE COMPOSITION CEMEDINE CO., LTD. (JP) 2010-02-11 US disclosed
EP-2093252-A1 Curing composition and method for producing curing composition CEMEDINE CO., LTD. (JP) 2009-08-26 EP disclosed
EP-2050772-A1 CURABLE RESIN AND CURABLE COMPOSITION Mitsui Chemicals Polyurethanes, Inc. (JP) 2009-04-22 EP disclosed
US-20060293456-A1 Curable composition and method for producing the same CEMEDINE CO., LTD. (JP) 2006-12-28 US disclosed
US-20060199915-A1 Modified cycloolefin copolymer, process for producing the same, and use of the polymer SOKEN CHEMICAL & ENGINEERING CO., LTD. (JP) 2006-09-07 US disclosed
EP-1650257-A1 CURING COMPOSITION AND METHOD FOR PRODUCING CURING COMPOSITION CEMEDINE CO., LTD. (JP) 2006-04-26 EP disclosed
US-7015295-B1 Process for producing acrylic polymer SOKEN CHEMICAL & ENGINEERING CO., LTD. (JP) 2006-03-21 US disclosed
US-6861486-B2 Catalyst for bulk polymerization SOKEN CHEMICAL & ENGINEERING CO., LTD. (JP) 2005-03-01 US disclosed
US-20030023012-A1 CATALYST FOR BULK POLYMERIZATION SOKEN CHEMICAL & ENGINEERING CO., LTD. 2003-01-30 US disclosed
US-6489412-B1 A CATALYST FOR BULK POLYMERIZATION COMPRISING AN ORGANOMETALLIC COMPOUND REPRESENTED BY SPECIFIED FORMULA AND A THIOL IS PROVIDED. THE SPECIFIED ORGANOMETALLIC COMPOUND IS A METALLOCENE COMPOUND SUCH AS TITANOCENE OR ZIRCONOCENE. SOKEN CHEMICAL & ENGINEERING CO., LTD. (JP) 2002-12-03 US disclosed