SCHEMBL4651749

SCHEMBL4651749

O=P(O)(O)COc1ccc(Cl)cc1

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTPN1 P18031 1/20 0.58
CYP2C9 P11712 1/20 0.48
CYP2C19 P33261 1/20 0.48
CA2 P00918 1/20 0.46
MMP2 P08253 1/20 0.46
MMP9 P14780 1/20 0.46
MMP8 P22894 1/20 0.46
MMP14 P50281 1/20 0.46
CA9 Q16790 1/20 0.46
CA14 Q9ULX7 1/20 0.46
KMT2A Q03164 2/20 0.45
MEN1 O00255 1/20 0.45
ATF4 P18848 4/20 0.45
FDPS P14324 2/20 0.44
GAA P10253 1/20 0.44
NPSR1 Q6W5P4 1/20 0.44
NR4A2 P43354 1/20 0.43
ADRB2 P07550 1/20 0.43
ADRB3 P13945 1/20 0.43
KDM4E B2RXH2 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14639528 0.79 PTPN1 (0.58) PTPN1CYP2C9CYP2C19KMT2AMEN1
SCHEMBL13538694 0.79 PTPN1 (0.53) PTPN1CYP2C9CYP2C19KMT2AADRB2
SCHEMBL9632949 0.79 FDPS (0.54) CYP2C19KMT2AMEN1FDPSNPSR1
Phenoxymethylphosphonate SCHEMBL274327 0.78 CYP2C9 (0.76) PTPN1CYP2C9CYP2C19KMT2AMEN1
SCHEMBL9502857 0.78 PTPN1 (0.66) PTPN1CYP2C9CYP2C19KMT2AMEN1
SCHEMBL13858834 0.76 PTPN1 (0.59) PTPN1CYP2C9CYP2C19KMT2AMEN1
SCHEMBL10344020 0.76 FDPS (0.46) CYP2C19CA2MMP2MMP9MMP8
SCHEMBL7650420 0.75 PTPN1 (0.53) PTPN1CYP2C9CYP2C19KMT2AFDPS
SCHEMBL11440679 0.75 FDPS (0.48) CYP2C19KMT2AMEN1ATF4FDPS
SCHEMBL9665015 0.73 CYP2C19 (0.61) PTPN1CYP2C9CYP2C19GAANR4A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1220041-B1 Method for preparing lithographic printing plate FUJIFILM CORP (JP) 2008-09-17 EP disclosed
US-20060024609-A1 Process for the production of negative working lithographic printing plate precursors with a coating comprising diazo resin KODAK POLYCHROME GRAPHICS LLC (US) 2006-02-02 US disclosed
EP-1576421-A2 PROCESS FOR THE PRODUCTION OF NEGATIVE WORKING LITHOGRAPHIC PRINTING PLATE PRECURSORS WITH A COATING COMPRISING DIAZO RESIN Kodak Polychrome Graphics GmbH (DE) 2005-09-21 EP disclosed
WO-2004057421-A2 PROCESS FOR THE PRODUCTION OF NEGATIVE WORKING LITHOGRAPHIC PRINTING PLATE PRECURSORS WITH A COATING COMPRISING DIAZO RESIN KODAK POLYCHROME GRAPHICS GMBH (DE) 2004-07-08 WO disclosed
EP-1220041-A2 Method for preparing lithographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 2002-07-03 EP disclosed
US-6258510-B1 Photosensitive planographic printing plate precursor FUJI PHOTO FILM CO., LTD. (JP) 2001-07-10 US disclosed
EP-0563990-B1 Light-sensitive composition FUJI PHOTO FILM CO LTD (JP) 1999-01-13 EP disclosed
US-5741619-A Negative image-recording material comprising an acrylic resin, a diazo compound and carbon black FUJI PHOTO FILM CO., LTD. (JP) 1998-04-21 US disclosed
EP-0547578-B1 Light-sensitive composition FUJI PHOTO FILM CO LTD (JP) 1998-03-18 EP disclosed
US-5698361-A DIAZONIUM COMPOUND, POLYMERIC BINDER; DURABILITY FUJI PHOTO FILM CO., LTD. (JP) 1997-12-16 US disclosed
US-4917988-A DISSOLVING IN 1-METHOXY-2-PROPANOL. METHYL LACTATE AND AN AMINO GROUP-FREE POLAR SOLVENT FUJI PHOTO FILM CO., LTD. (JP) 1990-04-17 US disclosed
EP-0130488-B1 PRESENSITIZED LITHOGRAPHIC PRINTING PLATE PRECURSOR FUJI PHOTO FILM CO., LTD. (JP) 1990-03-14 EP disclosed
EP-0127893-B1 LIGHT-SENSITIVE COMPOSITION FOR USE WITH LITHOGRAPHIC PRINTING PLATES FUJI PHOTO FILM CO., LTD. (JP) 1990-03-14 EP disclosed
US-4902602-A ENHANCED INK RECEPTIVITY FUJI PHOTO FILM CO., LTD. (JP) 1990-02-20 US disclosed
EP-0331171-A2 Light-sensitive composition FUJI PHOTO FILM CO., LTD. (JP) 1989-09-06 EP disclosed
US-4774161-A LITHOGRAPHY, PRINTING PLATES FUJI PHOTO FILM CO., LTD. (JP) 1988-09-27 US disclosed
US-4617250-A DIAZO RESIN, HIGH MOLECULAR WEIGHT ACID-CONTAINING COMPOUND, AROMATIC SULFONATE, AND ORGANIC DYE FUJI PHOTO FILM CO., LTD. (JP) 1986-10-14 US disclosed
US-4576893-A DIAZO RESIN, PYRIDINEDICARBOXYLIC ACID FUJI PHOTO FILM CO., LTD. (JP) 1986-03-18 US disclosed
EP-0130488-A2 Presensitized lithographic printing plate precursor FUJI PHOTO FILM CO., LTD. (JP) 1985-01-09 EP disclosed
EP-0127893-A2 Light-sensitive composition for use with lithographic printing plates FUJI PHOTO FILM CO., LTD. (JP) 1984-12-12 EP disclosed