SCHEMBL4654828

SCHEMBL4654828

COc1ccc(-c2ccccc2I)cc1.O=S(=O)(O)c1ccccc1C(F)(F)F

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 2/20 0.43
GAA P10253 1/20 0.43
PTGDR2 Q9Y5Y4 1/20 0.42
SLC22A12 Q96S37 1/20 0.41
PRKAB2 O43741 1/20 0.41
PRKAG1 P54619 1/20 0.41
PRKAA2 P54646 1/20 0.41
PRKAA1 Q13131 1/20 0.41
PRKAG3 Q9UGI9 1/20 0.41
PRKAG2 Q9UGJ0 1/20 0.41
PRKAB1 Q9Y478 1/20 0.41
HDAC4 P56524 1/20 0.40
HDAC2 Q92769 1/20 0.40
HDAC8 Q9BY41 1/20 0.40
LMNA P02545 2/20 0.39
MAPT P10636 2/20 0.39
MAOB P27338 2/20 0.39
TDP1 Q9NUW8 1/20 0.39
PPARG P37231 1/20 0.39
PPARA Q07869 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Trifluoromethanesulfonic Acid SCHEMBL387254 0.83 HDAC4 (0.47) KMT2ASLC22A12HDAC4HDAC2HDAC8
SCHEMBL4655811 0.81 TP53 (0.48) KMT2AGAAPTGDR2HDAC4HDAC2
SCHEMBL7574616 0.80 HDAC4 (0.51) KMT2AGAAHDAC4HDAC2HDAC8
SCHEMBL4655795 0.80 AKR1C3 (0.40) KMT2ALMNAMEN1FFAR4
SCHEMBL4655793 0.78 HDAC4 (0.47) KMT2AGAAHDAC4HDAC2HDAC8
SCHEMBL7582846 0.78 HDAC4 (0.49) KMT2AGAAHDAC4HDAC2HDAC8
SCHEMBL4654732 0.78 HDAC4 (0.43) KMT2APRKAB2PRKAG1PRKAA2PRKAA1
SCHEMBL1804140 0.77 HDAC4 (0.41) KMT2ASLC22A12HDAC4HDAC2HDAC8
SCHEMBL4888100 0.77 HDAC4 (0.39) KMT2AGAASLC22A12HDAC4HDAC2
Trifluoroacetic Acid SCHEMBL761111 0.77 HDAC4 (0.48) GAAPRKAB2PRKAG1PRKAA2PRKAA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1640804-B1 Positive-tone radiation-sensitive resin composition JSR CORP (JP) 2008-11-19 EP disclosed
US-7335457-B2 Positive-tone radiation-sensitive resin composition JSR CORPORATION (JP) 2008-02-26 US disclosed
US-20060078821-A1 A caroboxyalkylanthracene based compound, a hydroxy or alkoxystyrene polymer, and a sulfonimide compound as photoacid generator; low sublimation properties and excellent compatibility with other components; exhibits optimum controllability of radiation transmittance; microfabrication JSR CORPORATION (JP) 2006-04-13 US disclosed
EP-1640804-A2 Positive-tone radiation-sensitive resin composition JSR Corporation (JP) 2006-03-29 EP disclosed