SCHEMBL4655795

SCHEMBL4655795

O=S(=O)(O)c1ccccc1C(F)(F)F.O=[N+]([O-])c1ccc(-c2ccccc2I)cc1

nearest known ligand 0.40

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
AKR1C3 P42330 2/20 0.40
AKR1C2 P52895 2/20 0.40
CD40 P25942 2/20 0.39
CD40LG P29965 2/20 0.39
SCN9A Q15858 1/20 0.38
MEN1 O00255 1/20 0.38
LMNA P02545 1/20 0.38
KMT2A Q03164 1/20 0.38
RORC P51449 1/20 0.37
ENPP2 Q13822 1/20 0.36
HSD11B1 P28845 3/20 0.36
PTGS2 P35354 2/20 0.35
FFAR4 Q5NUL3 1/20 0.35
PTPN1 P18031 1/20 0.35
PTPN6 P29350 1/20 0.35
PTPN11 Q06124 1/20 0.35
POLB P06746 1/20 0.35
MAPK1 P28482 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Trifluoromethanesulfonic Acid SCHEMBL3987054 0.84 PTGS2 (0.40) AKR1C3AKR1C2MEN1LMNAKMT2A
SCHEMBL4654724 0.82 PTPN11 (0.50) MEN1LMNAKMT2AENPP2HSD11B1
SCHEMBL4654828 0.80 KMT2A (0.43) MEN1LMNAKMT2AFFAR4
SCHEMBL4654801 0.79 SMN1; SMN2 (0.46) MEN1LMNAKMT2AHSD11B1PTGS2
SCHEMBL4654720 0.78 PTGS2 (0.38) CD40CD40LGMEN1LMNAKMT2A
SCHEMBL11647391 0.78 LMNA (0.48) CD40CD40LGSCN9AMEN1LMNA
SCHEMBL4654640 0.78 ALDH1A1 (0.50) MEN1LMNAKMT2APTGS2POLB
SCHEMBL3982975 0.78 MMP1 (0.42) MEN1LMNAKMT2AHSD11B1PTGS2
SCHEMBL2903913 0.77 RORC (0.41) MEN1LMNAKMT2ARORCENPP2
SCHEMBL3980030 0.77 MMP1 (0.43) MEN1LMNAKMT2AHSD11B1PTGS2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1640804-B1 Positive-tone radiation-sensitive resin composition JSR CORP (JP) 2008-11-19 EP disclosed
US-7335457-B2 Positive-tone radiation-sensitive resin composition JSR CORPORATION (JP) 2008-02-26 US disclosed
US-20060078821-A1 A caroboxyalkylanthracene based compound, a hydroxy or alkoxystyrene polymer, and a sulfonimide compound as photoacid generator; low sublimation properties and excellent compatibility with other components; exhibits optimum controllability of radiation transmittance; microfabrication JSR CORPORATION (JP) 2006-04-13 US disclosed
EP-1640804-A2 Positive-tone radiation-sensitive resin composition JSR Corporation (JP) 2006-03-29 EP disclosed