Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HDAC4 | P56524 | 1/20 | 0.47 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.47 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.47 |
| ▸ | ABL1 | P00519 | 1/20 | 0.44 |
| ▸ | ABCB1 | P08183 | 1/20 | 0.44 |
| ▸ | BCR | P11274 | 1/20 | 0.44 |
| ▸ | STAT3 | P40763 | 1/20 | 0.43 |
| ▸ | SLC22A12 | Q96S37 | 1/20 | 0.42 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.42 |
| ▸ | PDK2 | Q15119 | 1/20 | 0.42 |
| ▸ | TP53 | P04637 | 2/20 | 0.41 |
| ▸ | NPC1 | O15118 | 2/20 | 0.41 |
| ▸ | MAPT | P10636 | 2/20 | 0.41 |
| ▸ | RAB9A | P51151 | 2/20 | 0.41 |
| ▸ | TSHR | P16473 | 1/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.41 |
| ▸ | FGFR1 | P11362 | 1/20 | 0.41 |
| ▸ | SRC | P12931 | 1/20 | 0.41 |
| ▸ | FGFR2 | P21802 | 1/20 | 0.41 |
| ▸ | FGFR4 | P22455 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7574616 | 0.88 | HDAC4 (0.51) | HDAC4HDAC2HDAC8ABL1ABCB1 | |
| SCHEMBL1804140 | 0.87 | HDAC4 (0.41) | HDAC4HDAC2HDAC8ABL1ABCB1 | |
| Trifluoromethanesulfonic Acid SCHEMBL1140970 | 0.86 | PPARG (0.39) | HDAC4HDAC2HDAC8STAT3PTPN1 | |
| Trifluoromethanesulfonic Acid SCHEMBL216502 | 0.86 | PPARG (0.39) | HDAC4HDAC2HDAC8STAT3PTPN1 | |
| SCHEMBL1800750 | 0.86 | HDAC4 (0.40) | HDAC4HDAC2HDAC8ABL1ABCB1 | |
| SCHEMBL7582846 | 0.85 | HDAC4 (0.49) | HDAC4HDAC2HDAC8ABL1ABCB1 | |
| Trifluoromethanesulfonic Acid SCHEMBL7597295 | 0.84 | PTPN1 (0.45) | HDAC4HDAC2HDAC8PTPN1PDK2 | |
| SCHEMBL4888100 | 0.84 | HDAC4 (0.39) | HDAC4HDAC2HDAC8ABL1ABCB1 | |
| Trifluoroacetic Acid SCHEMBL761111 | 0.84 | HDAC4 (0.48) | HDAC4HDAC2HDAC8ABL1ABCB1 | |
| Trifluoromethanesulfonic Acid SCHEMBL8737223 | 0.84 | POLB (0.40) | PTPN1PDK2TP53NPC1MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 745 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2031007-A2 | Norbornene-type polymers, compositions thereof and lithographic processes using such compositions | Promerus LLC (US) | 2009-03-04 | — | — | EP | claimed |
| EP-1853972-A2 | NORBORNENE-TYPE POLYMERS, COMPOSITIONS THEREOF AND LITHOGRAPHIC PROCESSES USING SUCH COMPOSITIONS | Promerus LLC (US) | 2007-11-14 | — | — | EP | claimed |
| US-20060234164-A1 | copolymerizing norbornene monomers containing ester groups, sulonamide groups, ethers, alcohols in presence of (Acetonitrile) bis(triisopropylphosphine)palladium(acetate) tetrakis (pentafluorophenyl)borate catalyst and an optional cocatalyst lithium tetrakis(pentafluorophenyl)borate diethyl etherate | PROMERUS LLC (US) | 2006-10-19 | — | — | US | claimed |
| WO-2006091802-A2 | NORBORNENE-TYPE POLYMERS, COMPOSITIONS THEREOF AND LITHOGRAPHIC PROCESSES USING SUCH COMPOSITIONS | PROMERUS LLC (US) | 2006-08-31 | — | — | WO | claimed |
| WO-2006091523-A2 | NORBORNENE-TYPE POLYMERS, COMPOSITIONS THEREOF AND LITHOGRAPHIC PROCESSES USING SUCH COMPOSITIONS | PROMERUS LLC (US) | 2006-08-31 | — | — | WO | claimed |
| EP-0821274-B1 | Chemical-sensitization resist composition | TOKYO OHKA KOGYO CO LTD (JP) | 2001-11-14 | — | — | EP | claimed |
| US-5976760-A | Chemical-sensitization resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-11-02 | — | — | US | claimed |
| EP-0821274-A1 | Chemical-sensitization resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1998-01-28 | — | — | EP | claimed |
| US-4968581-A | High resolution photoresist of imide containing polymers | HOECHST CELANESE CORPORATION (US) | 1990-11-06 | — | — | US | claimed |
| US-4912018-A | High resolution photoresist based on imide containing polymers | HOECHST CELANESE CORPORATION (US) | 1990-03-27 | — | — | US | claimed |
| EP-3303057-B1 | METHOD OF BONDING HARDWARE TO GLASS | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2026-05-27 | — | — | EP | disclosed |
| US-20260139161-A1 | Electrically Debondable UV Activated Adhesives | 3M INNOVATIVE PROPERTIES CO (US) | 2026-05-21 | — | — | US | disclosed |
| WO-2026097702-A1 | PHOTOSENSITIVE COMPOSITION, METHOD FOR PREPARING PATTERN, CURED PRODUCT, AND ELECTRONIC COMPONENT | 江苏艾森半导体材料股份有限公司 | 2026-05-15 | — | — | WO | disclosed |
| US-20260132316-A1 | ULTRAVIOLET DETACHABLE ADHESIVE COMPOSITION, ADHESIVE FILM PREPARED USING SAME, AND METHOD FOR PEELING OFF ADHESIVE FILM | SEOUL NATIONAL UNIVERSITY R&DB FOUNDATION (KR) | 2026-05-14 | — | — | US | disclosed |
| EP-4726005-A1 | ULTRAVIOLET DETACHABLE ADHESIVE COMPOSITION, ADHESIVE FILM PREPARED USING SAME, AND METHOD FOR PEELING OFF ADHESIVE FILM | Seoul National University R&DB Foundation (KR) | 2026-04-15 | — | — | EP | disclosed |
| US-5432039-A | Radiation sensitive quinone diazide and resin composition for microlens | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1995-07-11 | — | — | US | disclosed |
| US-5362607-A | Photo-patternable in absence of moisture; treating substrate with positive resist composition, baking, irradiating resist in patterned way, heating, developing; resist of water-soluble phenolic resin, tertiary butyl compound, aryl onium salt | MICROSI, INC. (US) | 1994-11-08 | — | — | US | disclosed |
| US-5310619-A | Resist compositions comprising a phenolic resin, an acid forming onium salt and a tert-butyl ester or tert-butyl carbonate which is acid-cleavable | MICROSI, INC. (US) | 1994-05-10 | — | — | US | disclosed |
| EP-0594452-A2 | Radiation sensitive resin composition for microlens | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1994-04-27 | — | — | EP | disclosed |
| EP-0249139-A2 | Resist compositions and use | MicroSi, Inc. (a Delaware corporation) (US) | 1987-12-16 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260132316-A1 | ULTRAVIOLET DETACHABLE ADHESIVE COMPOSITION, ADHESIVE FILM PREPARED USING SAME, AND METHOD FOR PEELING OFF ADHESIVE FILM | CDH1, ICAM1, RAD51 | HDAC4 3701/4885HDAC2 3368/4885HDAC8 4154/4885 |
| US-20260139161-A1 | Electrically Debondable UV Activated Adhesives | CDH1, ITGB6, ITGA6 | HDAC4 2618/4885HDAC2 3044/4885HDAC8 3797/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.