SCHEMBL465665

SCHEMBL465665

CCCC[Te]C(C)c1ccccc1

nearest known ligand 0.40

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
POLB P06746 2/20 0.40
TAAR1 Q96RJ0 3/20 0.39
LMNA P02545 1/20 0.39
ALDH1A1 P00352 3/20 0.39
MAPT P10636 1/20 0.39
HTR2A P28223 1/20 0.39
ASAH1 Q13510 1/20 0.37
ACER2 Q5QJU3 1/20 0.37
NAAA Q02083 2/20 0.37
MME P08473 1/20 0.36
SIGMAR1 Q99720 1/20 0.36
KDM4E B2RXH2 1/20 0.36
NPSR1 Q6W5P4 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL465711 0.80 TAAR1 (0.43) TAAR1LMNAHTR2A
SCHEMBL888010 0.75 SIGMAR1 (0.44) TAAR1HTR2ASIGMAR1
Isopropylbenzene SCHEMBL8837125 0.73 HTR2A (0.47) POLBTAAR1LMNAALDH1A1MAPT
Isopropylbenzene SCHEMBL2596977 0.71 HTR2A (0.50) POLBTAAR1LMNAALDH1A1HTR2A
Isopropylbenzene SCHEMBL18343980 0.71 HTR2A (0.50) POLBTAAR1LMNAALDH1A1HTR2A
Hexadecane SCHEMBL28192744 0.71 HTR2A (0.50) POLBTAAR1LMNAALDH1A1HTR2A
SCHEMBL190051 0.70 RIPK1 (0.55) POLBTAAR1ALDH1A1SIGMAR1KDM4E
SCHEMBL10545530 0.69 TAAR1 (0.44) TAAR1LMNAALDH1A1SIGMAR1KDM4E
SCHEMBL1293020 0.69 SIGMAR1 (0.61) POLBLMNAALDH1A1HTR2ASIGMAR1
Ammonia Solution, Strong SCHEMBL6014509 0.68 RIPK1 (0.53) POLBTAAR1ALDH1A1SIGMAR1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-103571357-B Protective film and its manufacturing method 琳得科株式会社 2019-04-12 CN disclosed
US-10131824-B2 Adhesive composition, adhesive sheet, and method for producing semiconductor device LINTEC CORPORATION (JP) 2018-11-20 US disclosed
EP-2821817-B1 LAMINATE SHARP KK (JP) 2018-06-20 EP disclosed
US-9862167-B2 Laminate including antireflective moth-eye film and protection film SHARP KABUSHIKI KAISHA (JP) 2018-01-09 US disclosed
CN-103571358-B Diaphragm 琳得科株式会社 2017-09-15 CN disclosed
US-20160160094-A1 Adhesive Composition, Adhesive Sheet, and Method for Producing Semiconductor Device LINTEC CORPORATION (JP) 2016-06-09 US disclosed
EP-2345679-B1 METHOD FOR PRODUCING GRAFT COPOLYMER, GRAFT COPOLYMER OBTAINED BY THE METHOD, RUBBER COMPOSITION CONTAINING THE GRAFT COPOLYMER, AND TIRE BRIDGESTONE CORP (JP) 2016-04-27 EP disclosed
CN-105358647-A Adhesive composition, adhesive sheet, and method for producing semiconductor device LINTEC CORP 2016-02-24 CN disclosed
CN-102533169-B The optics of acrylic pressure-sensitive adhesive compositions, acrylic adhesives and band binder layer LINTEC CORP. (JP) 2015-07-29 CN disclosed
EP-2821817-A1 LAMINATE Sharp Kabushiki Kaisha (JP) 2015-01-07 EP disclosed
US-7291690-B2 Process for production of living radical polymers and polymers OTSUKA CHEMICAL CO., LTD. (JP) 2007-11-06 US disclosed
EP-1541592-B1 PROCESS FOR PRODUCTION OF LIVING RADICAL POLYMERS AND POLYMERS OBTAINED THEREFROM OTSUKA CHEMICAL CO LTD (JP) 2007-05-02 EP disclosed
US-20070073015-A1 Polymer, a method for producing the polymer, and a cement admixture using the same NIPPON SHOKUBAI CO., LTD. (JP) 2007-03-29 US disclosed
EP-1767564-A2 Polymer, a method for producing the polymer, and a cement admixture using the same NIPPON SHOKUBAI CO., LTD. (JP) 2007-03-28 EP disclosed
US-20060199927-A1 Process for production of living-radical polymers and polymers Outdoor Wireless Networks LLC 2006-09-07 US disclosed
US-20060167199-A1 Process for produciton of living radical polymers and polymers OTSUKA CHEMICAL CO., LTD. (JP) 2006-07-27 US disclosed
US-20060135711-A1 Process for the production of living radical polymers and polymers OTSUKA CHEMICAL CO., LTD. (JP) 2006-06-22 US disclosed
EP-1619211-A1 PROCESS FOR PRODUCTION OF LIVING-RADICAL POLYMERS AND POLYMERS OTSUKA CHEMICAL COMPANY, LIMITED (JP) 2006-01-25 EP disclosed
EP-1595894-A1 PROCESS FOR THE PRODUCTION OF LIVING RADICAL POLYMERS AND POLYMERS OTSUKA CHEMICAL COMPANY, LIMITED (JP) 2005-11-16 EP disclosed
EP-1541592-A1 PROCESS FOR PRODUCTION OF LIVING RADICAL POLYMERS AND POLYMERS OTSUKA CHEMICAL COMPANY, LIMITED (JP) 2005-06-15 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20060135711-A1 Process for the production of living radical polymers and polymers CBR3, CBR1, CCNT1 POLB 1608/4885TAAR1 524/4885LMNA 1382/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.