SCHEMBL888010

SCHEMBL888010

CCCC[Te]C(C)Cc1ccccc1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SIGMAR1 Q99720 5/20 0.44
TAAR1 Q96RJ0 4/20 0.44
SLC6A2 P23975 3/20 0.44
SLC6A4 P31645 2/20 0.44
SLC6A3 Q01959 2/20 0.44
MAOA P21397 1/20 0.44
CYP2A6 P11509 1/20 0.44
ADORA2A P29274 1/20 0.44
ADORA1 P30542 1/20 0.44
KCNH2 Q12809 2/20 0.42
TRPA1 O75762 1/20 0.42
ADRA2B P18089 1/20 0.42
ADRA2C P18825 1/20 0.42
HTR2A P28223 1/20 0.42
ADRA1A P35348 1/20 0.42
OPRK1 P41145 1/20 0.42
CSNK1E P49674 1/20 0.41
SLC18A2 Q05940 1/20 0.41
CYP2D6 P10635 1/20 0.41
BCHE P06276 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL465668 0.80 SIGMAR1 (0.50) SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3
SCHEMBL465665 0.75 POLB (0.40) SIGMAR1TAAR1HTR2A
SCHEMBL465680 0.71 SIGMAR1 (0.54) SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3
SCHEMBL6824286 0.71 CSNK1E (0.49) SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3
SCHEMBL12503887 0.70 SIGMAR1 (0.63) SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3
SCHEMBL6693090 0.69 CSNK1E (0.56) SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3
SCHEMBL31544902 0.69 SIGMAR1 (0.75) SIGMAR1SLC6A2SLC6A4SLC6A3MAOA
SCHEMBL465677 0.68 SIGMAR1 (0.50) SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3
SCHEMBL7147691 0.68 CSNK1E (0.50) SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3
SCHEMBL15562699 0.68 CSNK1E (0.50) SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10131824-B2 Adhesive composition, adhesive sheet, and method for producing semiconductor device LINTEC CORPORATION (JP) 2018-11-20 US disclosed
EP-2821817-B1 LAMINATE SHARP KK (JP) 2018-06-20 EP disclosed
US-9862167-B2 Laminate including antireflective moth-eye film and protection film SHARP KABUSHIKI KAISHA (JP) 2018-01-09 US disclosed
US-20160160094-A1 Adhesive Composition, Adhesive Sheet, and Method for Producing Semiconductor Device LINTEC CORPORATION (JP) 2016-06-09 US disclosed
EP-2821817-A1 LAMINATE Sharp Kabushiki Kaisha (JP) 2015-01-07 EP disclosed
US-20140342121-A1 LAMINATE LINTEC CORPORATION (JP) 2014-11-20 US disclosed
US-8598272-B2 Compatibilizer and blend polymer composition including the same CHI MEI CORPORATION (TW) 2013-12-03 US disclosed
EP-1767564-B2 POLYMER, A METHOD FOR PRODUCING THE POLYMER, AND A CEMENT ADMIXTURE USING THE SAME NIPPON CATALYTIC CHEM IND (JP) 2013-09-25 EP disclosed
EP-1619211-B1 PROCESS FOR PRODUCTION OF LIVING-RADICAL POLYMERS AND POLYMERS OTSUKA CHEMICAL CO LTD (JP) 2012-10-17 EP disclosed
US-20120010363-A1 COMPATIBILIZER AND BLEND POLYMER COMPOSITION INCLUDING THE SAME CHI MEI CORPORATION (TW) 2012-01-12 US disclosed
US-7291690-B2 Process for production of living radical polymers and polymers OTSUKA CHEMICAL CO., LTD. (JP) 2007-11-06 US disclosed
EP-1541592-B1 PROCESS FOR PRODUCTION OF LIVING RADICAL POLYMERS AND POLYMERS OBTAINED THEREFROM OTSUKA CHEMICAL CO LTD (JP) 2007-05-02 EP disclosed
US-20070073015-A1 Polymer, a method for producing the polymer, and a cement admixture using the same NIPPON SHOKUBAI CO., LTD. (JP) 2007-03-29 US disclosed
EP-1767564-A2 Polymer, a method for producing the polymer, and a cement admixture using the same NIPPON SHOKUBAI CO., LTD. (JP) 2007-03-28 EP disclosed
US-20060199927-A1 Process for production of living-radical polymers and polymers Outdoor Wireless Networks LLC 2006-09-07 US disclosed
US-20060167199-A1 Process for produciton of living radical polymers and polymers OTSUKA CHEMICAL CO., LTD. (JP) 2006-07-27 US disclosed
US-20060135711-A1 Process for the production of living radical polymers and polymers OTSUKA CHEMICAL CO., LTD. (JP) 2006-06-22 US disclosed
EP-1619211-A1 PROCESS FOR PRODUCTION OF LIVING-RADICAL POLYMERS AND POLYMERS OTSUKA CHEMICAL COMPANY, LIMITED (JP) 2006-01-25 EP disclosed
EP-1595894-A1 PROCESS FOR THE PRODUCTION OF LIVING RADICAL POLYMERS AND POLYMERS OTSUKA CHEMICAL COMPANY, LIMITED (JP) 2005-11-16 EP disclosed
EP-1541592-A1 PROCESS FOR PRODUCTION OF LIVING RADICAL POLYMERS AND POLYMERS OTSUKA CHEMICAL COMPANY, LIMITED (JP) 2005-06-15 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20060135711-A1 Process for the production of living radical polymers and polymers CBR3, CBR1, CCNT1 SIGMAR1 1237/4885TAAR1 524/4885SLC6A2 4458/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.