SCHEMBL465742

SCHEMBL465742

C[Te]Cc1ccccc1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29702980 0.75 CALM1 (0.50)
SCHEMBL9400817 0.75 ALDH1A1 (0.50)
Bromide SCHEMBL11513184 0.73 ALDH1A1 (0.48)
Iodide SCHEMBL11594153 0.73 ALDH1A1 (0.48)
SCHEMBL465652 0.72 TDP1 (0.50)
SCHEMBL465676 0.72 ALDH1A1 (0.48)
SCHEMBL465636 0.72 TP53 (0.50)
SCHEMBL9517399 0.71 MAOB (0.46)
SCHEMBL9517408 0.71 MAOB (0.46)
SCHEMBL9517397 0.71 MAOB (0.46)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 174 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119859208-A Binary free radical polymerization method 上海交通大学 2025-04-22 CN claimed
US-4720560-A Hybrid organometallic compounds, particularly for metal organic chemical vapor deposition MORTON THIOKOL, INC. (US) 1988-01-19 US claimed
EP-0181706-A1 Hybrid organometallic compounds of In and ba and process for metal organic chemical vapour deposition MORTON THIOKOL, INC. (US) 1986-05-21 EP claimed
US-12528896-B2 Fluorine-containing polymer and method of producing same AGC Inc. (JP) 2026-01-20 US disclosed
EP-3594250-B1 METHOD FOR PRODUCING POLYMER AGC INC (JP) 2025-06-25 EP disclosed
EP-3892612-B1 METHOD FOR PRODUCING ORGANIC TELLURIUM COMPOUND AND METHOD FOR PRODUCING VINYL POLYMER OTSUKA CHEMICAL CO LTD (JP) 2025-05-14 EP disclosed
CN-119859208-A Binary free radical polymerization method 上海交通大学 2025-04-22 CN disclosed
WO-2024247968-A1 DISPERSANT, DISPERSION, INK, INK SET, AND PRINTED MATTER artience株式会社 2024-12-05 WO disclosed
US-12100840-B2 Binder composition for non-aqueous secondary battery electrode, slurry composition for non-aqueous secondary battery positive electrode, positive electrode for non-aqueous secondary battery, and non-aqueous secondary battery ZEON CORPORATION (JP) 2024-09-24 US disclosed
WO-2024190876-A1 DOUBLE-SIDED ADHESIVE TAPE 積水化学工業株式会社 2024-09-19 WO disclosed
EP-3958357-B1 BINDER COMPOSITION FOR NON-AQUEOUS SECONDARY BATTERY ELECTRODE, SLURRY COMPOSITION FOR NON-AQUEOUS SECONDARY BATTERY POSITIVE ELECTRODE, POSITIVE ELECTRODE FOR NON-AQUEOUS SECONDARY BATTERY, AND NON-AQUEOUS SECONDARY BATTERY ZEON CORP (JP) 2024-04-17 EP disclosed
US-20060135711-A1 Process for the production of living radical polymers and polymers OTSUKA CHEMICAL CO., LTD. (JP) 2006-06-22 US disclosed
EP-1619211-A1 PROCESS FOR PRODUCTION OF LIVING-RADICAL POLYMERS AND POLYMERS OTSUKA CHEMICAL COMPANY, LIMITED (JP) 2006-01-25 EP disclosed
EP-1595894-A1 PROCESS FOR THE PRODUCTION OF LIVING RADICAL POLYMERS AND POLYMERS OTSUKA CHEMICAL COMPANY, LIMITED (JP) 2005-11-16 EP disclosed
US-20050245714-A1 Organic tellurium compound, process for producing the same, living radical polymerization initiator, process for producing polymer with the same, and polymer OTSUKA CHEMICAL CO., LTD. (JP) 2005-11-03 US disclosed
EP-1541550-A1 ORGANIC TELLURIUM COMPOUND, PROCESS FOR PRODUCING THE SAME, LIVING RADICAL POLYMERIZATION INITIATOR, PROCESS FOR PRODUCING POLYMER WITH THE SAME, AND POLYMER Otsuka Chemical Co., Ltd. (JP) 2005-06-15 EP disclosed
EP-1541592-A1 PROCESS FOR PRODUCTION OF LIVING RADICAL POLYMERS AND POLYMERS OTSUKA CHEMICAL COMPANY, LIMITED (JP) 2005-06-15 EP disclosed
US-4886683-A LOW ENERGY, EPITAXIAL RAYTHEON COMPANY (US) 1989-12-12 US disclosed
US-4734514-A SEMICONDUCTORS, OPTICAL AND OPTOELECTRONIC INDUSTRIES; DOPANTS MORTON THIOKOL, INC. (US) 1988-03-29 US disclosed
EP-0181706-A1 Hybrid organometallic compounds of In and ba and process for metal organic chemical vapour deposition MORTON THIOKOL, INC. (US) 1986-05-21 EP disclosed