SCHEMBL466310

SCHEMBL466310

C(=Cc1ccnnn1)c1ccccc1

nearest known ligand 0.63

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 3/20 0.63
KMT2A Q03164 3/20 0.63
GRM4 Q14833 6/20 0.49
HDAC6 Q9UBN7 2/20 0.49
KDM4E B2RXH2 5/20 0.47
NPC1 O15118 2/20 0.47
PKM P14618 2/20 0.47
RAB9A P51151 2/20 0.47
LMNA P02545 2/20 0.47
ALDH1A1 P00352 4/20 0.47
HPGD P15428 4/20 0.47
CYP11B1 P15538 1/20 0.44
CYP11B2 P19099 1/20 0.44
GRM5 P41594 1/20 0.43
SMN1; SMN2 Q16637 1/20 0.43
NPSR1 Q6W5P4 1/20 0.43
CYP3A4 P08684 1/20 0.43
CYP2D6 P10635 1/20 0.43
CYP2C9 P11712 1/20 0.43
TSHR P16473 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL860722 1.00 MEN1 (0.63) MEN1KMT2AGRM4HDAC6KDM4E
(Z)-1,2-Diphenylethene SCHEMBL3198659 0.78 CYP11B1 (0.54) MEN1KMT2AGRM4HDAC6KDM4E
SCHEMBL11381421 0.78 MEN1 (1.00) MEN1KMT2AGRM4HDAC6KDM4E
(Z)-1,2-Diphenylethene SCHEMBL529988 0.78 CYP11B1 (0.54) MEN1KMT2AGRM4HDAC6KDM4E
SCHEMBL11381426 0.78 MEN1 (1.00) MEN1KMT2AGRM4HDAC6KDM4E
(Z)-1,2-Diphenylethene SCHEMBL7755679 0.78 CYP11B1 (0.54) MEN1KMT2AGRM4HDAC6KDM4E
SCHEMBL6340037 0.78 MEN1 (0.65) MEN1KMT2AGRM4HDAC6KDM4E
SCHEMBL6340035 0.78 MEN1 (0.65) MEN1KMT2AGRM4HDAC6KDM4E
SCHEMBL29472997 0.77 MEN1 (0.64) MEN1KMT2AGRM4HDAC6KDM4E
SCHEMBL4077027 0.77 MAPT (0.57) KDM4ENPC1RAB9ALMNAALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1292 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119306881-B Environment-friendly high-temperature-resistant acrylic resin for printing ink and preparation method thereof 台昌树脂(佛山)有限公司 2025-03-04 CN claimed
CN-119306881-A Environment-friendly high-temperature-resistant acrylic resin for printing ink and preparation method thereof 台昌树脂(佛山)有限公司 2025-01-14 CN claimed
CN-121045091-A Dendronized styryl triazine macromolecule and preparation method thereof 上海大学 2025-12-02 CN disclosed
CN-121045091-A Dendronized styryl triazine macromolecule and preparation method thereof 上海大学 2025-12-02 CN disclosed
CN-119306881-B Environment-friendly high-temperature-resistant acrylic resin for printing ink and preparation method thereof 台昌树脂(佛山)有限公司 2025-03-04 CN disclosed
CN-119306881-B Environment-friendly high-temperature-resistant acrylic resin for printing ink and preparation method thereof 台昌树脂(佛山)有限公司 2025-03-04 CN disclosed
CN-119306881-A Environment-friendly high-temperature-resistant acrylic resin for printing ink and preparation method thereof 台昌树脂(佛山)有限公司 2025-01-14 CN disclosed
CN-119306881-A Environment-friendly high-temperature-resistant acrylic resin for printing ink and preparation method thereof 台昌树脂(佛山)有限公司 2025-01-14 CN disclosed
EP-4400526-A1 POLYMER AND ORGANIC LIGHT-EMITTING DEVICE USING SAME LG Chem, Ltd. (KR) 2024-07-17 EP disclosed
EP-4400501-A1 NOVEL COMPOUND AND ORGANIC LIGHT EMITTING DEVICE COMPRISING SAME LG Chem, Ltd. (KR) 2024-07-17 EP disclosed
EP-4401536-A1 ORGANIC LIGHT-EMITTING DEVICE LG Chem, Ltd. (KR) 2024-07-17 EP disclosed
US-6379866-B2 STEREOLITHOGRAPHY UTILIZING PHOTOSENSITIVE COMPOUND COMPRISING EPOXIDE, AROMATIC/CYLCOALIPHATIC ACRYLIC MATERIAL, HYDROXY COMPOUND, AND PHOTOINITIATOR WHICH IS CURED WITH ACTINIC RADITION DSM DESOTECH INC 2002-04-30 US disclosed
US-20020018959-A1 Solid imaging compositions for preparing polypropylene-like articles DSM IP ASSETS B.V. (NL) 2002-02-14 US disclosed
WO-2001075524-A2 SOLID IMAGING COMPOSITIONS FOR PREPARING POLYPROPYLENE-LIKE ARTICLES DSM N.V. (NL) 2001-10-11 WO disclosed
EP-1099138-A1 STEREOLITHOGRAPHIC COMPOSITIONS FOR PREPARING POLYETHYLENE-LIKE ARTICLES DSM N.V. (NL) 2001-05-16 EP disclosed
WO-2000003300-A1 STEREOLITHOGRAPHIC COMPOSITION FOR PREPARING POLYETHYLENE-LIKE ARTICLES DSM N.V. (NL) 2000-01-20 WO disclosed
EP-0762195-B1 Sensitization of silver halide emulsions with noble metal complexes EASTMAN KODAK CO (US) 1999-12-15 EP disclosed
EP-0762195-A1 Sensitization of silver halide emulsions with noble metal complexes Imation Corp. (US) 1997-03-12 EP disclosed
EP-0733940-A1 Reduction of spot image defects caused by metal impurities in photographic film MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1996-09-25 EP disclosed
US-5556742-A PHOSPHINE AND HALOGEN LIGANDS MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1996-09-17 US disclosed