Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAOA | P21397 | 1/20 | 0.32 |
| ▸ | BCHE | P06276 | 1/20 | 0.31 |
| ▸ | CES1 | P23141 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.30 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1646181 | 0.81 | MAOA (0.40) | MAOABCHECES1ALDH1A1CYP1A2 | |
| SCHEMBL12668087 | 0.68 | PGR (0.33) | ALDH1A1 | |
| SCHEMBL11775155 | 0.67 | — | — | |
| SCHEMBL3294807 | 0.66 | ADRA1A (0.36) | CYP1A2 | |
| SCHEMBL18403517 | 0.62 | MAOB (0.38) | MAOA | |
| SCHEMBL21538713 | 0.59 | — | — | |
| SCHEMBL4668953 | 0.59 | MAOA (0.56) | MAOABCHECES1ALDH1A1CYP1A2 | |
| Fluorene SCHEMBL27617355 | 0.58 | MAOA (0.62) | MAOABCHECES1ALDH1A1CYP1A2 | |
| Fluorene SCHEMBL27915067 | 0.58 | MAOA (0.62) | MAOABCHECES1ALDH1A1CYP1A2 | |
| Fluorene SCHEMBL10905010 | 0.58 | MAOA (0.62) | MAOABCHECES1ALDH1A1CYP1A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108129440-B | Method for synthesizing chiral chromene derivative | 中国科学院大连化学物理研究所 | 2021-05-28 | — | — | CN | claimed |
| US-20140030653-A1 | COATING COMPOSITIONS FOR PHOTOLITHOGRAPHY | ROHM & HAAS ELECT MAT (US) | 2014-01-30 | — | — | US | disclosed |
| US-8455178-B2 | Coating compositions for photolithography | ROHM AND HAAS ELECTRONIC MATERIALS LLP (US) | 2013-06-04 | — | — | US | disclosed |
| EP-1906249-A2 | Antireflective coating compositions for photolithography | Rohm and Haas Electronic Materials, L.L.C. (US) | 2008-04-02 | — | — | EP | disclosed |
| US-20080073754-A1 | Coating compositions for photolithography | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2008-03-27 | — | — | US | disclosed |