SCHEMBL467833

SCHEMBL467833

Nc1nc(N)n(-c2ccc(N3CCCC(N4CCCC4)CC3)c(F)c2)n1

nearest known ligand 0.47

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
AXL P30530 4/20 0.47
L3MBTL3 Q96JM7 5/20 0.41
L3MBTL1 Q9Y468 5/20 0.41
KDR P35968 2/20 0.39
INSR P06213 1/20 0.39
FGFR1 P11362 2/20 0.36
FLT1 P17948 2/20 0.36
MBTD1 Q05BQ5 3/20 0.36
CSF1R P07333 1/20 0.34
CDK4 P11802 1/20 0.34
CDK6 Q00534 1/20 0.34
ALDH1A1 P00352 1/20 0.34
SMN1; SMN2 Q16637 1/20 0.34
HRH3 Q9Y5N1 3/20 0.34
TP53BP1 Q12888 2/20 0.33
CCR4 P51679 2/20 0.33
S100B P04271 1/20 0.33
L3MBTL4 Q8NA19 1/20 0.33
EGFR P00533 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL467659 0.97 AXL (0.49) AXLL3MBTL3L3MBTL1KDRINSR
SCHEMBL467688 0.92 AXL (0.40) AXLKDRINSRCSF1RCDK4
SCHEMBL467792 0.90 AXL (0.44) AXLL3MBTL3L3MBTL1KDRINSR
SCHEMBL27790975 0.89 AXL (0.47) AXLKDRINSRALDH1A1HRH3
SCHEMBL30090809 0.89 AXL (0.47) AXLKDRINSRALDH1A1HRH3
SCHEMBL27769653 0.87 AXL (0.42) AXLL3MBTL3L3MBTL1KDRINSR
SCHEMBL467696 0.87 AXL (0.43) AXLL3MBTL1KDRINSRFGFR1
SCHEMBL467478 0.87 AXL (0.42) AXLKDRINSRALDH1A1SMN1; SMN2
SCHEMBL467749 0.85 AXL (0.40) AXLKDRINSRCSF1RCDK4
SCHEMBL468621 0.84 L3MBTL3 (0.43) AXLL3MBTL3L3MBTL1MBTD1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2387395-A1 AXL INHIBITORS FOR USE IN COMBINATION THERAPY FOR PREVENTING, TREATING OR MANAGING METASTATIC CANCER Rigel Pharmaceuticals, Inc. (US) 2011-11-23 EP disclosed
US-8040491-B2 Exposure method, substrate stage, exposure apparatus, and device manufacturing method NIKON CORPORATION (JP) 2011-10-18 US disclosed