SCHEMBL468621

SCHEMBL468621

Cc1cc(-n2nc(N)nc2N)ccc1N1CCC(N2CCCC2)CC1

nearest known ligand 0.43

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
L3MBTL3 Q96JM7 10/20 0.43
L3MBTL1 Q9Y468 10/20 0.43
ALDH1A1 P00352 2/20 0.40
GAA P10253 2/20 0.40
MAPT P10636 2/20 0.40
MEN1 O00255 1/20 0.40
THRB P10828 1/20 0.40
NR4A1 P22736 1/20 0.40
KMT2A Q03164 1/20 0.40
PTK2B Q14289 1/20 0.40
AXL P30530 2/20 0.40
MBTD1 Q05BQ5 3/20 0.38
HRH3 Q9Y5N1 3/20 0.35
TP53BP1 Q12888 2/20 0.35
L3MBTL4 Q8NA19 1/20 0.35
KHK P50053 1/20 0.34
RAD52 P43351 1/20 0.34
GFER P55789 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL467949 0.91 EML4 (0.42)
SCHEMBL467659 0.86 AXL (0.49) L3MBTL3L3MBTL1ALDH1A1MAPTAXL
SCHEMBL28039190 0.84 L3MBTL3 (0.42) L3MBTL3L3MBTL1GAAMAPTAXL
SCHEMBL467833 0.84 AXL (0.47) L3MBTL3L3MBTL1ALDH1A1AXLMBTD1
SCHEMBL467609 0.84 NOTUM (0.42) L3MBTL3L3MBTL1AXLMBTD1HRH3
SCHEMBL28823415 0.83 L3MBTL3 (0.61) L3MBTL3L3MBTL1MBTD1HRH3TP53BP1
SCHEMBL467946 0.82 HRH3 (0.40) L3MBTL3L3MBTL1MBTD1HRH3
SCHEMBL467792 0.80 AXL (0.44) L3MBTL3L3MBTL1AXLMBTD1HRH3
SCHEMBL467696 0.79 AXL (0.43) L3MBTL1ALDH1A1AXL
SCHEMBL467478 0.79 AXL (0.42) ALDH1A1GAAMAPTMEN1NR4A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2387395-A1 AXL INHIBITORS FOR USE IN COMBINATION THERAPY FOR PREVENTING, TREATING OR MANAGING METASTATIC CANCER Rigel Pharmaceuticals, Inc. (US) 2011-11-23 EP disclosed
US-8040491-B2 Exposure method, substrate stage, exposure apparatus, and device manufacturing method NIKON CORPORATION (JP) 2011-10-18 US disclosed