⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL218875 | 0.82 | GRM2 (0.31) | — | |
| SCHEMBL5064896 | 0.82 | GRM2 (0.31) | — | |
| SCHEMBL2000717 | 0.80 | SLC1A2 (0.30) | — | |
| SCHEMBL6955211 | 0.80 | — | — | |
| Hydrochloric Acid SCHEMBL471787 | 0.80 | — | — | |
| SCHEMBL5352667 | 0.80 | — | — | |
| SCHEMBL8876149 | 0.78 | — | — | |
| SCHEMBL9507277 | 0.77 | — | — | |
| SCHEMBL5961836 | 0.76 | — | — | |
| SCHEMBL5515585 | 0.76 | MAOB (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 36 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112812139-A | Asymmetric cobaltocene cation derivative and preparation method thereof | 西北工业大学 | 2021-05-18 | — | — | CN | disclosed |
| EP-3450482-B1 | HIGH-STRENGTH TRANSPARENT POLYAMIDE-IMIDE AND METHOD FOR MANUFACTURING SAME | LG CHEMICAL LTD (KR) | 2021-03-03 | — | — | EP | disclosed |
| US-20190010292-A1 | HIGH-STRENGTH TRANSPARENT POLYAMIDE-IMIDE AND METHOD FOR MANUFACTURING SAME | LG CHEM, LTD. (KR) | 2019-01-10 | — | — | US | disclosed |
| EP-2413192-B1 | POLYMERIZABLE MONOMERS | SHINETSU CHEMICAL CO (JP) | 2016-12-21 | — | — | EP | disclosed |
| EP-2412733-B1 | Polymer, chemically amplified negative resist composition, and patterning process | SHINETSU CHEMICAL CO (JP) | 2016-03-23 | — | — | EP | disclosed |
| US-8865389-B2 | Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern | FUJIFILM CORPORATION (JP) | 2014-10-21 | — | — | US | disclosed |
| US-8501942-B2 | Polymerizable monomers | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-08-06 | — | — | US | disclosed |
| US-8470512-B2 | Polymer, chemically amplified negative resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-06-25 | — | — | US | disclosed |
| EP-2478415-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING A PATTERN USING THE SAME | FUJIFILM Corporation (JP) | 2012-07-25 | — | — | EP | disclosed |
| US-20120171618-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING A PATTERN USING THE SAME | FUJIFILM CORPORATION (JP) | 2012-07-05 | — | — | US | disclosed |
| US-20030087190-A1 | Photosensitive formulation for buffer coatings, film including the formulation, and method for manufacturing electronics using the formulation | SEZI RECAI (DE) | 2003-05-08 | — | — | US | disclosed |
| EP-1019426-B1 | NOVEL A1 ADENOSINE RECEPTOR AGONISTS AND ANTAGONISTS | UNIV FLORIDA (US) | 2003-03-12 | — | — | EP | disclosed |
| US-6323295-B1 | AS POLYMERIZATION CATALYST FOR METATHESIS POLYMERIZATION AND HOMO- AND COPOLYMERS CONTAINING RECURRING STRUCTURAL EMBODIMENTS WITH STRAINED CYCLOALKENYL RADICALS BONDED TO MONOMER UNITS VIA BIVALENT BRIGE GROUPS | CIBA SPECIALTY CHEMICALS CORPORATION | 2001-11-27 | — | — | US | disclosed |
| EP-1019426-A1 | NOVEL A 1? ADENOSINE RECEPTOR AGONISTS AND ANTAGONISTS | THE UNIVERSITY OF FLORIDA (US) | 2000-07-19 | — | — | EP | disclosed |
| US-5998387-A | N6-(EPOXYCYCLOALKYL) ADENOSINE COMPOUND AND PREPARATION | UNIVERSITY OF FLORIDA RESEARCH FOUNDATION, INC. (US) | 1999-12-07 | — | — | US | disclosed |
| US-5736528-A | CARDIOTONIC AGENTS | UNIVERSITY OF FLORIDA RESEARCH FOUNDATION, INC. (US) | 1998-04-07 | — | — | US | disclosed |
| WO-1997024363-A1 | NOVEL A1 ADENOSINE RECEPTOR AGONISTS AND ANTAGONISTS | UNIVERSITY OF FLORIDA (US) | 1997-07-10 | — | — | WO | disclosed |
| US-5182360-A | Crosslinking agent | LOCTITE CORPORATION (US) | 1993-01-26 | — | — | US | disclosed |
| US-4994535-A | Molding material | HERCULES INCORPORATED (US) | 1991-02-19 | — | — | US | disclosed |
| EP-0283719-A2 | Metathesis polymerized cross-linked halogen-containing copolymer | HERCULES INCORPORATED (US) | 1988-09-28 | — | — | EP | disclosed |