Known targets — ChEMBL curated mechanism
ABL1ACEACHEACVR1ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALKAVPR1AAVPR2BCHEBCRCA2CACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCASRCCR5CDK4CDK6CFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNA3CHRNA7CHRNB1CHRNB4CHRNDCHRNECHRNGCOXFA4COXFA4L2CRBNCSF1RCUL4ACYP19A1DDB1DPP4DRD1DRD2DRD3DRD4EDNRAEGFREML4ERBB2ERBB4ESR1ESR2FGFR1FGFR3FLT1FLT3FLT4GAAGABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGHSRGLAGNRHRGPD2GRIN1GRIN2AGRIN2BGRIN2CGRIN2DGRIN3AGRIN3BGSTP1HCN4HCRTR1HCRTR2HDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HRH2HRH3HSD11B1HSP90AA1HSP90AB1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IMPDH1IMPDH2ITGA2BITGB3ITKJAK1JAK2KCNA1KCNA10KCNA2KCNA3KCNA4KCNA5KCNA6KCNA7KCNB1KCNB2KCNC1KCNC2KCNC3KCNC4KCND1KCND2KCND3KCNF1KCNG1KCNG2KCNG3KCNG4KCNH1KCNH2KCNH3KCNH4KCNH5KCNH6KCNH7KCNH8KCNJ2KCNJ3KCNJ5KCNK3KCNK9KCNQ1KCNQ2KCNQ3KCNQ4KCNQ5KCNS1KCNS2KCNS3KCNV1KCNV2KDRKITKLKB1LCKMMAOAMAOBMAPK14METMMP1MMP13MMP7MMP8MT-ND1MT-ND2MT-ND3MT-ND4MT-ND4LMT-ND5MT-ND6NDUFA1NDUFA10NDUFA11NDUFA12NDUFA13NDUFA2NDUFA3NDUFA5NDUFA6NDUFA7NDUFA8NDUFA9NDUFAB1NDUFAF1NDUFAF2NDUFAF3NDUFAF4NDUFB1NDUFB10NDUFB11NDUFB2NDUFB3NDUFB4NDUFB5NDUFB6NDUFB7NDUFB8NDUFB9NDUFC1NDUFC2NDUFS1NDUFS2NDUFS3NDUFS4NDUFS5NDUFS6NDUFS7NDUFS8NDUFV1NDUFV2NDUFV3NR3C1NS5ANTRK1NTRK2NTRK3ODC1OPRD1OPRK1OPRM1P2RY12PAHPARP1PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDE5APDE7APDE7BPDE8APDE8BPDGFRAPDGFRBPIK3CAPIK3CDPNPPOLA1POLA2POLD1POLD2POLD3POLD4POLEPOLE2POLE3PPARGPRIM1PRIM2PRKCAPRKCBPRKCDPRKCEPRKCGPRKCHPRKCIPRKCQPRKCZPRKD1PRKD3PTGS1PTGS2RBX1RENRETROCK1ROCK2RPE65RRM1RRM2RRM2BS1PR1S1PR2S1PR3S1PR4S1PR5SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC18A2SLC6A1SLC6A2SLC6A3SLC6A4SLC9A3SRCTACR1TOP1TOP2ATOP2BTTRTYMPdacAdacBdacCembAfolAftsIgyrAgyrBmrcAmrcBmrdAparCparEpolrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5064896 | 0.98 | GRM2 (0.31) | — | |
| SCHEMBL218875 | 0.98 | GRM2 (0.31) | — | |
| Formic Acid SCHEMBL8030842 | 0.92 | GRM2 (0.32) | — | |
| SCHEMBL5961836 | 0.91 | — | — | |
| SCHEMBL8876149 | 0.89 | — | — | |
| SCHEMBL7122613 | 0.86 | — | — | |
| Lactic Acid SCHEMBL7559083 | 0.86 | TP53 (0.35) | — | |
| SCHEMBL8103672 | 0.85 | GRM8 (0.31) | — | |
| SCHEMBL7157746 | 0.85 | — | — | |
| SCHEMBL9094889 | 0.85 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 70 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025070154-A1 | POLYAMIDE RESIN, PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT AND METHOD FOR PRODUCING SAME, AND ELECTRONIC COMPONENT | 東レ株式会社 | 2025-04-03 | — | — | WO | disclosed |
| CN-105607426-B | Polymer, chemical amplification negative resist composition and pattern forming method | SHIN ETSU CHEMICAL COMPANY (JP) | 2019-11-01 | — | — | CN | disclosed |
| EP-2413192-B1 | POLYMERIZABLE MONOMERS | SHINETSU CHEMICAL CO (JP) | 2016-12-21 | — | — | EP | disclosed |
| US-9519216-B2 | Positive photosensitive resin compositions | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2016-12-13 | — | — | US | disclosed |
| EP-2412733-B1 | Polymer, chemically amplified negative resist composition, and patterning process | SHINETSU CHEMICAL CO (JP) | 2016-03-23 | — | — | EP | disclosed |
| EP-1609024-B1 | PHOTOSENSITIVE RESIN COMPOSITIONS | FUJIFILM ELECTRONIC MATERIALS (US) | 2015-09-30 | — | — | EP | disclosed |
| EP-1636648-B1 | NOVEL POSITIVE PHOTOSENSITIVE RESIN COMPOSITIONS | FUJIFILM ELECTRONIC MATERIALS (US) | 2015-08-12 | — | — | EP | disclosed |
| US-8865389-B2 | Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern | FUJIFILM CORPORATION (JP) | 2014-10-21 | — | — | US | disclosed |
| EP-1636649-B1 | NOVEL PHOTOSENSITIVE RESIN COMPOSITIONS | FUJIFILM ELECTRONIC MATERIALS (US) | 2014-08-13 | — | — | EP | disclosed |
| US-8501942-B2 | Polymerizable monomers | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-08-06 | — | — | US | disclosed |
| WO-2004111726-A2 | NOVEL PHOTOSENSITIVE RESIN COMPOSITIONS | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2004-12-23 | — | — | WO | disclosed |
| US-20040253542-A1 | Novel positive photosensitive resin compositions | ARCH SPECIALTY CHEMICALS, INC. | 2004-12-16 | — | — | US | disclosed |
| US-20040253537-A1 | Novel photosensitive resin compositions | ARCH SPECIALTY CHEMICALS, INC. | 2004-12-16 | — | — | US | disclosed |
| US-20040249110-A1 | Novel photosensitive resin compositions | ARCR SPECIALTY CHEMICALS, INC. | 2004-12-09 | — | — | US | disclosed |
| US-20040229166-A1 | Novel photosensitive resin compositions | ARCH SPECIALTY CHEMICALS, INC. | 2004-11-18 | — | — | US | disclosed |
| WO-2004081664-A2 | NOVEL PHOTOSENSITIVE RESIN COMPOSITIONS | ARCH SPECIALTY CHEMICALS, INC. (US) | 2004-09-23 | — | — | WO | disclosed |
| US-20040068124-A1 | Novel ester compounds, polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-04-08 | — | — | US | disclosed |
| EP-1403295-A2 | Ester compounds, polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-03-31 | — | — | EP | disclosed |
| US-4994535-A | Molding material | HERCULES INCORPORATED (US) | 1991-02-19 | — | — | US | disclosed |
| EP-0283719-A2 | Metathesis polymerized cross-linked halogen-containing copolymer | HERCULES INCORPORATED (US) | 1988-09-28 | — | — | EP | disclosed |