SCHEMBL472174

SCHEMBL472174

C=CCOCC1CCCCC1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.48
CTSL P07711 1/20 0.33
CTSB P07858 1/20 0.33
CTSK P43235 1/20 0.33
LMNA P02545 1/20 0.33
GAA P10253 1/20 0.33
ADH1B P00325 1/20 0.31
ADH1C P00326 1/20 0.31
ADH1A P07327 1/20 0.31
ADH4 P08319 1/20 0.31
ADH7 P40394 1/20 0.31
SPHK2 Q9NRA0 4/20 0.31
SPHK1 Q9NYA1 4/20 0.31
NPC1 O15118 1/20 0.31
MAPT P10636 1/20 0.31
RAB9A P51151 1/20 0.31
SLC1A3 P43003 2/20 0.31
SLC1A2 P43004 2/20 0.31
SLC1A1 P43005 2/20 0.31
CASP1 P29466 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9133835 1.00 ALDH1A1 (0.48) ALDH1A1CTSLCTSBCTSKLMNA
SCHEMBL2734448 0.88
SCHEMBL2232344 0.88 ALDH1A1 (0.54) ALDH1A1
SCHEMBL9646837 0.82 ALDH1A1 (0.48) ALDH1A1
SCHEMBL9646848 0.82 ALDH1A1 (0.48) ALDH1A1
SCHEMBL9406308 0.82 ALDH1A1 (0.48) ALDH1A1
SCHEMBL9646830 0.82 ALDH1A1 (0.48) ALDH1A1
SCHEMBL9645240 0.82 ALDH1A1 (0.48) ALDH1A1
SCHEMBL9406313 0.82 ALDH1A1 (0.48) ALDH1A1
SCHEMBL2569743 0.82 ALDH1A1 (0.35) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11981824-B2 Photocurable composition for support materials for inkjet 3D printers, ink, cartridge, method for producing support material, and method for producing optically shaped article NIPPON SHOKUBAI CO., LTD. (JP) 2024-05-14 US disclosed
EP-3760413-B1 PHOTOCURABLE COMPOSITION FOR SUPPORT MATERIALS FOR INKJET 3D PRINTERS, INK, CARTRIDGE, METHOD FOR PRODUCING SUPPORT MATERIAL, AND METHOD FOR PRODUCING OPTICALLY SHAPED ARTICLE NIPPON CATALYTIC CHEM IND (JP) 2023-09-27 EP disclosed
US-11692093-B2 Resin composition, method for producing three-dimensional molding using same, and three-dimensional molding Konica Minolta, Inc. (JP) 2023-07-04 US disclosed
EP-3685989-B1 OBJECT-GRIPPING ATTACHMENT AND INDUSTRIAL ROBOT USING OBJECT-GRIPPING ATTACHMENT KONICA MINOLTA INC (JP) 2023-03-15 EP disclosed
EP-3508335-B1 PHOTOCURABLE SUPPORT MATERIAL COMPOSITION FOR INKJET 3D PRINTERS, INK FOR INKJET 3D PRINTERS, CARTRIDGE FOR INKJET 3D PRINTERS, METHOD FOR PRODUCING SUPPORT MATERIAL AND METHOD FOR PRODUCING OPTICALLY SHAPED ARTICLE NIPPON CATALYTIC CHEM IND (JP) 2023-02-01 EP disclosed
US-11421119-B2 Resin composition, and three-dimensional moulding production method Konica Minolta, Inc. (JP) 2022-08-23 US disclosed
US-20210047530-A1 PHOTOCURABLE COMPOSITION FOR SUPPORT MATERIALS FOR INKJET 3D PRINTERS, INK, CARTRIDGE, METHOD FOR PRODUCING SUPPORT MATERIAL, AND METHOD FOR PRODUCING OPTICALLY SHAPED ARTICLE NIPPON SHOKUBAI CO., LTD. (JP) 2021-02-18 US disclosed
EP-3760413-A1 COMPOSITION FOR PHOTOCURABLE SUPPORT MATERIALS FOR INKJET 3D PRINTERS, INK, CARTRIDGE, METHOD FOR PRODUCING SUPPORT MATERIAL, AND METHOD FOR PRODUCING OPTICALLY SHAPED ARTICLE Nippon Shokubai Co., Ltd. (JP) 2021-01-06 EP disclosed
US-20200276752-A1 RESIN COMPOSITION, METHOD FOR MANUFACTURING THREE-DIMENSIONAL OBJECT USING RESIN COMPOSITION, THREE-DIMENSIONAL OBJECT, AND OBJECT-GRIPPING ATTACHMENT, AND INDUSTRIAL ROBOT USING OBJECT-GRIPPING ATTACHMENT Konica Minolta, Inc. (JP) 2020-09-03 US disclosed
US-20200263023-A1 RESIN COMPOSITION, METHOD FOR PRODUCING THREE-DIMENSIONAL MOLDING USING SAME, AND THREE-DIMENSIONAL MOLDING Konica Minolta, Inc. (JP) 2020-08-20 US disclosed
CN-105073790-A Solvent-free photocurable resin composition NISSAN CHEMICAL IND LTD 2015-11-18 CN disclosed
US-8664414-B2 Process for producing epoxy compound SHOWA DENKO K.K. (JP) 2014-03-04 US disclosed
CN-103052664-A Polyfarnesene graft copolymers with polycondensates AMYRIS INC 2013-04-17 CN disclosed
US-20120029217-A1 PROCESS FOR PRODUCING EPOXY COMPOUND SHOWA DENKO K.K. (JP) 2012-02-02 US disclosed
EP-2412712-A1 METHOD FOR PRODUCING EPOXY COMPOUND Showa Denko K.K. (JP) 2012-02-01 EP disclosed
EP-1803701-A1 Process for the preparation of vinyl ether compounds Daicel Chemical Industries, Ltd. (JP) 2007-07-04 EP disclosed
US-20070149828-A1 Process for the preparation of vinyl ether compounds DAICEL CHEMICAL INDUSTRIES, LTD. 2007-06-28 US disclosed
US-20070149828-A1 Process for the preparation of vinyl ether compounds DAICEL CHEMICAL INDUSTRIES, LTD. 2007-06-28 US disclosed
US-20070149828-A1 Process for the preparation of vinyl ether compounds DAICEL CHEMICAL INDUSTRIES, LTD. 2007-06-28 US disclosed
US-5719251-A Reactive organosilicon compounds E. I. DU PONT DE NEMOURS AND COMPANY (US) 1998-02-17 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120029217-A1 PROCESS FOR PRODUCING EPOXY COMPOUND NOX4, NOX5, NOXO1 ALDH1A1 1104/4885CTSL 4521/4885CTSB 2436/4885
US-20070149828-A1 Process for the preparation of vinyl ether compounds ETV6, RER1, CBR1 ALDH1A1 1398/4885CTSL 4842/4885CTSB 4802/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.