Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.57 |
| ▸ | TP53 | P04637 | 2/20 | 0.57 |
| ▸ | CA1 | P00915 | 1/20 | 0.55 |
| ▸ | CA2 | P00918 | 1/20 | 0.55 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.52 |
| ▸ | TSHR | P16473 | 3/20 | 0.52 |
| ▸ | CASP1 | P29466 | 1/20 | 0.52 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.50 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.50 |
| ▸ | MYC | P01106 | 2/20 | 0.49 |
| ▸ | NR4A1 | P22736 | 1/20 | 0.49 |
| ▸ | FSCN1 | Q16658 | 1/20 | 0.49 |
| ▸ | GAA | P10253 | 3/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.48 |
| ▸ | GABRP | O00591 | 1/20 | 0.46 |
| ▸ | GABRD | O14764 | 1/20 | 0.46 |
| ▸ | GABRA1 | P14867 | 1/20 | 0.46 |
| ▸ | GABRB1 | P18505 | 1/20 | 0.46 |
| ▸ | GABRG2 | P18507 | 1/20 | 0.46 |
| ▸ | GABRB3 | P28472 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11871348 | 0.85 | ALDH1A1 (0.53) | ALDH1A1TP53CA1CA2SMN1; SMN2 | |
| SCHEMBL6643737 | 0.85 | SMN1; SMN2 (0.57) | ALDH1A1TP53CA1CA2SMN1; SMN2 | |
| SCHEMBL12505382 | 0.83 | GAA (0.54) | ALDH1A1TP53CA1CA2SMN1; SMN2 | |
| SCHEMBL11105220 | 0.81 | ALDH1A1 (0.49) | ALDH1A1TP53CA1CA2SMN1; SMN2 | |
| SCHEMBL7689156 | 0.81 | C5AR1 (0.49) | ALDH1A1TP53CA1CA2SMN1; SMN2 | |
| SCHEMBL11193228 | 0.80 | TP53 (0.59) | ALDH1A1TP53CA1CA2SMN1; SMN2 | |
| SCHEMBL4362314 | 0.80 | ABL1 (0.56) | ALDH1A1SMN1; SMN2KDM4EFSCN1GAA | |
| SCHEMBL8482809 | 0.79 | ALDH1A1 (0.50) | ALDH1A1TP53CA1CA2SMN1; SMN2 | |
| SCHEMBL28167214 | 0.79 | ALDH1A1 (0.46) | ALDH1A1TP53CA1CA2SMN1; SMN2 | |
| SCHEMBL27540670 | 0.79 | ALDH1A1 (0.46) | ALDH1A1TP53CA1CA2SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 151 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2492746-B1 | Chemically amplified negative resist composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2019-11-20 | — | — | EP | disclosed |
| CN-105607426-B | Polymer, chemical amplification negative resist composition and pattern forming method | SHIN ETSU CHEMICAL COMPANY (JP) | 2019-11-01 | — | — | CN | disclosed |
| EP-2492747-B1 | Chemically amplified negative resist composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2018-11-07 | — | — | EP | disclosed |
| EP-2270596-B1 | Positive resist compostion and pattern forming process | SHINETSU CHEMICAL CO (JP) | 2018-07-25 | — | — | EP | disclosed |
| CN-104330955-B | For the chemical-amplification positive anti-corrosion agent composition and patterning method of EB or EUV lithographic printings | 信越化学工业株式会社 | 2018-05-25 | — | — | CN | disclosed |
| US-RE46765-E1 | Chemically amplified negative resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-03-27 | — | — | US | disclosed |
| CN-104199255-B | Chemistry amplification negative resist composition and patterning method for EB or EUV lithographic printings | 信越化学工业株式会社 | 2018-03-13 | — | — | CN | disclosed |
| US-RE46736-E1 | Chemically amplified negative resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-02-27 | — | — | US | disclosed |
| EP-2360527-B1 | Patterning process using EB or EUV lithography | SHINETSU CHEMICAL CO (JP) | 2017-08-23 | — | — | EP | disclosed |
| EP-2360525-B1 | Chemically amplified positive resist composition and pattern forming process | SHINETSU CHEMICAL CO (JP) | 2017-08-23 | — | — | EP | disclosed |
| EP-2146245-A2 | Resist composition and patterning process | Shinetsu Chemical Co., Ltd. (JP) | 2010-01-20 | — | — | EP | disclosed |
| US-20100009299-A1 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-01-14 | — | — | US | disclosed |
| CN-101625524-A | Photoresist composition and pattern forming method | SHINETSU CHEMICAL CO | 2010-01-13 | — | — | CN | disclosed |
| US-20040133008-A1 | Amide compounds | FUJISAWA PHARMACEUTICAL CO., LTD. (JP) | 2004-07-08 | — | — | US | disclosed |
| WO-2004039795-A2 | AMIDE COMPOUNDS FOR THE TREATMENT OF HYPERLIPIDEMIA | FUJISAWA PHARMACEUTICAL CO., LTD. (JP) | 2004-05-13 | — | — | WO | disclosed |
| EP-0603650-B1 | 3,5-Substituted amino benzoylguanidines, process for their preparation, their use as medicine or diagnostic agent, as well as a medicine containing them | HOECHST AG (DE) | 1997-04-02 | — | — | EP | disclosed |
| US-5516805-A | 3,5-substituted aminobenzoylguanidines, their use as a medicament or diagnostic and medicament containing them | HOECHST AKTIENGESELLSCHAFT (DE) | 1996-05-14 | — | — | US | disclosed |
| EP-0603650-A1 | 3,5-Substituted amino benzoylguanidines, process for their preparation, their use as medicine or diagnostic agent, as well as a medicine containing them | HOECHST AKTIENGESELLSCHAFT (DE) | 1994-06-29 | — | — | EP | disclosed |
| EP-0023569-B1 | DERIVATIVES OF CARBOXYLIC ACIDS, THEIR PREPARATION AND MEDICAMENTS CONTAINING THEM | Dr. Karl Thomae GmbH (DE) | 1983-06-22 | — | — | EP | disclosed |
| EP-0023569-A1 | Derivatives of carboxylic acids, their preparation and medicaments containing them | Dr. Karl Thomae GmbH (DE) | 1981-02-11 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20040133008-A1 | Amide compounds | APOB, APOL1, LDLR | ALDH1A1 2174/4885TP53 4513/4885CA1 3588/4885 |
| US-20100009299-A1 | Resist composition and patterning process | ARF4, FGFR2, ARF5 | ALDH1A1 2706/4885TP53 3130/4885CA1 4172/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.