SCHEMBL472324

SCHEMBL472324

C=Cc1ccc2c(Cl)c(C(=O)O)ccc2c1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MCL1 Q07820 2/20 0.42
TBK1 Q9UHD2 1/20 0.39
TSHR P16473 4/20 0.36
CASP1 P29466 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
PTPN1 P18031 3/20 0.35
LCK P06239 1/20 0.35
HCAR2 Q8TDS4 1/20 0.34
WDR5 P61964 1/20 0.34
ALDH1A1 P00352 2/20 0.33
PTPN2 P17706 1/20 0.33
PTPN6 P29350 1/20 0.33
LDHA P00338 1/20 0.33
GAA P10253 1/20 0.33
PIM1 P11309 1/20 0.33
BCL2L11 O43521 1/20 0.33
BCL2L1 Q07817 1/20 0.33
KDM4E B2RXH2 1/20 0.33
MEN1 O00255 1/20 0.33
KMT2A Q03164 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL730511 0.78 KDM4E (0.38) TSHRCASP1SMN1; SMN2LCKHCAR2
SCHEMBL31413568 0.77 PTPN1 (0.47) MCL1TBK1TSHRPTPN1WDR5
SCHEMBL945628 0.77 PTPN1 (0.59) TSHRCASP1SMN1; SMN2PTPN1ALDH1A1
SCHEMBL12431423 0.77 ESR1 (0.54) HCAR2ALDH1A1MEN1KMT2AESR1
SCHEMBL4124483 0.77 TSHR (0.50) TSHRCASP1SMN1; SMN2PTPN1LCK
SCHEMBL1164171 0.76 TSHR (0.57) MCL1TBK1TSHRCASP1SMN1; SMN2
Hydrochloric Acid SCHEMBL10957441 0.76 PTPN1 (0.57) TSHRCASP1SMN1; SMN2PTPN1LCK
SCHEMBL220169 0.74 MCL1 (0.51) MCL1TBK1TSHRPTPN1LCK
SCHEMBL11677598 0.73 TSHR (0.54) MCL1TSHRCASP1SMN1; SMN2WDR5
SCHEMBL21153834 0.73 ALDH1A1 (0.50) TSHRALDH1A1KDM4EMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2412733-B1 Polymer, chemically amplified negative resist composition, and patterning process SHINETSU CHEMICAL CO (JP) 2016-03-23 EP disclosed
US-8470512-B2 Polymer, chemically amplified negative resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-06-25 US disclosed
US-20120028190-A1 POLYMER, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-02-02 US disclosed
EP-2412733-A1 Polymer, chemically amplified negative resist composition, and patterning process Shin-Etsu Chemical Co., Ltd. (JP) 2012-02-01 EP disclosed